Tokyo Electron Limited

Moriyoshi Kinoshita

Takashi Asakawa

Koyu Hasegawa

Yuji Sasaki

Junichi Sato

Hiroshi Kumada

Ao Zheng

Hiroyuki Matsuyoshi

A substrate processing apparatus includes: a carrier storage rack configured to place and store a carrier that accommodates a substrate; a gas supply configured to supply an inert gas into the carrier placed on the carrier storage rack; and a controller configured to control whether to supply the inert gas into the carrier based on at least one of carrier information and substrate information.

Substrate processing apparatus and purging method

A transfer device of an embodiment includes a transporter including a temperature sensor disposed thereon and configured to move between a measurement position at which a temperature of a transfer target object is measured and a standby position separated from the measurement position, and a controller configured to control an operation of the transporter, and the controller moves the transporter between the measurement position and the standby position, and transfers the transfer target object by the transporter when the temperature measured by the temperature sensor at the measurement position continues to be equal to or less than a threshold for a first time.

Transfer device, substrate processing apparatus, and transfer method

Disclosed is a substrate processing apparatus including: a substrate holding unit configured to hold a substrate; a processing container configured to accommodate the substrate holding unit; a cover unit configured to load the substrate holding unit therein and to open or close an opening provided in one end of the processing container; a seal member configured to seal a gap between the end of the processing container and the cover unit; a driving mechanism configured to move the cover unit; and a controller configured to control an operation of the driving mechanism. The controller controls the operation of the driving mechanism such that the cover unit performs an intermittent operation of alternately repeating moving and stopping when opening the opening in the processing container.

Substrate processing apparatus and substrate processing method

Growing community of inventors

Iwate, Japan

Moriyoshi Kinoshita