Fuji Photo Film Company, Limited

Fujifilm Corporation

Morio Yagihara

Hisashi Okada

Kazunobu Katoh

Takatoshi Ishikawa

Hisashi Okamura

Hiroshi Fujimoto

Nobuaki Inoue

Tsumoru Hirano

Keiji Mihayashi

Hiroshi Kawamoto

Hiroyuki Mifune

Tetsuro Kojima

Yukio Yokota

Masakazu Morigaki

Noriyuki Inoue

Nobutaka Ohki

Takeshi Hirose

Hirotomo Sasaki

Akihiko Ikegawa

Mitsunori Hirano

Tetunori Matushita

Yoshio Inagaki

Shigeo Hirano

Toshiaki Aono

Takashi Ozawa

Koichi Kawamura

Yoshihiro Fujita

Shigeru Nakamura

Yoshihiro Takagi

Makoto Kikuchi

Mitsugu Tanaka

Kei Sakanoue

Shinzo Kishimoto

Tadahiro Sorori

Yoshio Idota

Makoto Umemoto

Shigeru Ohno

Hiroyuki Watanabe

Mitsunori Ono

Keiichi Adachi

Koki Nakamura

Tadashi Inaba

Katsumi Hayashi

Toshiro Takahashi

Shinji Kato

Toshiaki Aoai

Tadashi Ikeda

Sumiaki Yamasaki

Kazuto Shimada

Hideaki Naruse

Kiyoshi Morimoto

Eiichi Okutsu

Shinji Ueda

Hidekazu Oohashi

Toshiyuki Watanabe

Toshinao Ukai

Shoji Ishiguro

Senzo Sasaoka

Yutaka Adegawa

Kimitaka Kameoka

Shunichi Aida

Ken-ichi Kuwabara

Hiroshi Hara

Hiroyuki Seki

Akira Ogawa

Nobuo Seto

Kenichiro Sato

Hideaki Sato

Koichi Nakamura

Yuji Mihara

Masakazu Yoneyama

Naoto Ohshima

Hideo Ikeda

Minoru Yamada

Kunio Ishigaki

Takao Nakayama

Hideki Naito

Takahiro Goto

Shunji Takada

Kanji Meguro

Shinpei Ikenoue

Tadashi Ogawa

Isamu Itoh

Katsuyuki Watanabe

Koji Wariishi

Jiro Tsukahara

Yoichi Maruyama

Shingo Sato

Yukio Karino

Tatsuo Heki

Tetsuo Yoshida

Haruhiko Iwano

Takashi Toyoda

Tetsunori Matsushita

Satoshi Nagaoka

Masaharu Toriuchi

Yoichi Suga

Miki Takahashi

Tetsuo Yamaguchi

Shingo Nishiyama

A composition for forming an insulating film comprising at least one of a compound represented by formula (1), a hydrolysate of the compound represented by formula (1) and a condensate of the compound represented by formula (1):ASiX&#x2003;&#x2003;(1)wherein n represents an integer of from 1 to 3; A represents an optionally substituted group containing a cage structure formed by 11 or more carbon atoms, and when n represents an integer of 2 or 3, A's are mutually same or different; and X represents a hydrolyzable group, and when n represents an integer of 1 or 2, X's are mutually same or different.

Silicon-containing compound, composition containing said compound, and insulating material

A film-forming composition comprising: a compound having a specific cage structure; a pore-forming agent; an adhesion promoter; and so on, an insulating film formed from the film-forming composition and an electronic device comprising the insulating film.

Film-forming composition, insulating material-forming composition, insulating film and electronic device

The present invention provides an abrasive pad for abrading a surface to be abraded in the presence of an abrasive solution, which includes a hydrophobic polymer as a base material, and in which a graft-polymer chain having a hydrophilic group is introduced into the surface of the hydrophobic polymer. The hydrophilic group possessed by the graft-polymer chain is preferably a nonionic hydrophilic group selected from the group consisting of hydrophilic groups having an N-monoalkyl substituted structure and hydrophilic groups having an N-dialkyl substituted amide group. An amount of the hydrophilic graft-polymer to be introduced into the base material is preferably 10.0% to 150.0% in terms of graft ratio.

Abrasive pad

This invention describes a heat sensitive composition comprising: (A-I) a compound which is represented by the following general formula (I) and generates a radical when heated, and (B-I) a compound having physical and chemical properties that are changed irreversibly by a radical,R&#x2014;SOM&#x2003;&#x2003;General formula (I)wherein R represents an alkyl group or aryl group, and Mrepresents a counter cation selected from sulfonium, iodonium, diazonium, ammonium and azinium; and a negative planographic printing plate precursor which can be recorded by heat mode using this composition. This invention also describes a planographic printing plate precursor comprising a substrate having disposed thereon a photosensitive layer containing (C-II) a light-heat converting agent, (B-II) a compound having a polymerizable unsaturated group, and (A-II) an onium salt having at least two cation parts in one molecule.

Photosensitive composition and planographic printing plate precursor

A negative-working resist composition for electron beams or X-rays comprising (A) a compound generating an acid and/or radical species by the irradiation of electron beams or X-rays, (B) a resin which is insoluble in water and soluble in an alkali aqueous solution, (C) a crosslinking agent causing crosslinking with the resin of component (B) by the action of an acid, and (D) a compound having at least one unsaturated bond capable of being polymerized by an acid and/or a radical, and a negative-working resist composition for electron beams or X-rays comprising (A) a compound generating an acid and/or radical species by the irradiation of electron beams or X-rays, (B&prime;) a resin having at least one unsaturated bond polymerizable by an acid and/or an alkali, which is insoluble in water but soluble in an alkali aqueous solution, and (C) a crosslinking agent causing crosslinking with the resin (B&prime;) by the action of an acid are disclosed.

Electron beam or X-ray negative-working resist composition

The present invention relates to a conductive film excellent in electrical conductivity and durability and useful for display elements and solar cells. In particular, the invention relates to a conductive film comprising conductive fine particles adsorbed to a support, a conductive film comprising a transparent conductive layer such as an ITO layer provided on a support, and a conductive film comprising a conductive polymer layer, instead of the ITO layer, formed on a support.

Conductive film

Disclosed is a positive photosensitive composition capable of giving good sensitivity, resolution and resist pattern and exhibiting sufficiently high dry etching resistance on use of an exposure light source of 250 nm or less, particularly 220 nm or less, which composition comprises (A) a compound generating an acid on irradiation of an active light ray or radiation and (B) a resin having (i) at least one polycyclic-type alicyclic group, (ii) at least one ester group which decomposes by the action of an acid and increases the solubility in an alkali developer and (iii) at least one acetal group which decomposes by the action of an acid and increases the solubility in an alkali developer, or comprises (A) a compound generating an acid on irradiation of an active light ray or radiation, (C) a resin having a polycyclic-type alicyclic group and an ester group which decomposes by the action of an acid and increases the solubility in an alkali developer, and (D) a resin having a polycyclic-type alicyclic group and an acetal group which decomposes by the action of an acid and increases the solubility in an alkali developer.

Positive photosensitive composition

A planographic printing plate precursor obtained by laminating on a substrate, a layer composed of a hydrophobic polymer which can be made hydrophilic by heating, and a layer of which exposed portions can be removed by heat mode exposure.

Planographic printing plate precursor and a method for producing a planographic printing plate

A planographig printing plate precursor which can be written by heat mode exposure of low energy, has excellent strength in image portions and blemishing resistance, can be developed with water, or can be installed in a printing machine as it is for conducting printing without requiring specific treatment such as wet developing treatment, rubbing and the like after writing of an image, and a method for producing the same, are provided. The planographic printing plate precursor of the present invention is obtained by laminating on a substrate having a hydrophilic surface a layer composed of a hydrophobic polymer which is made hydrophilic by heating and either a layer composed of a hydrophilic polymer compound having in the side chain at least one of alkylene oxide groups or functional groups selected from --COOR, --COOM, --SOR, --SO.sub.2 R, --SO.sub.3 R, --SOM, --SO.sub.2 M, --SO.sub.3 M, --OH, --NR.sup.22 R.sup.23 (wherein, R represent a hydrogen atom, alkyl group or aryl group, M represents a metal atom, R.sup.22 and R.sup.23 each independently represent a hydrogen atom, alkyl group or aryl group) or a layer of which exposed portions can be removed by heat mode exposure.

Planographic printing plate precursor and a method for producing a

A silver halide photographic material is disclosed, which comprises a support and at least one light-sensitive silver halide emulsion layer formed thereon, said emulsion layer containing at least one nucleating agent represented by formula (I) ##STR1## wherein A.sub.1 and A.sub.2 both represent a hydrogen atom, or one of A.sub.1 and A.sub.2 represents a hydrogen atom and the other represents a sulfinic acid residue or an acyl group; R.sub.1 represents an aliphatic group, an aromatic group, or a heterocyclic group; R.sub.2 represents a hydrogen atom, an alkyl group, an aryl group, an alkoxy group, an aryloxy group, or an amino group; G represents a carbonyl group, a sulfonyl group, a sulfoxy group, a phosphoryl group, or an iminomethylene group; and Y represents a phenylene group or a naphthylene group; the sum of the total carbon atoms of said R.sub.1, R.sub.2, and Y being at least 13. The nucleating agent provides very high contrast images when used in a negative working silver halide emulsion.

Silver halide photographic materials

A silver halide photographic material comprises a silver halide emulsion layer provided on a support. The silver halide emulsion layer contains a selenium or tellurium compound represented by the formula (I): ##STR1## in which Ch is Se or Te; R.sup.1 is hydrogen, an aliphatic group, an aromatic group, a heterocyclic group, --OR.sup.11 or --NR.sup.12 R.sup.13 ; each of R.sup.11, R.sup.12 and R.sup.13 is hydrogen, an aliphatic group, an aromatic group or a heterocyclic group; and R.sup.2 is an aliphatic group, an aromatic group or a heterocyclic group.

Silver halide photographic material containing selenium or tellurium

A silver halide photographic material comprises a silver halide emulsion layer provided on a support. The silver halide emulsion layer contains a selenium compound represented by the formula (I), (IIa) or (IIb): ##STR1## in which each of R.sup.11 and R.sup.12 is hydrogen, an aliphatic group, an aromatic group, a heterocyclic group, --OR.sup.13 or --NR.sup.14 R.sup.15 ; each of R.sup.21 and R.sup.31 is an aliphatic group, an aromatic group, a heterocyclic group, --OR.sup.23 or --NR.sup.24 R.sup.25 ; each of R.sup.22 and R.sup.32 is an aliphatic group, an aromatic group or a heterocyclic group; each of R.sup.13, R.sup.14, R.sup.15, R.sup.23, R.sup.24 and R.sup.25 is hydrogen, an aliphatic group, an aromatic group or a heterocyclic group; and Ch is S, Se or Te.

Silver halide photographic material containing selenium compound

A silver halide photographic emulsion, a method of preparing the same, and a light-sensitive material containing this emulsion, wherein silver halide grains are formed while rapidly producing iodide ions from an iodide ion-releasing agent represented by Formula (I) below:

Method of preparing silver halide photographic emulsion, emulsion, and

A silver halide photographic emulsion comprising silver halide grains which are formed while iodide ions are rapidly being generated from an iodide ion-releasing agent represented by Formula (I) below, and which are chemically sensitized with a selenium sensitizer. Formula (I)

Silver halide photographic emulsion and light-sensitive material using

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Kanagawa, Japan

Morio Yagihara