Sony Corporation

Dexerials Corporation

Moriaki Abe

Kazuhiro Shinoda

Tsuneo Kusunoki

Takehiro Yamasuge

Akio Takada

Takuji Shibata

Tadayuki Honda

Kikuo Kaise

Hiroaki Narisawa

Masahide Daimon

Kazuhiro Yagihashi

Kenichi Satoh

Hiroyuki Minami

Junichi Mizuma

Shoji Hasegawa

Kenji Yazawa

Jumi Kimura

A coated phosphor including: an inorganic phosphor particle; and a silicon oxide coating that coats the inorganic phosphor particle, wherein a molar ratio (O/Si) of an oxygen atom to a silicon atom in the silicon oxide coating through ICP emission spectroscopy of the coated phosphor is 2.60 or less.

Coated phosphor method for producing same, phosphor sheet, and light-emitting device

A green phosphor including: (i) an inorganic phosphor particle; and (ii) neodymium-containing particles attached on a surface of the inorganic phosphor particle, wherein the green phosphor has a light-emission local maximum wavelength in a range of from 500 nm to 570 nm.

Green phosphor, phosphor sheet, and light-emitting device

Coated phosphor, method for producing same, phosphor sheet, and light-emitting device

A micro-lens substrate having a precise micro-lens array suitable for higher resolution, the micro-lens array substrate of high quality without having a distortion, and a method for manufacturing thereof are provided. In the micro-lens array substrate of the present invention, a micro-lens array formed of a plurality of consecutive concave lens-shaped micro-lenses is directly formed in a surface of a quartz substrate or glass substrate, and the micro-lens array is formed by a transfer method based on dry-etching. In the micro-lens array substrate of the present invention, a taper portion is formed toward the surface of the substrate in a peripheral portion of the micro-lens array in the quartz substrate or glass substrate. In a method for manufacturing the micro-lens array substrate of the present invention, a resist layer having a plurality of consecutive lens-shaped concave portions is formed in a surface of a quartz or glass substrate, the lens-shaped concave portion of the resist layer is transferred to the substrate by dry-etching, and a micro-lens array is formed by injecting a resin into the lens-shaped concave portion of this substrate. In addition, a taper portion is formed in a peripheral portion similarly to the formation of the lens-shaped concave portion, and a micro-lens array is formed by injecting a resin into the lens-shaped concave portion and taper portion.

Micro-lens array substrate and method for manufacturing thereof

Disclosed herein is a method for manufacturing a microlens substrate which is excellent in chemical resistance and light fastness to intense light irradiation, and is capable of forming a microlens substrate of a high accuracy of form. The method includes the steps of: forming a lens-shaped curve at a surface side of a transparent substrate; forming an inorganic material film on the transparent substrate so as to bury the curve therewith; and planarizing the surface of the inorganic material film to provide a microlens where the curve is buried with the inorganic material film.

Method for manufacturing a microlens substrate and method for manufacturing a liquid crystal panel

In the micro-lens array substrate of the present invention, a micro-lens array formed of a plurality of consecutive concave lens-shaped micro-lenses is directly formed in a surface of a quartz substrate or glass substrate, and the micro-lens array is formed by a transfer method based on dry-etching. In the micro-lens array substrate of the present invention, a taper portion is formed toward the surface of the substrate in a peripheral portion of the micro-lens array in the quartz substrate or glass substrate.

Micro-lens array substrate and production method therefor

A master base for fabrication includes a substrate, a first photoresist layer disposed on the substrate, and a second photoresist layer disposed on the first photoresist layer, wherein the first photoresist layer attenuates or absorbs rays reflected at the interface between the first photoresist layer and the substrate to prevent the reflected rays from interfering with applied rays in a exposing step. A method for manufacturing a master base for fabrication includes the steps of forming a first photoresist layer on a substrate, baking the first photoresist layer at the setting temperature of the first photoresist layer, and forming a second photoresist layer on the first photoresist layer.

Master base for fabrication and method for manufacturing the same

A magneto-resistive effect type magnetic head employing a spin valve film in which the direction of magnetization of a free layer is constant even in the absence of an external magnetic field to assure magnetic stability. The magneto-resistive effect type magnetic head includes a magneto-resistive effect film of a planar substantially rectangular configuration, having its longitudinal direction substantially perpendicular to a magnetic recording medium sliding surface, a first electrode connected to a longitudinal end of the magneto-resistive effect film, a second electrode connected to the other longitudinal end of the magneto-resistive effect film and hard magnetic films arranged on both ends along the width of the magneto-resistive effect film. The magneto-resistive effect film is made up of at least a first ferromagnetic layer, a non-magnetic layer, a second ferromagnetic layer and an anti-ferromagnetic layer, layered together. The hard magnetic films has an electrical resistance larger than that of the magneto-resistive effect film.

Magneto-resistive effect magnetic head

The present invention provides a high quality magnetoresistance effect type magnetic head having an increased reproduction output and capable of applying a uniform bias magnetic field to a magnetoresistance effect layer without increasing an impedance. The magnetoresistance effect type magnetic head according to the present invention includes: a magnetic layer 11 magnetized approximately in a vertical direction to a plane 14 opposing to a magnetic recording medium; a non-magnetic insulation layer 12 formed on the magnetic layer 11; and a magnetoresistance effect layer 13 formed on the non-magnetic insulation layer 12 and exhibiting the magnetoresistance effect. In the longitudinal type magnetoresistance effect type magnetic head according to the present, the detection current supplied to a magnetoresistance element is prevented from flowing into a hard magnetic film to lower the head reproduction output.

Magnetoresistance effect type magnetic head

A thin-film magnetic head improves magnetic stability of a magnetoresistance effect film 13 for further stabilizing the playback output. The thin-film magnetic head has a magnetoresistance effect stabilizing layer 11, a non-magnetic layer 12 and a magnetoresistance effect layer 13 exhibiting the magnetoresistance effect. The magnetoresistance effect stabilizing layer 11 has a hard magnetic film and a soft magnetic film. The magnetoresistance effect stabilizing layer 11 has a non-magnetic film 11c of a non-magnetic material in at least a partial area between a hard magnetic film 11b and a soft magnetic film 11d. In the thin-film magnetic head, there is produced a stable magnetostatic coupling action between the magnetoresistance effect stabilizing layer 11 and the magnetoresistance effect layer 13 for increasing the magnetic stability of the magnetoresistance effect layer 13 operating as a magnetically sensitive portion.

Growing community of inventors

Miyagi, Japan

Moriaki Abe