Semes Co., Ltd.

Lg Electronics Inc.

Moonsik Choi

Oh Jin Kwon

Sun Mi Kim

Jisu Hong

Daejin Kim

Sul Lee

Myung A Jeon

Yong Hoon Hong

Jinsub Lim

Young Su Kim

Sanghoon Seo

Minhyeok Park

The inventive concept provides an apparatus and method for removing a film formed on a substrate. A method for treating the substrate includes a primary solvent dispensing step of dispensing an organic solvent onto the substrate to remove a photoresist film on the substrate and an ozone dispensing step of dispensing a liquid containing ozone onto the substrate to remove organic residue on the substrate, after the primary solvent dispensing step.

Apparatus and method for treating substrate

The inventive concept provides a substrate treating apparatus. In an embodiment, the substrate treating apparatus includes a housing having a treatment space for treating a substrate in an interior thereof, a support unit that supports the substrate in the treatment space, a nozzle that supplies a liquid to the substrate positioned on the support unit, a liquid supply unit that supplies the liquid to the nozzle, and a controller that controls the liquid unit, the liquid supply unit includes a tank having an interior space for storing the liquid, and a first circulation line that circulates the liquid stored in the interior space and in which a first heater is installed, and the controller controls the first heater such that the first heater heats the liquid to a first temperature, at which particles in the interior of the liquid are not eluted.

Substrate treating apparatus and liquid supplying method

A drainage pump includes a housing that defines a receiving space configured to receive fluid. The housing defines a suction port configured to introduce fluid into the receiving space, and a first discharge port and a second discharge port that are configured to discharge the fluid in the receiving space to an outside of the housing. The drainage pump further includes an impeller disposed in the receiving space and configured to rotate about a rotation axis to thereby discharge the fluid in the receiving space through the first discharge port or the second discharge port; a first rib that protrudes from an inner circumferential surface of the housing toward a center of the receiving space and that is disposed between the first discharge port and the second discharge port; and a second rib that protrudes from a portion of the first rib toward the center of the receiving space.

Drainage pump and cloth treating apparatus including same

Growing community of inventors

Seoul, South Korea

Moonsik Choi