Korea Electronics Technology Institute

Moon Suhk Suh

Jin Woo Cho

Jong Hun Han

Kyoung Il Lee

Churl Seung Lee

Seon-min Kim

Jin-Koog Shin

Kwon-woo Shin

There is provided a double window/door system for blocking infrared rays which includes a first glass member, a second glass member, and a spacer positioned between the first glass member and the second glass member for maintaining the space between the first glass member and the second glass member, characterized in that one of the surfaces of the first glass member is coated with a nano substance film for blocking near infrared rays and one of the surfaces of the second glass member is coated with a thermochromic substance film.

Double window/door system for blocking infrared light

The present invention relates to an AFM (atomic force microscope) cantilever including a field effect transistor (FET) and a method for manufacturing the same; and, more particularly, to a method for manufacturing an AFM cantilever including an FET formed by a photolithography process, wherein an effective channel length of the FET is a nano-scale. Therefore, The present invention can easily implement a simulation for manufacturing the AFM cantilever including the FET by accurately controlling the effective channel length. And also, the present invention can manufacture the AFM cantilever including the FET having the effective channel ranging several tens to several hundreds nanometers by applying the low price photolithography device, thereby enhancing an accuracy and yield of the manufacturing process and drastically reducing process costs.

Atomic force microscope cantilever including field effect transistor and method for manufacturing the same

Growing community of inventors

Yongin-si, South Korea

Moon Suhk Suh