Samsung Electronics Co., Ltd.

Moon-Hyeong Han

Ki-Hyun Kim

Ki-Vin Im

Hoon-Sang Choi

An atomic layer deposition apparatus and an atomic layer deposition method increase productivity. The atomic layer deposition apparatus includes a reaction chamber, a heater for supporting a plurality of semiconductor substrates with a given interval within the reaction chamber and to heat the plurality of semiconductor substrates and a plurality of injectors respectively positioned within the reaction chamber and corresponding to the plurality of semiconductor substrates supported by the heater. The plurality of injectors are individually swept above the plurality of semiconductor substrates to spray reaction gas.

Growing community of inventors

Seoul, South Korea

Moon-Hyeong Han