Entegris, Inc.

Montray Leavy

Subhash Guddati

Thines Kumar Perumal

Hyungjun Kim

Aravind Vasanthakumar

Devon N Dion

Virendra Warke

Tse-An Yeh

Chun Kuang Chen

Edward A Sturm

Oleg Byl

Jun-Fei Zheng

Carlo Waldfried

Yan Liu

Jakub Rybczynski

Chandra Venkatraman

Meghan Patrick

Scott Sirignano

Described are three-dimensional structures that contain metal-organic-framework adsorbent material and that are prepared by additive manufacturing techniques, as well as methods of preparing the structures by additive manufacturing methods.

Metal-organic-framework-containing bodies and related methods

The present disclosure provides a module for creating a metal-containing film, including a reactor chamber; an inlet for providing an organo-metallic precursor to the reactor chamber; and an inlet for providing a reactive gaseous species to react with the organo-metallic precursor to form a metal-containing film. The reactive gaseous species includes an element having three to five valence electrons and one or more radicals selected from hydrogen, C-Calkyl, and C-Calkoxyl. The present disclosure further relates to a method of creating the metal-containing film and a semiconductor structure associated therewith.

High quantum efficiency dry resist for low exposure dose of EUV radiation

Described are electrostatic chucks that are useful to support a workpiece during a step of processing the workpiece, and electrostatic chuck base components prepared by an additive manufacturing technique.

Electrostatic chuck prepared by additive manufacturing, and related methods and structures

Described are porous sintered metal bodies and methods of making porous sintered metal bodies by additive manufacturing methods.

Porous sintered metal bodies and methods of preparing porous sintered metal bodies

A phase-shift reticle for a photolithography process in semiconductor fabrication is provided. The reticle includes a substrate, a reflective structure, a pattern defining layer and a phase shifter. The reflective structure is disposed over the substrate. The pattern defining layer includes a first material and is deposited over the reflective structure. The pattern defining layer comprises a pattern trench. The phase shifter includes a second material and disposed in the pattern trench. A transmittance of the second material is different from a transmittance of the first material.

Phase-shift reticle for use in photolithography

Polyvinyl alcohol pad

Three-dimensional multi-layer composite structures prepared by additive manufacturing techniques, as well as methods of preparing the structures by additive manufacturing techniques, wherein a multi-layer structure has layers of at least two different thicknesses and a precision thickness are disclosed herein. In some embodiments, a method includes forming a coarse feedstock layer having a coarse feedstock layer thickness, solidifying a portion of the coarse feedstock layer to form a solidified coarse feedstock layer having a solidified coarse feedstock layer thickness, before or after forming the solidified coarse feedstock layer, forming at least one fine feedstock layer having a fine feedstock layer thickness that is less than the coarse feedstock layer thickness, and solidifying a portion of the at least one fine feedstock layer to form the at least one solidified fine feedstock layer having a solidified fine feedstock layer thickness that is less than the solidified coarse feedstock layer thickness.

Multi-layer composites with varied layer thicknesses and related methods

Growing community of inventors

Singapore, Singapore

Montray Leavy