Intel Corporation

Monsour Moinpour

Young C Park

Ilan Berman

An apparatus for cleaning edges and/or bevel areas of substrates. In one embodiment, the present invention provides a cleaning mechanism that cleans particles off the edge of the wafer based upon friction at the contact point between the wafer and a rotating belt.

Rotating belt wafer edge cleaning apparatus

An apparatus for cleaning edges and/or bevel areas of substrates is described. In one embodiment, the present invention includes a core having a plurality of flexible leaves spaced along an external surface of the core. A motor is coupled to the core for rotating the core about an axis of rotation. The rotation of the core causes the flexible leaves to rotate such that the leaves extend outward to intermittently strike points along the edge and/or bevel areas of the wafer.

Flexible-leaf substrate edge cleaning apparatus

An apparatus for cleaning the side-edge and top-edge of a semiconductor wafer. The present invention provides an edge cleaning mechanism that cleans both the side-edge and top-edge of a wafer based on friction and/or a difference in tangential velocity at a point of contact between the wafer and the cleaning mechanism.

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Cupertino, CA, United States of America

Monsour Moinpour