Globalfoundries Singapore Pte. Ltd.

National University of Singapore

Moh Lung Ling

Gek Soon Chua

Sia Kim Tan

Qunying Lin

Cho Jui Tay

Chenggen Quan

Kwee Liang Martin Yeo

Ryan Khoon Khye Chong

A method for fabricating a semiconductor device that includes: providing a substrate prepared with a photoresist layer; providing a photomask comprising a first and a second pattern having a respective first and second pitch range; providing a composite aperture comprising a first and a second off-axis illumination aperture pattern, the first off-axis aperture pattern having a configuration that improves the process window of the first pitch range and the second off-axis aperture pattern having a configuration that improves the process window for a second pitch range; exposing the photoresist layer on the substrate with radiation from an exposure source through the composite aperture and the photomask; and developing the photoresist layer to pattern the photoresist layer.

Methods for enhancing photolithography patterning

A method of manufacture of a mask system includes: providing design data; generating a substantially circular optical proximity correction target from the design data; biasing a segment of the substantially circular optical proximity correction target; and generating mask data based on the shape produced by biasing the segment of the substantially circular optical proximity correction target.

Mask system employing substantially circular optical proximity correction target and method of manufacture thereof

Growing community of inventors

Singapore, Singapore

Moh Lung Ling