Japan Synthetic Rubber Co., Ltd.

Fuji Photo Film Company, Limited

Applied Science Research Institute

Mituo Kimura

Kenji Yanagihara

Masahiro Niinomi

Yasuo Nishikawa

Yoshito Mukaida

Tsutomu Okita

Tetsuo Itoh

Koshi Numata

Jun Takada

Bunji Kondo

Hideyuki Kuwahara

Hitoshi Chawanya

A process of forming a film on a substrate, which comprises bringing a substrate into contact with a plasma zone formed by generating, by use of a discharge electrode or discharge electrodes, high temperature or quasi-high temperature plasma of a gas containing at least one carbon containing compound, wherein said electrode comprises a sheet-like electrode provided with a slit having a linear portion and connected to a microwave electric source; or wherein said plasma zone is formed by forcing a high temperature or quasi-high temperature plasma generated in an arc between said electrodes by DC discharge, to move by applying a magnetic field. The process enables formation of films on substrate surfaces in a high energy efficiency.

Film formation process

A magnetic recording medium is described, comprising a support having provided thereon a thin magnetic metal film, and a thin layer consisting essentially of at least one fluorinated polymer selected from 1,1-difluoroethylene polymer 1,1,2-trifluoroethylene polymer and the copolymer thereof being provided on at least one of the surface of the thin magnetic metal film and the surface of the support opposite to the thin magnetic metal film.

Magnetic recording medium

A magnetic recording medium is disclosed which comprises a support having provided thereon a thin magnetic metal film, a plasma polymerized layer being provided on the thin magnetic film, in which the plasma polymerized layer is formed in a monomer gas or in a gas containing the monomer gas of at least one of compounds represented by the following general formulae (I) or (II), ##STR1## wherein A represents a hydrogen atom or a fluorine atom, B represents a hydrogen atom, a chlorine atom or an alkyl group having 1 to 4 carbon atoms, an alkenyl group having 2 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, an alkanoyloxy group having 1 to 4 carbon atoms, which is unsubstituted or substituted with a fluorine atom, D represents a hydrogen atom, --R, --O--R, ##STR2## where R represents an alkyl group having 1 to 4 carbon atoms or an alkenyl group having 2 to 4 carbon atoms.

A process for producing an internal-oxidized alloy, which comprises allowing a plasma generated in the presence of oxygen, a gas of an oxygen atom-containing compound or a mixture of oxygen and a gas of an oxygen atom-containing compound to act on an alloy consisting of at least two metal elements, thereby selectively oxidizing at least one metal element other than the matrix metal in said alloy. Particles of the internal-oxidized alloy thus obtained can, if necessary, be molded into a desired shape and sintered. Said process enables one to produce an internal-oxidized alloy at a high speed at a temperature of not more than 0.9 Tm (Tm: the melting point of the starting alloy) and does not require the step of separating an internal-oxidizing agent which step is required in the conventional process.

Process for producing an internal-oxidized alloy or a shaped article

A magnetic recording medium has an improved protective film covering a thin magnetic metal thin film provided on a non-magnetic support. The protective film consists of a plurality of layers formed by plasma polymerization, the base layer of which has a density of 0.7 to 1.5 g/cm.sup.3 and the surface layer of which has a density of not less than 1.2 g/cm.sup.3. This magnetic recording medium has good scratch resistance, weather resistance and abrasion resistance in addition to extremely small spacing loss. The magnetic recording medium can be produced by plasma polymerization of a wide variety of monomeric compounds.

Magnetic recording medium and process for producing the same

A process for producing a plasma polymerized film, which comprises forming a plasma polymerized film on the surface of a substrate placed in a reaction zone by subjecting an organic compound containing gas to plasma polymerization utilizing low temperature plasma formed by pulse discharging, in which the time for non-discharge condition is at least 1 msec. and the voltage rise time for gas breakdown is not longer than 100 msec. The plasma polymerized film obtained has a small coefficient of friction, high lubricity, durability and heat resistance and is useful as a solid lubricating film, etc.

Process for producing plasma polymerized film

The present invention concerns a process for producing a novel polymeric thin film having high density, high hardness and high toughness on the surface of a substrate by plasma polymerization. This process comprises providing a gas containing at least one compound selected from halogenated alkanes, alkanes, hydrogen and halogens in specific combinations for plasma polymerization, the atomic ratio of halogen/hydrogen in the aforesaid gas being 0.1 to 5 and the electron temperature of the plasma in the reaction zone being 6,000.degree. K. or higher and lower than 30,000.degree. K. The polymeric thin film obtained is useful on various articles for the purpose of protection, surface hardening, rust proofing, scratch proofing, providing gas barrier, etc. In particular, it is suitable as the protective film of magnetic recording media.

Polymeric thin film, process for producing the same and products

An optical product having a thin film on the surface which is obtained by subjecting a mixed gas of oxygen and a hydrocarbon compound having a double bond to plasma polymerization in the presence of an optical product, thereby forming on the surface of the optical product a thin film of a reaction product of said plasma polymerization. Said optical product having a thin film on the surface has excellent resistance to fogging due to adhesion of water drops when used in gas phase, excellent resistance to adhesion of air bubbles when used in liquid phase, high resistance to being stained by oils and fats and an excellent removability of stains due to oils and fats.

Growing community of inventors

Yokohama, Japan

Mituo Kimura