Fujitsu Corporation

Mitugu Uemura

Ryuji Maeda

An exposure method and apparatus are provided. The exposure apparatus of the present invention includes a discontinuous exposure unit which discontinuously exposes the scan-end point in a first field to be scanned on an exposure substrate, and also discontinuously exposes the scan-start point in a second field to be scanned on the exposure substrate. The exposure substrate is moved so that the scan-end point in the first field and the scan-start point in the second field overlap with each other to form an intermediate area to be exposed. In the intermediate area, the exposure of the first field and the exposure of the second field are averaged to prevent a difference in width of the intermediate area. This effect can be achieved without prolonging the exposure time.

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Kawasaki, Japan

Mitugu Uemura