Shimadzu Corporation

Mitsuyoshi Yoshii

Masahiro Ueda

Kei Shinada

Shinji Nagamachi

Jun-ichi Kita

Motoo Kinoshita

Hisamitsu Akamaru

Kunihiko Okubo

Hiroshi Nakano

Keiso Kawamoto

A device for measurement of an odor component in a sample gas prepares many target gases to be actually measured by a plurality of sensors with different response characteristics, each containing the odor component at a different concentration. Detection signals from these sensors are analyzed by a method of multivariate analysis such as the principal component analysis, and the odor component is characterized on the basis of such an analysis. For preparing the target gases, the sample gas containing the odor component is passed through a collector tube containing an adsorbent which adsorbs this odor component at normal and subnormal temperature and desorbs it when heated. After a specified amount of the odor component is adsorbed to the adsorbent, the tube is heated and an inert gas serving as carrier gas is passed through such that the desorbed odor component is carried to the detectors as a target gas. The concentration of the odor component in such a target gas is controlled by the manner of flow of the carrier gas. In order to obtain a dependable result from such an analysis, response characteristics of each of the sensors may be analyzed by examining the relationship between the outputted detection signal and the concentration of the odor component in the target gas. Only those of the sensors which show a monotonically varying or linear response characteristics may be considered trustworthy and only the detection signals from such trustworthy detectors may be used for the analysis.

Devices for measuring gases with odors

A Josephson junction includes a substrate, a first superconducting layer, a second superconducting layer transversely overlaid on the first layer with an insulating layer interposed therebetween, the insulating layer is an oxide or a nitride of the superconducting material, and the insulating layer including a low oxygen- or nitrogen-concentrated area in contact with each of the first and second layers. A process for fabricating the Josephson junction includes the steps of preparing a substrate, forming a first superconducting layer, forming a second superconducting layer transversely on the first layer with an insulating layer interposed therebetween wherein the insulating layer is an oxide or nitride of the superconducting material, and injecting ion beams into the insulating layer so as to form low oxygen- or nitrogen-concentrated area linking the first and second layers.

Josephson junctions and process for making same

A process for fabricating the Josephson junction includes the steps of preparing a substrate, forming a first superconducting layer, forming a second superconducting layer transversely on the first layer with an insulating layer interposed therebetween wherein the insulating layer is an oxide or nitride of the superconducting material, and injecting ion beams into the insulating layer so as to form low oxygen- or nitrogen-concentrated area linking the first and second layers.

Process for making josephson junctions

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Osaka, Japan

Mitsuyoshi Yoshii