Hitachi, Ltd.

Mitsuyoshi Otake

Masahiro Watanabe

Megumi Hamano

Yoshiharu Takizawa

A method for cleaning a solid surface which is effective for a substance to be cleaned having a complicated structure and which uses no solvent such as CFC or the like which is harmful to the environment of the earth. A cleaning liquid is obtained by mixing insoluble particles in a liquid and brought into an eddy-flow state so that a surface to be cleaned can be uniformly cleaned.

Method for cleaning solid surface with a mixture of pure water and

A cleaning apparatus capable of substantially complete removal of contaminations generated during the manufacturing process of glass substrates, semiconductor wafers, magnetic disk substrates, magnetic head substrates or the like. The cleaning apparatus comprises a cleaning bath which is greater in cross section than the material to be cleaned and which has an opening portion for insertion of the material to be cleaned, and an ultrasonic transducer attached to the cleaning bath. The apparatus precludes various defects arising from contaminations, and enhances reliability and yield of the substrates manufactured.

Growing community of inventors

Yokohama, Japan

Mitsuyoshi Otake