Sumitomo Chemical Company, Limited

Mitsuyoshi Ochiai

Koji Ichikawa

Takashi Hiraoka

Masahiko Shimada

Masako Sugihara

Yukako Anryu

Akira Kamabuchi

Takashi Nishimura

Hyungjoo Kim

Masafumi Yoshida

Shota Nakano

A salt represented by formula (I): wherein Qand Qeach independently represent a fluorine atom or a Cto Cperfluoroalkyl group, Rand Reach independently represent a hydrogen atom, a fluorine atom or a Cto Cperfluoroalkyl group, z represents an integer of 0 to 6, Xrepresents *&#x2014;O&#x2014;, *&#x2014;CO&#x2014;O&#x2014; or *&#x2014;O&#x2014;CO&#x2014;, * represents a binding site to CRRor CQQ, Lrepresents a Cto Calkanediyl group, Rrepresents a Cto Calicyclic hydrocarbon group in which a hydrogen atom may be replaced by a hydroxy group, and in which a methylene group may be replaced by an oxygen atom or a carbonyl group, and which alicyclic hydrocarbon group may have a cyclic ketal structure optionally having a fluorine atom; and Zrepresents an organic cation.

Salt, acid generator, resist composition and method for producing resist pattern

A resist composition includes (A1) a resin having an acid-labile group, (A2) a resin which includes a structural unit represented by formula (I), and an acid generator: wherein Rrepresents a hydrogen atom, a halogen atom or a Cto Calkyl group in which a hydrogen atom can be replaced by a halogen atom, Rrepresents a Cto Cfluorinated saturated hydrocarbon group, Arepresents a Cto Calkanediyl group or *-A-X-(A-X)-A-, * represents a binding site to an oxygen atom in &#x2014;O&#x2014;CO&#x2014;, A, Aand Aeach independently represent a Cto Calkanediyl group, Xand Xeach independently represent &#x2014;O&#x2014;, &#x2014;CO&#x2014;O&#x2014; or &#x2014;O&#x2014;CO&#x2014;, and 'a' represents 0 or 1.

Compound, resin, resist composition and method for producing resist pattern

A compound having a group represented by formula (Ia): wherein Rand Reach independently represent a Cto Cfluorinated alkyl group, ring W represents a Cto Calicyclic hydrocarbon group that may have a substituent, and * represents a binding site.

Resin, photoresist composition, and method for producing photoresist pattern

A photoresist composition comprising a resin having an acid-labile group; a salt represented by the formula (I); and a salt represented by the formula (B1). 

Photoresist composition and method for producing photoresist pattern

The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein Trepresents a C4-C34 sultone ring group optionally having one or more substituents, Xrepresents &#x2014;O&#x2014; or &#x2014;N(R)&#x2014;, Rrepresents a hydrogen atom or a C1-C6 alkyl group, when Xis &#x2014;O&#x2014;, Zrepresents *&#x2014;X&#x2014;, *&#x2014;X&#x2014;CO&#x2014;O&#x2014;X&#x2014;, *&#x2014;X&#x2014;CO&#x2014;N(R)&#x2014;X&#x2014;, *&#x2014;X&#x2014;O&#x2014;CO&#x2014;X&#x2014; or *&#x2014;X&#x2014;N(R)&#x2014;CO&#x2014;X&#x2014;, when Xis &#x2014;N(R)&#x2014;, Zrepresents *&#x2014;X&#x2014;, *&#x2014;X&#x2014;O&#x2014;X&#x2014;, *&#x2014;X&#x2014;CO&#x2014;, *&#x2014;X&#x2014;X&#x2014;CO&#x2014;X&#x2014;, *&#x2014;X&#x2014;CO&#x2014;X&#x2014;X&#x2014;, *&#x2014;X&#x2014;X&#x2014;CO&#x2014;X&#x2014;CO&#x2014; or *&#x2014;X&#x2014;CO&#x2014;X&#x2014;X&#x2014;CO&#x2014;, Xand Xindependently each represent a C1-C6 divalent aliphatic hydrocarbon group, Xrepresents &#x2014;O&#x2014; or &#x2014;N(R)&#x2014;, * represents a binding position to X, and Rrepresents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom.

Resin and photoresist composition comprising the same

A salt represented by the formula (X): wherein Qand Qeach independently represent a fluorine atom etc., Land Lindependently each represent a C1-C17 divalent saturated hydrocarbon group, ring Wrepresents a C3-C36 saturated hydrocarbon ring, Ris independently in each occurrence a hydroxyl group etc., s represents an integer of 0 to 2, Zrepresents an organic counter ion, and Wrepresents a group represented by the formula (X-1): wherein ring Wrepresents a C4-C36 saturated hydrocarbon ring in which one or more &#x2014;CH&#x2014; can be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;, with the proviso that at least one &#x2014;CH&#x2014; in the C4-C36 saturated hydrocarbon ring is replaced by &#x2014;CO&#x2014;, Ris independently in each occurrence a C1-C6 alkyl group etc., and t represents an integer of 0 to 2, or a group represented by the formula (X-2): wherein ring Wrepresents a C3-C36 saturated hydrocarbon ring, Ris independently in each occurrence a hydroxyl group etc., Ris independently in each occurrence a C1-C6 alkyl group etc., v represents an integer of 1 to 3, and w represents an integer of 0 to 2.

Salt and photoresist composition containing the same

A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator represented by the formula (II), 

Resist composition and method for producing resist pattern

The present invention provides a salt represented by the formula (I): wherein Qand Qindependently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, Lrepresents a C1-C17 divalent saturated hydrocarbon group in which one or more &#x2014;CH&#x2014; can be replaced by &#x2014;O&#x2014; or &#x2014;CO&#x2014;, ring W represents a C3-C36 aliphatic ring in which one or more &#x2014;CH&#x2014; can be replaced by &#x2014;O&#x2014;, &#x2014;S&#x2014;, &#x2014;CO&#x2014; or &#x2014;SO&#x2014; and in which one or more hydrogen atoms can be replaced by a hydroxyl group, a C1-C12 alkyl group, a C1-C12 alkoxy group, a C3-C12 alicyclic hydrocarbon group or a C6-C10 aromatic hydrocarbon group, Ris independently in each occurrence a fluorine atom or a C1-C6 fluorinated alkyl group, n represents an integer of 1 to 10, and Zrepresents an organic counter ion.

Growing community of inventors

Osaka, Japan

Mitsuyoshi Ochiai