Hitachi, Ltd.

Hitachi Electronics Engineering Co., Ltd.

Hitachi Video Engineering, Incorporated

Mitsuyoshi Koizumi

Nobuyuki Akiyama

Yoshimasa Ohshima

Minori Noguchi

Yoshimasa Oshima

Hiroaki Shishido

Toshihiko Nakata

Sachio Uto

Masataka Shiba

Hiroshi Yamaguchi

Minoru Ikeda

Yoshitada Oshida

Asahiro Kuni

Akira Shimase

Yukio Kembo

Koji Suzuki

Shinji Kuniyoshi

Susumu Aiuchi

Tateoki Miyauchi

Satoshi Haraichi

Yasuhiko Hara

Keiya Saito

Yukio Kenbo

Naoto Nakashima

Motoya Taniguchi

Izuo Horai

Hiroaki Machida

Shigeki Kitamura

Yusuke Miyazaki

Toshiaki Yachi

Yoshihiko Yamuchi

Toshihilo Nakata

Toshihiro Kimura

Noboru Kato

A DNA base sequencer including a gel electrophoretic means having tracks for electrophoresing fluorophore-labelled DNA fragments, a laser diode as a light source for illuminating said tracks with exciting laser light and a CCD sensor for detecting the fluorescence emitted from the illuminated DNA fragments, the laser diode has a control unit including a Peltier device for controlling the temperature of the laser diode, a Peltier device temperature setting generating means having a processor and a memory, and a temperature control circuit that generates a drive current to the Peltier device for controlling its temperature. The CCD sensor receives part of the exciting light from the laser diode as stray light and detects its wavelength. The Peltier device temperature setting generating means is such that, in accordance with the wavelength of stray light as detected periodically with said CCD sensor according to the program stored in said memory, it calculates a corrective value that adjusts the detected wavelength of stray light to the desired wavelength of exciting light that corresponds to the desired temperature setting and that an appropriate temperature setting signal is generated on the basis of said corrective value and the desired temperature setting and sent to the Peltier device temperature control circuit.

DNA base sequencer

An apparatus for detecting extraneous substances on a glass plate includes a first light projecting system arranged above a plane under examination on a glass plate, the surface of which is irradiated with an S-polarized laser beam at a first elevation angle, a second light projecting system arranged above the surface thereof which is irradiated with a P-polarized laser beam at a second elevation angle greater than the first elevation angle, and a light receiving system for receiving scattered light from the surface irradiated with the laser beams respectively emitted from the first and the second light projecting system at an elevation angle smaller than the first elevation angle. The light receiving system is arranged on a side opposite to the direction of irradiation with the normal line set up at the laser beam irradiation point therebetween and the output level of the P-polarized laser beam is set in specific relation to the S-polarized laser beam.

Apparatus for detecting extraneous substances on a glass plate

Disclosed herein are method of and apparatus for detecting a foreign substance on an object by illuminating said object, detecting via an optical system light reflected from said object and detecting said foreign substance in distinction from a background. The object is exposed to first illumination such that light reflected from said background is suppressed but light reflected from said foreign substance is highlighted relative to the light reflected from said background. The light reflected from said object as a result of said first illumination is detected, thereby obtaining a first detection signal. The object is exposed to second illumination such that light reflected from said background is free from suppression relative to the light reflected from said substance as a result of said second illumination. The light reflected from said object as a result of said second illumination is detected, thereby obtaining a second detection signal. Foreign-substance-highlighting processing is performed on said first detection signal by using said second detection signal, whereby said substance is detected.

Method of and apparatus for detecting foreign substances

A circuit pattern to be inspected is imaged so that an image signal representing the circuit pattern to be inspected is produced. The image signal of the circuit pattern is compared with a reference circuit pattern image signal, wherein a part of the image signal discerned to be different from the latter is detected as a candidate defect, at a rate synchronized with the rate of imaging. A local image signal corresponding to each local image covering a region including every one of detected candidate defects is extracted and stored in a memory device. Thereafter, on the basis of the local image signal read out from the memory device, whether or not the candidate defect concerned is fatally harmful with regard to electrical conductivity is examined at a rate asynchronous with the imaging rate.

Method of inspecting defects in circuit pattern and system for carrying

Method of inspecting reticles and an apparatus therefor, where means for holding and transferring an inspected reticle and a standard reticle respectively, means for illuminating light with spatial coherency adjusted onto both reticles respectively, and an objective lens for collecting transmitted light or reflected light from the illuminated body produced by the illuminating, are installed on respective Fourier transformation surfaces of both reticle surfaces, and a light blocking plate for blocking light corresponding to the adjusted spatial coherency is installed, and electric signals obtained are compared thereby a defect or a foreign substance existing on the inspected reticle can be detected.

Method of inspecting reticles and apparatus therefor

A method and apparatus for detecting foreign matter on a sample by illuminating a stripe-shaped region with linearly polarized light. Some of the light reflected by the sample is intercepted by a light intercepting stage, and the rest of the light reflected by the sample, which passes through the light intercepting stage is directed to a detecting optical system, to be detected by a photo-detector. The sample is illuminated obliquely at a predetermined angle with respect to a group of straight lines constituting a primary pattern on the sample. The angle is selected so that the diffraction light reflected by the group of straight lines does not enter the detecting optical system. A polarizing spatial filter using a liquid crystal element may be disposed in a predetermined restricted region in a spacial frequency region, or Fourier transformation plane, within the detecting optical system. The light scattered by the sample may further be separated in the detecting optical system into partial beams having different wave orientation characteristics, which characteristics are detected by a number of one-dimensional solid state imaging elements. The signals are processed by a driver, adder, and quantizer in synchronism with the one-dimensional solid state imaging elements.

Method for detecting foreign matter and device for realizing same

A system for detecting abnormal patterns in a surface pattern on the surface of a sample wherein, when the abnormal pattern has a portion smaller than the surface pattern, the light for illuminating the sample is stopped down to an opening so that the abnormal pattern can be distinguished over the surface pattern, the surface pattern is limited to a predetermined opening by the illumination light to form an image on a detector, and the surface pattern detected by the detector is processed to detect the abnormal pattern in the surface pattern. Further, the plurality of light rays having good directivity are illuminated onto a point on the surface of the sample from dissimilar directions maintaining a predetermined angle of incidence, the detect signals are separated to be corresponded to said light rays, and the above processing is carried out to enhance the precision of detection.

Method and apparatus for detecting abnormal patterns

The present invention relates to a method and apparatus for correcting defects of an X-ray mask which includes a focused ion beam used to irradiate at least a region having a defective portion of an X-ray mask having a protective film and eliminating the protective film; exposing a circuit pattern having a defective portion located under the region or setting this circuit pattern to the state near the exposure; detecting one of the secondary electrons, secondary ions, reflected electrons, or absorbing current generated from that region and detecting a true defective position. Then positioning the focused ion beam to the true defective position and irradiating the focused ion beam to the defective portion thereby correcting the defect.

Method and apparatus for correcting defects of X-ray mask

A method of and an apparatus for detecting a fine foreign substance in which the surface of a specimen is illuminated with linearly-polarized laser beam to detect light scattered from the surface and having passed through a polarization filter, the back side of the specimen is illuminated with light from a light source such as a mercury lamp to obtain the light and darkness information or phase information on the specimen surface by transmitted light from the specimen, and fine massive and filmy foreign substances on the specimen surface are detected on the basis of information given by the scattered light and transmitted light.

Method of and apparatus for detecting foreign substance

Disclosed is an apparatus for detecting particles comprising semiconductor laser drive means for performing feedback control of semiconductor lasers, each thereof incorporating a sensor therewith for monitoring laser-output thereof, by using the output of the sensor, means for holding the feedback voltage, illuminating means including a plurality of optical means disposed to oppose each other so that the laser-outputs from the semiconductor lasers are obliquely applied onto a specimen, and detection means for detecting the light scattered from the particles present on the specimen.

Detection of surface particles by dual semiconductor lasers having

The present invention provides a method for detecting foreign substances which detects a foreign substance with a first photoelectric conversion element by emphasizing the foreign substance and detects a background on the object with a second photoelectric conversion element by emphasizing the background and detects a foreign substance detection signal obtained from the first photoelectric conversion element by emphasizing the signal with a detection signal obtained from the second photoelectric conversion element.

Method and apparatus for inspecting surface defects of a sample in which oblique illumination is applied onto a surface of the sample and in which illuminance of reflected beams generated from the surface is measured. Shading plate having double pinholes or double slits is used as means for shading a scattered beam from aventurine prominences of the sample surface to fully shade the scattered beam so that the inspection is accurately executed.

Method and apparatus for inspecting surface defects on the magnetic disk

The foreign particle detecting method and apparatus are disclosed wherein a polarized laser beam emitted by a laser beam irradiating system from a direction inclined with respect to the direction perpendicular to the surface of a substrate is used by a scanning means to linearly scan the substrate surface from a direction approximately 90.degree. with respect to the laser light irradiating direction; and the laser light reflected from a foreign particle on the substrate surface is detected by a polarized light analyzer and a photoelectric conversion device from a direction set approximately equal to said scanning direction and inclined with respect to the direction perpendicular to the substrate surface.

Foreign particle detecting method and apparatus

An exposure apparatus comprises a light source, a mask plate having an exposure pattern area section and an alignment/reflection area section, a projection lens, a movable stage for holding a workpiece having a workpiece alignment mark, an alignment control and a driver for the movable stage. Before the exposure pattern area section is illuminated by the light source to be projected through the projection lens onto the workpiece, the workpiece is properly aligned with the mask. Alignment between the mask plate and the workpiece is performed by the effective use of the alignment/reflection area section specifically arranged and having a specific structure. The alignment/reflection area section is on that surface of the mask plate which does not face the light source and includes a reflection portion for conducting light from another light source to the workpiece and conducting light scattered from the workpiece and passing through the projection lens to the alignment control and a mask alignment mark portion of providing, when illuminated, an image of the mask alignment mark portion to the alignment control so that it detects the positional relation between the mask alignment mark portion and the workpiece alignment mark and produces a control signal for achieving alignment between the mask plate and the workpiece.

Exposure apparatus and method of aligning exposure mask with workpiece

An automatic contaminants detection apparatus comprises a polarized laser beam source, a polarized laser beam irradiation optical system having irradiation angle switching means for switching an irradiation angle depending on the presence or absence of a pattern on a sample surface to irradiate the polarized laser beam emitted by the polarized laser beam source to the sample surface with an angle of grazing, a detector for detecting condensed scattered or reflected lights of the laser beam from the sample surface with or without interleave of an analyzer, and analyzer switching means for inserting or removing the analyzer into or from a detection light path of the detector depending on the presence or absence of the pattern on the sample surface. The apparatus can detect contaminants on the patterned or non-patterned sample surface with a high sensitivity.

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Yokohama, Japan

Mitsuyoshi Koizumi