Konica Minolta, Inc.

Konica-Minolta Holdings, Inc.

Minolta Company, Ltd.

Japan Science and Technology Agency

Konica Minolta Opto, Inc.

Mitsuru Yokoyama

Koujirou Sekine

Takuji Hatano

Kou Osawa

Hiroaki Ueda

Kyu Takada

Miyuki Teramoto

Susumu Noda

Shigeto Ohmori

Shinji Maruyama

Yukihiro Ozeki

Kazumi Furuta

Eiji Miyai

Manami Kuiseko

Naoki Nishida

Tsuyoshi Iwamoto

Koji Horii

Yuko Yoshida

Naoki Mitsugi

Yuko Yamamoto

In an image projection device including a laser beam source and a diffractive optical element provided on an optical path of a laser beam L from the laser beam source, a transparent member having a refractive index higher than that of an area ahead of an emission surface on the optical path of the laser beam L and a diffractive optical element is formed on an emission surface of the transparent member. The laser beam L is obliquely incident on the diffractive optical element. The diffractive optical element generates a diffraction image in an area which is not overlapped with zeroth order light LR of the laser beam L and an area occupied by a conjugate image, and is arranged in a direction to irradiate a screen with diffracted light forming the diffraction image while substantially eliminating the zeroth order light and the diffracted light forming the conjugate image.

Image projection device and planetarium

A method of manufacturing a high aspect ratio structure includes: a hole forming step of forming a plurality of holes in at least one principal surface of a substrate; a resist forming step of forming a first area with a resist layer and a second area without the resist layer on the principal surface provided with the plurality of holes after the hole forming step ends; and a concave portion forming step of immersing the substrate into an etching solution to form a concave portion in the substrate corresponding to the second area.

Method of manufacturing high aspect ratio structure and method of manufacturing ultrasonic probe

In respective methods for manufacturing a high aspect ratio structure and an ultrasonic probe, a plurality of holes extending in a direction crossing a main surface of a substrate are formed, a plurality of first regions and second regions excluding the first regions from the main surface are periodically defined, and partition walls between the plurality of holes formed in the substrate corresponding to the first regions are removed by etching so that part of each of the partition walls within a predetermined range excluding a bottom portion is left. A high aspect ratio structure and an X-ray imaging apparatus include, over a side wall, a porous member including a plurality of holes extending in a direction crossing a grating surface within a predetermined range excluding a bottom portion in each of a plurality of recesses in a grating.

Method for manufacturing high aspect ratio structure, a method for manufacturing ultrasonic probe, high aspect ratio structure, and X-ray imaging apparatus

A high-aspect ratio structure production method and an ultrasonic probe production method of the present invention include: forming, in a principal surface of a substrate, a plurality of pores each extending in a direction intersecting the principal surface; plugging, among the plurality of pores, one or more pores formed in a first region; and forming a recess in a second region by a wet etching process. A high-aspect ratio structure includes a grating having a plurality of convex portions, wherein each of the plurality of convex portions is provided with a plugging member plugging a plurality of pores formed therein in a thickness direction of the structure.

High-aspect ratio structure production method, ultrasonic probe production method using same, and high-aspect ratio structure

A metal grating structure for X-ray includes a first silicon part having a plate form or a layer form, and a grating portion, wherein the grating portion includes a plurality of second silicon parts formed on the first silicon part, and a plurality of metal parts interposed between the respective adjacent second silicon parts, each of the plurality of metal parts having a deposition start tip part extending toward an inside of the first silicon part.

Metal grating structure for X-ray

An X-ray metal grating structure of the present invention has a grating region in which a plurality of first structural portions are periodically provided, wherein an air gap is formed between each of the plurality of first structural portions and a second structural portion as a remaining part of the grating region other than the plurality of first structural portions. Thus, the X-ray metal grating structure of the present invention is formed as a grating structure having high flatness. A production method therefor comprises a step of forming the air gap between the first structural portion and the second structural portion. Thus, the production method makes it possible to produce an X-ray metal grating structure having high flatness. The present invention further provides an X-ray metal grating unit and an X-ray imaging device each comprising the X-ray metal grating structure.

Metal grating for X-rays, production method for metal grating for X-rays, metal grating unit for X-rays, and X-ray imaging device

A method of designing an electroluminescent device includes preparing a reference device including a construction of an electroluminescent device and a desired analyzed device including a construction of an electroluminescent device, performing quantum optical analysis, electromagnetic field analysis, and ray trace with thicknesses and complex relative permittivities of a first transparent member, a first electrode, a first functional layer, a second functional layer, an emissive layer, and a second electrode as well as a position of a light-emitting point in the emissive layer and a distribution of light-emitting points in the emissive layer being used as design variables, calculating a 'ratio of light extraction efficiency' between the reference device and the analyzed device by computing efficiency of light extraction from the emissive layer into the transparent member or air in both of the reference device and the analyzed device, finding relation of the thickness and the complex relative permittivity of each layer forming the reference device and the analyzed device with the 'ratio of light extraction efficiency,' and obtaining thicknesses and complex relative permittivities of the first transparent member, the first electrode, the first functional layer, the second functional layer, the emissive layer, and the second electrode as the design variables, based on the relation and an electroluminescence spectrum in air and the first transparent member measured by feeding a current to the reference device.

Method of designing electroluminescent device, electroluminescent device manufactured with the design method, and method of manufacturing electroluminescent device with the design method

In one aspect, the present invention provides a curved grating structure manufacturing method which comprises: a grating forming step of forming, in one surface of a grating-forming workpiece, a grating region in which a plurality of members mutually having the same shape are periodically provided; a stress layer forming step of forming a stress layer capable of generating stress, on a grating plane-defining surface of the grating region; a boding step of bonding a support substrate to the stress layer; a polishing step of polishing the other surface of the grating-forming workpiece on a side opposite to the one surface having the support substrate bonded thereto; and a peeling step of peeling off the support substrate from the stress layer, wherein the polishing step includes performing the polishing to allow the grating-forming workpiece to be curved by a stress arising from the stress layer, after the peeling step.

Curved grating structure manufacturing method, curved grating structure, grating unit, and x-ray imaging device

A method of designing an electroluminescent device allows more accurate computation of an external emission spectrum output to the outside in a current injection state and accurate estimate of a quantity and/or a color of light extracted to the outside, an electroluminescent device manufactured with the design method, and a method of manufacturing an electroluminescent device with the design method.

According to a method for manufacturing a metal grating structure of the present invention, in filling a concave portion formed in a silicon substrate (), for instance, a slit groove (SD) with metal by an electroforming method, an insulating layer () is formed in advance on an inner surface of the slit groove (SD) as an example of the concave portion by a thermal oxidation method. Accordingly, the metal grating structure manufacturing method is advantageous in finely forming metal parts of the grating structure. A metal grating structure of the present invention is manufactured by the above manufacturing method, and an X-ray imaging device of the present invention is incorporated with the metal grating structure.

Method for manufacturing metal grating structure, metal grating structure manufactured by the method, and X-ray imaging device using the metal grating structure

An electroluminescent element includes a first transparent electrode, a second transparent electrode, a light emitting layer sandwiched between the first transparent electrode and the second transparent electrode, a first transparent member formed on a surface of the first transparent electrode opposite to the light emitting layer, and a second transparent member formed on a surface of the second transparent electrode opposite to the light emitting layer, wherein refractive indices of the first transparent electrode and the second transparent electrode are selected such that as seen from the light emitting layer, a reflectance of an interface between the light emitting layer and the first transparent electrode becomes higher than a reflectance of an interface between the light emitting layer and the second transparent electrode, and wherein a refractive index of the first transparent member is set to be higher than a refractive index of the second transparent member.

Electroluminescent element and lighting apparatus comprising the same

An organic light-emitting element including an organic light-emitting layer, a transparent substrate, and a transparent electrode disposed between the organic light-emitting layer and the transparent substrate; and which treats the surface of the transparent substrate on the opposite side from the transparent electrode as a light-extraction surface. The transparent substrate has birefringence, and has a refraction index of a P polarized light that is less than a refraction index of an S polarized light. A polarized light wherein an oscillation direction of an electric field is parallel to a laminated surface of the light-emitting layer is designated S polarized light, and a polarized light that includes a vector of the direction of the progression of the light and in which the oscillation direction of the electric field is included in a plane perpendicular to the laminated surface is designated P polarized light.

Organic light-emitting element

A two-dimensional photonic crystal plane emission laser of the invention includes a two-dimensional photonic crystal which has a two-dimensional photonic crystal area and a light reflecting area, and which selects a wavelength of light to be generated in an active layer. The light reflecting area is formed in such a manner that when light leaking from the two-dimensional photonic crystal area and reflected on a reflecting surface of the light reflecting area is returned to the two-dimensional photonic crystal area, the reflection light is combined with a standing wave residing in a propagating direction of the reflection light without disturbing its resonant state.

Two-dimensional photonic crystal plane emission laser

Two-dimensional photonic crystal surface-emitting laser comprising a two-dimensional photonic crystal, having media different in refractive index arrayed in a two-dimensional cycle, disposed in the vicinity of an active layer that emits light by the injection of carriers, wherein the two-dimensional photonic crystal consists of square lattices having equal lattice constants in perpendicular directions, and a basic lattice consisting of a square with one medium as a vertex has an asymmetric refractive index distribution with respect to either one of the two diagonals of the basic lattice to thereby emit light in a constant polarizing direction.

Two-dimensional photonic crystal surface-emitting laser

In an organic EL element, at the interface between a first electrode and a light-emitting layer, a diffraction grating with grating constants a, b, and c is provided in the form of surface irregularities on the first electrode. The grating constants are determined such that, when the effective refractive index as light experiences in the organic EL element is n, with respect to the periods d, d, and ddefining the periodicity of the diffraction grating, n&#xd7;dcorresponds to a red region and n&#xd7;dand n&#xd7;dcorrespond to a blue to green region.

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Takatsuki, Japan

Mitsuru Yokoyama