Matsushita Electric Industrial Co., Ltd.

Nitto-denko Corporation

Idemitsu Kosan Company, Limited

National Institute of Advanced Industrial Science and Technology

Daicel Chemical Industries, Ltd.

Panasonic Corporation

Mitsubishi Chemical Corporation

Jsr Corporation

Kansai Paint Company, Ltd.

Tokyo Institute of Technology

Matsushita Electronic Industrial Co., Ltd

Atsushita Electric Industrial Co., Ltd.

Mitsuru Ueda

Masaru Sasago

Shinji Kishimura

Masayuki Endo

Hirokazu Imori

Toshiaki Fukuhara

Masaya Okamoto

Sadahiro Nakanishi

Jun-ichi Sugiyama

Tsuyohiko Fujigaya

Tatsuya Kanno

Yasuhiro Oshino

Yoshihiro Iguchi

Hiroyuki Takahashi

Yasuhiro Nakamura

Hideaki Takase

Shinji Ando

Yuichi Eriyama

Fumikazu Mizutani

Keisuke Kuriyama

Tadashi Teranishi

Kenji Miyagawa

Tomohide Murase

Yoichi Yonehara

Shuichi Sugawara

Yuzi Shibasaki

Miwa Ariyuki

Yu Shoji

Kazuo Yamanaka

Kazuya Ebara

Sadahrio Nakanishi

Teruaki Hayakawa

Jin-gang Liu

A liquid crystal polyimide, containing: repeating units of formula (I) and having liquid crystallinity, wherein Aand Aare each independently a tetravalent residue of a tetracarboxylic acid, Bis a residue of a bis(amino) polysiloxane of formula (II), and Cis a residue of an organic diamine, wherein Rto Rare each independently a lower alkyl group, x is from 0 to 10, Dis an alkylene group, y is 0 or 1, and Zis selected from the group consisting of &#x2014;H, &#x2014;CH, CF, &#x2014;F, &#x2014;CN and &#x2014;NO. In addition, a liquid crystal resin composition and a resin film for a semiconductor element containing the liquid crystal polyimide.

Liquid crystal polyimide, liquid crystal resin composition containing same, and resin film for semiconductor elements

Provided is a polyfunctional compound which can be used as an optical recording material in which a large quantity of information data can be recorded optically at a high density, which can be used as an optical waveguide material using a refractive index difference occurring between a light-irradiated part and a part not irradiated with light, and which is capable of forming a film and can be used as a photo-alignment film material having excellent photosensitivity.

Polyfunctional compound, optical recording material, optical recording medium, optical recording/reproducing apparatus, optical waveguide material, and photo-alignment film material

Provided is an easy method for production of a high-performance polyfunctional compound which can be used as an optical recording material, an optical waveguide material, a photo-alignment film material, or the like, in a simple manner. The method for production of a polyfunctional compound includes conducting a Michael addition of a compound (A) having a hydrogen atom of pKa&#x2266;15 to a (meth)acrylate or a (meth)acrylamide (B), in which at least one of the compounds (A) and (B) has a photoisomerization group and/or a liquid-crystalline group.

Method for production of polyfunctional compound

A process for producing a carbonic ester, characterized in that an aromatic monohydroxy compound or an aliphatic monohydroxy compound is subjected to oxidative carbonylation with carbon monoxide and oxygen in the presence of a palladium catalyst using a compound having a carbonate bond as a reaction solvent. A process for producing a polycarbonate, characterized in that an aromatic dihydroxy compound or an aliphatic dihydroxy compound is subjected to oxidative carbonylation with carbon monoxide and oxygen in the presence of a palladium catalyst using a compound having a carbonate bond as a reaction solvent is also described. The carbonic ester can be produced with a higher yield and at a higher reaction rate and, also, a polycarbonate having a higher molecular weight as compared with the conventional method can be produced with a higher yield and at a higher reaction rate.

Processes for producing carbonic ester and producing polycarbonate

It is provided for a resin composition including (A) at least one polyamic acid having the structure represented by the following formula (1): wherein Ris independently an alkyl group having 1 to 3 carbon atoms or a cyano group; a is independently an integer of 0 to 4; R is a tetravalent organic group; n is an integer of 1 to 4; and m is an integer of 1 to 100,000, and (E) an organic solvent.

Resin composition, cured product and optical parts

A resist material includes a base polymer containing a compound having a unit represented by a general formula of the following Chemical Formula 1: wherein R, Rand Rare the same or different and are a hydrogen atom, a fluorine atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; Ris a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; Ris a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid; and Ris a group having a cyclic ester compound, a group having an alicyclic compound including a hydroxyl group or a group having a compound including hexafluoroisopropyl alcohol.

Resist material and pattern formation method

A base polymer of a resist material includes a unit represented by a general formula of the following Chemical Formula 3: 

Sulfonamide compound, polymer compound, resist material and pattern formation method

Provided are a catalyst for producing polycarbonate comprising a reaction product obtained by reacting (a) a catalyst carrier containing nitrogen or phosphorus with (b) a palladium compound and (c) a metal compound having a redox catalytic ability and a production process for polycarbonate, comprising a first step in which an aromatic dihydroxy compound and monovalent phenol are reacted with carbon monoxide and oxygen to produce a polycarbonate prepolymer and a second step in which the above polycarbonate prepolymer is subjected to solid state polymerization to produce polycarbonate, wherein the above catalyst is used in the first step described above. The catalyst of the present invention is readily separated from polycarbonate and can repeatedly be used, and the above catalyst makes it possible to efficiently produce polycarbonate of a high quality without using harmful chlorine gas and phosgene and halogenated organic solvents such as dichloromethane and chloroform which are considered to exert an adverse effect on the environment.

Catalyst for polycarbonate production and process for producing polycarbonate

A resist material has a base polymer containing a compound including a copolymer of a first unit represented by a general formula of the following Chemical Formula 1 and a second unit represented by a general formula of the following Chemical Formula 2: wherein R, R, R, R, and Rare the same or different and are a hydrogen atom, a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; Ris a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; Rand Rare the same or different and are a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid; and Ris a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20.

The base polymer of a resist material contains a polymer compound including a first unit represented by a general formula of the following Chemical Formula 4 and a second unit represented by a general formula of the following Chemical Formula 5: wherein R, Rand Rare the same or different and are a hydrogen atom, a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; Ris a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; Rand Rare the same or different and are a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid; Ris a methylene group, an oxygen atom, a sulfur atom or &#x2014;SO&#x2014;; R, R, Rand Rare the same or different and are a hydrogen atom, a fluorine atom, a hydroxyl group, &#x2014;OR, COR, &#x2014;R&#x2014;ORor &#x2014;R&#x2014;COR, at least one of R, R, Rand Rincluding &#x2014;OR, &#x2014;COR, &#x2014;R&#x2014;ORor &#x2014;R&#x2014;COR(wherein R 2 is a straight-chain alkylene group, a branched or cyclic alkylene group or a fluoridated alkylene group with a carbon number not less than 1 and not more than 20 and Ris a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid); 0&#x3c;a&#x3c;1; 0&#x3c;b&#x3c;1; and c is 0 or 1.

Polymer compound, resist material and pattern formation method

The base polymer of a resist material contains a polymer compound including a first unit represented by a general formula of the following Chemical Formula 5 and a second unit represented by a general formula of the following Chemical Formula 6: wherein R, R, R, R, Rand Rare the same or different and are a hydrogen atom, a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; Ris a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; R, Rand Rare the same or different and are a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid; Ris a fluorine atom, or a straight-chain fluoridated alkyl group or a branched or cyclic fluoridated alkyl group with a carbon number not less than 1 and not more than 20; 0&#x3c;a&#x3c;1; 0&#x3c;b&#x3c;1; d is 1 or 2; e is 0, 1, 2, 3 or 4; and 1&#x2266;d+e&#x2266;5.

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Tokyo, Japan

Mitsuru Ueda