Canon Kabushiki Kaisha

Mitsuru Seki

Takeshi Nakajima

Yasuhito Sasaki

Masato Hagiri

Satoshi Tomura

An optical apparatus includes an optical component, a support mechanism configured to support the optical component, a manipulation mechanism configured to manipulate the optical component while contacting the optical component such that a state of the optical component is changed. The optical component is changed by the manipulation mechanism from a first state in which the optical component is supported by the support mechanism to a second state in which the optical component is supported by the manipulation mechanism.

Optical apparatus, exposure apparatus, method of manufacturing optical apparatus, and method of manufacturing article

There is provided a projection optical system that projects an image of an object onto an image plane. The projection optical system includes an imaging optical system including a first concave mirror, a convex mirror, and a second concave mirror; an optical member having a first reflecting surface and a second reflecting surface each redirecting an optical path; and a supporting member that supports the convex mirror. The first reflecting surface, the first concave mirror, the convex mirror, the second concave mirror, and the second reflecting surface are provided in that order in a direction of travel of light from an object plane. The optical member has a through hole having an opening on a side facing the convex mirror. The supporting member extends through the through hole and from the opening to the convex mirror.

Growing community of inventors

Chikusei, Japan

Mitsuru Seki