Nec Corporation

Mitsuru Narihiro

Hisashi Takemura

Hitoshi Wakabayashi

Risho Koh

Atsushi Ogura

Yukishige Saito

Tohru Mogami

Yukinori Ochiai

Shigeharu Yamagami

Toyoji Yamamoto

Jong-Wook Lee

Kohichi Arai

A process for manufacturing a semiconductor device, in which a current flows in a deflected part that includes a semiconductor, includes forming a straight beam having a doubly-clamped beam structure that includes the semiconductor by forming a void under the beam, filling the void with a liquid, and contacting a center of the beam with a bottom of the void by drying the liquid to form the deflected part.

Semiconductor device and manufacturing process therefor

This invention relates to a semiconductor device having a beam made of a semiconductor to which strain is introduced by deflection, and a current is permitted to flow in the beam.

Semiconductor device including a deflected part

A semiconductor device includes a semiconductor layer formed on an insulator, a gate insulating film formed on the semiconductor layer, a gate electrode formed on the gate insulating film and extending in a first direction, source/drain regions formed in the semiconductor layer on both sides of the gate electrode, a body contact region in the semiconductor layer, a partial isolating region in which a field insulating film thicker than the gate insulating film intervenes between the semiconductor layer and an extending portion of the gate electrode, and a full isolating region in which the semiconductor layer on the insulator is removed. The full isolating region is formed to be in contact with at least a part of a side parallel to the first direction of the source/drain regions.

SOI MOSFET

Pattern data are divided into light beam exposure pattern data and electron beam exposure pattern data free of any overlap margin. Overlap margins are given without size-reduction to the electron beam exposure pattern in order to avoid any disappearance of any parts of the fine pattern.

Method of preparing pattern data to be used for different exposure methods

Growing community of inventors

Tokyo, Japan

Mitsuru Narihiro