Hitachi Chemical Company, Ltd.

Hitachi, Ltd.

Mitsuo Yamazaki

Nobuo Ichimura

Hitoshi Yokono

Ryoichi Sudo

Masaaki Okunaka

Masao Kawasumi

Yasuo Miyamoto

Takashi Masuko

Yasuo Miyadera

Masami Yusa

Tokio Isogai

Shinji Takeda

Tohru Kikuchi

Hidetaka Satou

Kohei Fujita

Mitsuo Nakatani

Iwao Maekawa

Kenji Tochigi

Koei Fujita

Yauso Miyamoto

An electrically conductive bonding film useful in bonding an IC or LSI with a lead frame. The film comprises (A) a polyimide resin obtained by reacting a tetracarboxylic dianhydride component, in which the content of a tetracarboxylic dianhydride represented by the following formula (I): ##STR1## wherein n stands for an integer of 2-20 amounts to at least 70 mole %, with a diamine; and (B) an electrically conductive filler. Optionally, the film may further comprises a thermosetting resin or an imide compound having at least two thermally-crosslinking imido groups per molecule.

Electrically conductive bonding films

Described is an electrically conductive bonding film useful in bonding an IC or LSI with a lead frame. The film comprises (A) a polyimide resin obtained by reacting a tetracarboxylic dianhydride component, in which the content of a tetracarboxylic dianhydride represented by the following formula (I): ##STR1## wherein n stands for an integer of 2-20 amounts to at least 70 mole %, with a diamine; (B) an electrically conductive filler, and a thermoset resin. Optionally, the film may further comprises a thermosetting resin or an imide compound having at least two thermally-crosslinking imido groups per molecule.

An adhesive composition comprising (a) an epoxy resin obtained by reacting a 1,3-bis(dicarboxyphenyl)-1,1,3,3-tetrasubstituted disiloxane dianhydride with an alcohol or alcohol derivative, followed by reaction with an epoxy compound having two or more epoxy groups, or an epoxy resin obtained by reacting a 1,3-bis(dicarboxyphenyl)-1,1,3,3-tetrasubstituted disiloxane with an epoxy compound having two or more epoxy groups and (b) a curing agent is suitable for bonding semiconductor chips to a copper frame with a small warpage of the chips.

Epoxy resin and adhesive composition containing the same

An adhesive composition comprising (a) an epoxy resin obtained by reacting a 1,3-bis(dicarboxyphenyl)-1,1,3,3-tetrasubustituted disiloxane dianhydride with an alcohol or alcohol derivative, followed by reaction with an epoxy compound having two or more epoxy groups, or an epoxy resin obtained by reacting a 1,3-bis(dicarboxyphenyl)-1,1,3,3-tetrasubstituted disiloxane with an epoxy compound having two or more epoxy groups and (b) a curing agent is suitable for bonding semiconductor chips to a copper frame with a small warpage of the chips.

An electroconductive resin paste suitable for bonding a semiconductor element onto a substrate and exhibiting a superior adhesion strength and processability when heated to 200.degree. C. to 350.degree. C., and a process for producing a semiconductor device using the electroconductive resin paste are provided, which electroconductive resin paste comprises.

Electroconductive resin paste containing mixed epoxy resin and

An electroconductive adhesive comprising an epoxy-novolak resin, a phenol-aralkyl resin, a glycidyl group-containing silane coupling agent, an organic borate and an electro-conductive metal power is excellent in reliability in moisture and hydrolytic resistance and useful for semiconductor devices.

Electroconductive adhesive comprising an epoxy novolak resin and

An electroconductive resin paste, comprising a resin obtained by reacting 0.01 to 0.5 carboxylic acid equivalent of a homopolymer or a copolymer of butadiene having carboxylic acid terminal groups with 1 epoxy equivalent of an epoxy resin having two or more epoxy groups in one molecule, a curing agent and an electroconductive filler which is (i) an electroconductive metal powder or (ii) an inorganic insulating powder coated with a surface electroconductive film, said electroconductive filler being in an amount of from 60 to 95% by weight based on the resin and the electroconductive filler.

Electroconductive resin paste

A transparent conducting film is prepared from a composition comprising an indium compound, a tin compound, and a solvent as essential components, the tin compound being a compound represented by the following general formula:

Composition and process for preparing transparent conducting film

A transparent electroconductive film of lower resistance with a smaller content of remaining organic components and less pinholes than those of the conventional transparent electroconductive film is produced by applying a coating solution selected from (a) a coating solution comprising an inorganic indium compound free from a photosensitive group in the molecule or an inorganic tin compound free from a photosensitive group in the molecule, an organic ligand, and an organic solvent, (b) a coating solution comprising an organic indium compound free from a photosensitive group in the molecule, or an organic tin compound free from a photosensitive group in the molecule, and an organic solvent, and (c) the coating solution (a) or (b) further containing a dopant to the surface of a substrate, thereby forming a film thereon, and then irradiating the substrate with radiation capable of exciting organic groups, for example, ultraviolet rays in a state where the substrate is kept at a high temperature (100.degree.-600.degree. C.), and then baking the substrate at a high temperature.

Process for producing transparent electroconductive film

Transparent electroconductive film having no cracks and whitening is obtained by coating on a substrate a composition comprising an inorganic indium salt, a polybasic carboxylic acid or polybasic carboxylic acid anhydride and a solvent, and calcining the coated composition at a temperature of 300.degree. to 700.degree. C. under an atmosphere containing oxygen. When a tin compound is added to the composition, sheet resistance of the transparent electroconductive film can be adjusted favorably.

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Takahagi, Japan

Mitsuo Yamazaki