Fujitsu Corporation

Fujitsu Semiconductor Limited

Fujitsu Microelectronics Limited

Mitsuo Sakurai

Masahiko Minemura

Taketoshi Omata

Mikayo Wada

Koichi Suzuki

Richard A Lethin

Kazuhiko Takahashi

Tomoyuki Okada

Naoyuki Ishiwata

Takahisa Ito

Giro Hirai

Kazuya Sugawa

Norimasa Nagase

Ryo Tsujimura

Takahisa Itoh

Shuji Osada

Muneto Saito

Charles D Garrett

Joseph A Bank, Iii

Kenji Chichii

Shigenori Koyata

Toshiyuki Kitami

Kenichi Arika

Yasuyuki Kushida

A method of making pattern data of a photomask pattern includes: the processes of adding, to each of first cells, information of the first cell higher than the first cell on the basis of a hierarchical structure; selecting, from the first cells included in one level of the hierarchical structure, the first cell identical to one of the first cells included in a level higher than the one level and the first cell placed inside two or more of the first cells included in a level immediately higher than the one level, and forming a cell group with the selected first cells; making pattern data of the first cells not included in the cell group in consideration of the optical proximity effect and forming a fourth cell group with second cells including the pattern data; and replacing the first cells with the corresponding second cells in input data.

Method of making pattern data, and medium for storing the program for making the pattern data

A pattern data processing method comprising, obtaining pattern data on a mask pattern, determining whether a processing time for the mask pattern in a processing software is reduced by rotating the mask pattern by a predetermined angle than a case where the mask pattern is processed in the processing software without being rotated, obtaining pattern data on a rotated pattern formed by rotating the mask pattern by the predetermined angle in the case that the processing time is reduced, processing the pattern data on the rotated pattern by using the processing software, and causing the mask pattern to return to its original direction.

Pattern data processing system, pattern data processing method, and pattern data processing program

A method of performing optical proximity effect correction includes defining a partial area of an entire area of a mask pattern, the mask pattern including a real pattern and a dummy pattern, and performing optical proximity effect correction only with respect to the partial area.

Optical proximity correction performed with respect to limited area

A method of verifying optical proximity correction includes the steps of generating first mask pattern data from design data under first condition, generating first corrected pattern data by applying optical proximity correction to the first mask pattern data, generating second mask pattern data from the design data under second condition, generating second corrected pattern data by applying optical proximity correction to the second mask pattern data, and comparing the first corrected pattern data and the second corrected pattern data to check whether the first corrected pattern data and the second corrected pattern data match.

Method and system for efficiently verifying optical proximity correction

A method for correcting pattern data is provided which is capable of making a proper correction to data of a pattern having a complicated layout. A correction is made to pattern data affected by a proximity effect when a pattern is formed on a photomask or wafer according to design data for a semiconductor device, by detecting, according to the design data, a space portion being placed on a photomask or wafer and having a specified size occurring between patterns facing each other in a first direction, by producing pattern data corresponding to an assist pattern that fills the space portion, by detecting an edge to be corrected in a position being opposite to an edge of the assist pattern extending in a second direction between the patterns facing each other, out of framing portions of the pattern being placed in parallel and near to the assist pattern, by making a correction being independent of a correction to be made to other edge of the framing portion to the detected edge to be corrected, and by removing the assist pattern.

Method for correcting pattern data and method for manufacturing semiconductor device using same

An apparatus for designing a mask that enables quick mask design. A generation unit generates data regarding a mask pattern formed on a mask from design data regarding an exposure pattern transferred onto a semiconductor substrate. A calculation unit calculates an exposure pattern transferred onto the semiconductor substrate by applying a filter having a predetermined characteristic to the data regarding a mask pattern generated by the generation unit. A correction unit corrects the data regarding a mask pattern generated by the generation unit by comparing the exposure pattern calculated by the calculation unit and the design data.

Apparatus, method, and program for designing a mask and method for fabricating semiconductor devices

An optimizing object code translation system and method perform dynamic compilation and translation of a target object code on a source operating system while performing optimization. Compilation and optimization of the target code is dynamically executed in real time. A compiler performs analysis and optimizations that improve emulation relative to template-based translation and interpretation such that a host processor which processes larger order instructions, such as 32-bit instructions, may emulate a target processor which processes smaller order instructions, such as 16-bit and 8-bit instructions. The optimizing object code translator does not require knowledge of a static program flow graph or memory locations of target instructions prior to run time. In addition, the optimizing object code translator does not require knowledge of the location of all join points into the target object code prior to execution. During program execution, a translator records branch operations. The logging of information identifies instructions and instruction join points. When a number of times a branch operation is executed exceeds a threshold, the destination of the branch becomes a seed for compilation and code portions between seeds are defined as segments. A segment may be incomplete allowing for modification or replacement to account for a new flow of program control during real time program execution.

Dynamic optimizing object code translator for architecture emulation and dynamic optimizing object code translation method

There are independently made data of a device pattern, an identification and scribe pattern including a scribe pattern surrounding the device pattern, identification patterns formed in a scribe region indicated by the scribe pattern and outer periphery of the scribe region, and an outer peripheral pattern formed outside the scribe region except the identification pattern. From the data, data for an exposure system or a mask inspection apparatus are produced. The outer peripheral pattern is divided into a plurality of patterns each is a unit of a exposure region.

Method of manufacturing mask using independent pattern data files

The present invention introduces an object conversion apparatus with both advantages of the dynamic object conversion and advantages of the static object conversion. In the object conversion apparatus, an application program to be converted is divided into some blocks, and a page table is provided in order to specify whether each block is processed by the dynamic object conversion or the static object conversion. Based on the information specified in the page table, an instruction in the block used with high frequency is processed with the dynamic object conversion, and an instruction in the block used with low frequency is processed with the static object conversion.

Object conversion apparatus, object conversion method and program storing medium

In a cache system for executing a cache operation for an external storage device, there is disposed a block number table for stopping a cache function for an external storage device, for which a storage medium is exchanged, when the storage medium of the external storage device is exchanged, and stores the number of data stored from each external storage device into the cache memory when all the data cached from a certain external storage device are purged out by a purging process or an LRU process, so as to restore the cache function of this external storage device.

Growing community of inventors

Kawasaki, Japan

Mitsuo Sakurai