Panasonic Corporation

Matsushita Electric Industrial Co., Ltd.

Panasonic Intellectual Property Management Co., Ltd.

Mitsuo Saitoh

Tomohiro Okumura

Masashi Morita

Ichiro Nakayama

Junko Asayama

Satoshi Maeshima

Masaharu Terauchi

Tadashi Kimura

Yoichiro Yashiro

Yukio Nishikawa

Yoshiyasu Honma

Takafumi Okuma

Naoki Nojiri

Izuru Matsuda

Takayuki Kai

Hideaki Hamada

Yukihiro Maegawa

Kenichi Sato

Hiroyuki Yamakita

Kenichiro Suetsugu

Noriyasu Echigo

Akio Furusawa

Toshiyuki Kojima

Keisuke Okada

Masato Maede

Hiroshi Kawazoe

Kazuto Fukuda

Motoi Hatanaka

Tsutomu Fujii

Fumihiko Kawai

Hiroshi Tanabe

Nobuyuki Kamikihara

Tsuyoshi Nomura

Hideki Yamashita

Kenji Tanimoto

Yukiya Usui

Yoshimasa Takii

Hironobu Inoue

Kouji Okazaki

Taro Kitaoka

A press-forming apparatus includes a punch, a die having an inclined surface, and a die holding plate. A blank holder has a holding surface, and a die load sensor detects a load in a pressing direction, a load in a first direction perpendicular to the pressing direction, and a load in a second direction perpendicular to the first direction. A controller calculates a normal force of the die based on the loads in the pressing direction, in the first direction, and in the second direction. The loads are detected by the die load sensor, and the controller calculates the amount of correction of clearance between the die and the blank holder based on the normal force of the die. The first driver moves the die in the pressing direction based on the amount of correction of clearance, and a second driver drives the punch in the pressing direction.

Press-forming apparatus

A motor includes a rotor and a stator. The stator is formed by laminating a plurality of magnetic thin strips each having a plurality of teeth parts. The magnetic thin strip includes an elliptical-shaped inner diameter part formed along tip end portions of the plural teeth parts. At least one magnetic thin strip in the laminated magnetic thin strips is shifted by a given angle with respect to other magnetic thin strips in a horizontal direction, and positions of all teeth parts of the laminated magnetic thin strips correspond to one another to reduce cogging torque.

Stator and motor

A soft magnetic powder that can exhibit desirable soft magnetic characteristics. A dust core using the soft magnetic powder is also provided. The soft magnetic powder includes: a soft magnetic powder layer of an unoxidized soft magnetic material; a second oxide layer as an oxide with iron or boron residing around the soft magnetic powder layer; and a first oxide layer of an iron oxide residing around the second oxide layer. The first oxide layer and the second oxide layer reside in a region of 20 nm or more and 500 nm or less from a surface of the soft magnetic powder, and are absent in a region of more than 500 nm and 1,600 nm or less from the surface.

Soft magnetic powder, method for producing same, and dust core using soft magnetic powder

An iron core including a laminate of a plurality of fixed electromagnetic steel sheets, a laminate of alloy thin strips which is sandwiched between the laminate of the electromagnetic steel sheets, a fastening mechanism which penetrates the laminates of electromagnetic steel sheets and alloy thin strips, and a fixing base. The laminate of alloy thin strips reduces compressive and torsional forces acting on the laminate of alloy thin strips by using the iron core having a structure in which upper and lower portions of a laminate of alloy thin strips having nanocrystal grains are sandwiched together with laminates of amorphous alloy thin strips. Furthermore, a motor including a rotor and the above-described iron core is used.

Iron core and motor using iron core

The purpose of the present invention is to obtain a finer texture for a silicon substrate having a textured surface and thereby obtain a thinner silicon substrate for a solar cell. The invention provides a silicon substrate that has a thickness of 50 [mu]m or less and substrate surface orientation (111), and that has a textured surface on which a texture has been formed. Such a silicon substrate is produced by a process comprising a step (A) for preparing a silicon substrate that preferably has a thickness of 50 [mu]m or less and substrate surface orientation (111), and a step (B) for texturing by blowing etching as comprising a fluorine-containing gas onto the surface of the prepared silicon substrate.

Silicon substrate having textured surface, solar cell having same, and method for producing same

A base material is placed on a base material placement face of a base material placement table. An inductively coupled plasma torch unit is structured with a cylindrical chamber structured with a cylinder made of an insulating material and provided with a rectangular slit-like plasma jet port, and lids closing opposing ends of the cylinder, a gas jet port that supplies gas into the cylindrical chamber, and a solenoid coil that generates a high frequency electromagnetic field in the cylindrical chamber. By a high frequency power supply supplying a high frequency power to the solenoid coil, plasma is generated in the cylindrical chamber, and the plasma is emitted from the plasma jet port to the base material. While relatively shifting the plasma torch unit and the base material placement table, a base material surface can be subjected to heat treatment.

Plasma processing apparatus and plasma processing method

In a plasma torch unit, a conductor rod having a spiral shape is disposed inside a quartz pipe having a surface coated with boron glass, and a brass block is disposed on the periphery thereof. While a gas is being supplied into a cylindrical chamber, a high-frequency power is supplied to the conductor rod and a plasma is generated in the cylindrical chamber, so that a base material is irradiated with the plasma.

Plasma doping method and apparatus thereof

Evaporation chamber for depositing a protective film on a surface, where a dielectric layer is formed, of front substrate, front substrate is formed a display electrode and the dielectric layer thereon; transporting unit for transporting front substrate into evaporation chamber; gas introducing units for introducing gas containing HO into evaporation chamber; and partial pressure detecting unit for measuring a certain partial pressure of gas within evaporation chamber, extending from the center of deposition space of evaporation chamber to the downstream of transport direction of front substrate are provided. Gas containing HO is introduced from gas introducing units such that the partial pressure of gas is controlled in the partial pressure detecting unit.

Method of manufacturing plasma display panel

A method for restoring the function of a plasma display panel according to the present invention restores a function of a plasma display panel by raising the temperature of the plasma display panel to 400&#xb0; C. to 800&#xb0; C.

Method for restoring function of plasma display panel and plasma display panel

A PDP having display electrodes formed on a front glass substrate, a dielectric layer, and a protective film is provided, where the protective film is a metal oxide film which includes magnesium oxide, and the product of the film thickness at any arbitrary point in the protective film and the ratio of the maximum luminescence intensity of light emission having a wavelength between 400 nm and 450 nm to the maximum luminescence intensity of light emission having a wavelength between 330 nm and 370 nm as measured in accordance with the cathode luminescence method at the arbitrary point has variation within a range of &#xb1;15% as the distribution within the surface of the protective film.

Plasma display panel

Disclosed is a dense silicon oxide film having a high insulation resistance, which is a glass film having a certain level of thickness. Specifically, disclosed are a silicon oxide film, and a glass film comprising the silicon oxide film and silica particles incorporated in the silicon oxide film. The glass film can be produced by a process comprising the steps of: applying a paste comprising silica particles, an organic silicon compound which is in a liquid form at room temperature and water onto a substrate; and oxidizing the organic silicon compound in the paste.

Glass film, process for production thereof, and optical electronic device

The present invention provides a front panel for a plasma display panel which can suppress the incidence of chipping of the barrier rib of a rear panel for a PDP, can enhance the stability of initial electron emission in a dielectric layer, and can reduce a voltage required for maintaining a wall charge. The front panel for a plasma display panel includes a substrate, a plurality of electrodes formed on the substrate, a dielectric layer formed to cover the respective electrodes and the substrate, a dielectric-protection layer formed to cover the dielectric layer, and powder components dispersed on the dielectric-protection layer, wherein an annealed layer having a thickness of 10 to 300 nm is formed on at least the exposed surface of each of the powder components, wherein said exposed surface does not contact the dielectric-protection layer.

Front panel for plasma display panel and method for producing the same

A fluorine-containing precoating is formed to cover a phosphor particle by, for example, a physical vapor deposition of a fluoride. Then, a fluorine-containing coating covering the phosphor particle is formed by supplying fluorine into the precoating. This obtained phosphor particle with the coating is applied in the form of a paste to a substrate on each electrode between two adjacent ribs to form a phosphor layer including phosphor particles between the ribs on the substrate. The substrate is positioned with respect to another substrate having electrodes thereon to form discharge spaces between the substrates. The discharge spaces are filled with a discharge gas to produce a plasma display panel.

Plasma display panel and process for producing the plasma display panel

A plasma source includes a gas flow channel formed therein and an electrode which is fed with electric power or grounded to be maintained at a controlled electric potential and a surface of the plasma source including an opening portion of a first gas ejecting port can be placed in parallel to a position at which a to-be-processed object can be placed. The plasma source is connected to a first gas supplying device through a gas supplying portand has a multi-layer construction that is constituted from two or more layers. Gas flow channels within the multi-layer construction include buffer spaces and at least one space cross-sectional area parallel to the opening cross-sectional area of the first gas ejecting ports, out of the cross-sectional areas of the buffer spaces, is greater than the opening cross-sectional area of the first gas ejecting ports.

Plasma processing apparatus and method

A plasma processing method capable of processing an object with fine linear portions. The method employs a plate-shaped insulator that is disposed adjacent to a plate-shaped electrode. In the method, a discharge gas containing an inert gas is supplied to a vicinity of an object to be processed from one gas exhaust port located near the plate-shaped electrode, out of at least two-line gas exhaust ports which are disposed adjacent the plate-shaped electrode. The exhaust ports are formed on opposite sides of the plate-shaped insulator and are different in distance to the plate-shaped electrode. A discharge control gas is supplied from the other gas exhaust port to the vicinity of the object. Simultaneously with the supply of the gases, electric power is supplied to the plate-shaped electrode or the object, by which plasma processing of the processing object is carried out.

Growing community of inventors

Neyagawa, Japan

Mitsuo Saitoh