Asahi Kasei Kogyo Kabushiki Kaisha

Asahi Kasei Kogyo

Mitsuo Kohno

Katsumi Yoshitake

Noboru Fujikawa

Tadashi Taguchi

Kunio Satake

Yoshinao Doi

Yoshihiko Muto

Yukinori Matsuoka

Kazuo Matsuda

Isao Yoshimura

Shigeki Katayama

Takashi Nakao

Tsuneo Igarashi

Minoru Nomura

Toshihide Takemoto

Yasunori Fukumitsu

The present invention relates to a highly sensitive heat-sensitive film for stencil. This invention provides a highly heat-sensitive film for stencil, comprising a thermoplastic resin having a coefficient of temperature and melt viscosity (.DELTA.T/.DELTA. log VI) of not more than 100 and a thermal shrinkage (X%) at 100.degree. C. and a thermal shrinkage stress (Y g/mm.sup.2) at 100.degree. C. falling respectively in the ranges of the formulas; 15.ltoreq.X.ltoreq.80 and 75.ltoreq.Y.ltoreq.500; and both falling in the range of the formula; -8X+400.ltoreq.Y.ltoreq.-10X+1000; having a thickness in the range of 0.5 to 15 .mu.m, and excelling in low-energy perforation property. The film of this invention is superior in a low temperature perforation property, capable of being perforated with a low energy thermal head or with a low energy flash irradiation for making a plate; expansion of perforations is small when the film is perforated; and its change with time (dimensional change) is small and its sizes are stable.

Highly heat-sensitive film for stencil

Dust cover superior in transparency for photomask reticle use and

A porous membrane formed of a thermoplastic resin having a critical surface tension of not higher than 35 dyn/cm and having a three-dimensional network structure is provided. Communicating pores having a porosity of at least 60% and an average pore diameter of 0.1 to 2.0 microns are formed in the porous membrane. The strength factor F defined by the following formula is at least 1 as measured in any direction: F=A/[B(1-.alpha.)], wherein A is the tensile strength at break of the membrane, B is the tensile strength at break of a non-porous film formed of the same resin and .alpha. is the porosity fraction of the membrane. The thickness of the porous membrane is 5 to 500 microns. The porous membrane is prepared by a process wherein a porous membrane formed of a thermoplastic resin having a critical surface tension of not higher than 35 dyn/cm and having a three-dimensional network structure including communicating pores having an average pore diameter of 0.05 to 1 micron with a porosity of 30 to 70%, is subjected to a space drawing operation in at least one direction at a temperature between 50.degree. C. lower than the melting or softening point of the thermoplastic resin and 5.degree. C. lower than the melting or softening point of the thermoplastic resin.

Thermoplastic resin porous membrane having an increased strength factor

A sulfonated polyolefin porous membrane containing sulfonic groups in an amount, in terms of exchange capacity, of 0.05 to 1 milliequivalent per gram of the sulfonated polyolefin and having a porosity of 30 to 85% and an average pore diameter of 0.05 to 1.mu. has been found to be excellent in water permeability, removal capability, water-permeability retention, mechanical strength and elongation, etc. The porous membrane of the present invention may advantageously be employed as a fine microfilter or the like. The porous membrane of the present invention may be easily prepared by treating with a sulfonating agent a polyolefin porous membrane preferably containing an inorganic filler which is subsequently extracted from the membrane.

Hydrophilic sulfonated polyolefin porous membrane and process for

A photopolymerizable element comprising a layer of a photopolymerizable composition and a liquid developer-soluble or -dispersible transparent oriented film support laminated onto one surface of the photopolymerizable composition layer is advantageously employed for the production of a polymeric image without stripping of the film support. The element may further comprise a strippable protective film provided on the other surface of the photopolymerizable composition layer. The element of this invention is useful especially for the production of photoresists which are advantageously used for the manufacture of printed circuit boards.

Photopolymerizable element comprising a soluble or dispersible oriented

Disclosed is a biaxially drawn polyhexamethylene adipamide film having a relative viscosity of at least 3.2 as measured at 25.degree. C. in aqueous 96% H.sub.2 SO.sub.4, a degree of crystallinity of from 35% to 45%, a birefringence (.DELTA.n) of not more than 0.006, as determined at any point in its entire area, and an initial modulus of elasticity in tension of at least 230 kg/mm.sup.2 as determined in ay direction across substantially its entire area. The film may be produced by a process wherein molten polyhexamethylene adipamide is extruded through a circular die gap and the tubular extrudate is brought in sliding contact with the outer periphery of an inside mandrel, thereby to be cooled, which process is characterized in that polyhexamethylene adipamide having a relative viscosity of from 3.3 to 5.0, as measured at 25.degree. C. in aqueous 96% H.sub.2 SO.sub.4, is used; the tubular extrudate formed therefrom is cooled at a cooling rate (X.degree. C./sec.) satisfying the following formula with respect to the relative viscosity of the polymer used,

Biaxially drawn polyhexamethylene adipamide film and process for

A novel photopolymerizable composition comprising (a) a non-gaseous ethylenically unsaturated compound, (b) a thermoplastic organic polymer binder, (c) a photopolymerization initiator and (d) a specific s-triazine compound provides improved adhesion of a photopolymer prepared therefrom to a substrate even in aqueous plating or etching solutions.

Photopolymerizable composition containing s-triazine compound

A process for producing an image which comprises the steps of: (1) applying to the surface of a substrate the surface of a photosensitive layer, the other surface of the photosensitive layer being adhered to a substantially transparent film support which is soluble or dispersible in a developer consisting essentially of a liquid capable of substantially dissolving or dispersing therein the areas of the layer other than those having a polymeric image produced by imagewise exposure in the step (2) below; (2) exposing the photosensitive layer, imagewise, to actinic radiation to form a polymeric image in the layer; and (3) washing away with the developer the film support and the areas of the layer other than those having the polymeric image to form an image of a polymeric material on the substrate. The photosensitive element having on its one side the above-mentioned specific film support and the process have a variety of applications and are useful for producing photoresists which are advantageously used for making printed circuit boards.

Oriented polystyrene support for photopolymerizable element

Disclosed is a biaxially drawn polyhexamethylene adipamide film having a relative viscosity of at least 3.2 as measured at 25.degree. C. in aqueous 96% H.sub.2 SO.sub.4, a degree of crystallinity of from 35% to 45%, a birefringence (.DELTA.n) of not more than 0.006, as determined at any point in its entire area, and an initial modulus of elasticity in tension of at least 230 kg/mm.sup.2 as determined in any direction across substantially its entire area. The film may be produced by a process wherein molten polyhexamethylene adipamide is extruded through a circular die gap and the tubular extrudate is brought in sliding contact with the outer periphery of an inside mandrel, thereby to be cooled, which process is characterized in that polyhexamethylene adipamide having a relative viscosity of from 3.3 to 5.0, as measured at 25.degree. C. in aqueous 96% H.sub.2 SO.sub.4, is used; the tubular extrudate formed therefrom is cooled at a cooling rate (X.degree. C./sec.) satisfying the following formula with respect to the relative viscosity of the polymer used,

Biaxially drawn polyhexamethylene adipamide film

Process for producing image using laminated oriented cover film

An alkaline battery separator made of a porous film which consists substantially of a polyolefin having a weight average molecular weight of less than 300,000 and a number average molecular weight of 15,000 or more and which has a thickness of 0.025 to 1 mm, a porosity of 50 to 80%, an average pore diameter of 0.05 to 0.5.mu. and an average ratio of the larger dimension to the smaller dimension of the pore opening of not more than 2. The alkaline battery separator has not only an extremely low electrical resistance and a high alkali resistance but also a transmission-inhibitive ability for the active materials of battery and is excellent in mechanical strength and flexibility. It does not show appreciable shrinkage by heat. For producing such an alkaline battery separator, 10 to 50 volume percent of a polyolefin, 7 to 42 volume percent of an inorganic filler and 30 to 75 volume percent of an organic liquid having a solubility parameter of from 8.6 to 9.9 inclusive are blended, the amount of the polyolefin being 2/3 to 9 multiple of the amount of the inorganic filler, and the resulting blend is subjected to melt-molding to form a film, followed by extraction of the organic liquid and the inorganic filler from the film. In the extraction of the organic liquid and the inorganic filler, the film does not undergo shrinkage to provide a separator having excellent characteristics.

Alkaline battery separator

Films having good dimensional stability and practically no tendency of fibrillation and also other superior mechanical properties can be obtained easily and at a high production speed by stretching a layer of a substantially amorphous polymer consisting mainly of polyethylene-1,2-diphenoxyethane-4,4'-dicarboxylate at a temperature in the range from Tg to 100.degree.C (wherein Tg is a glass transition point) in the longitudinal direction to 1.5 to 3 times the original length and further stretching the resulting film at a high temperature of 150.degree.C or higher and a high stretching velocity 40000% per minute or higher in the longitudinal direction to give a total stretching ratio of 3.1 times or more.

Growing community of inventors

Yokohama, Japan

Mitsuo Kohno