Kabushiki Kaisha Toshiba

Tokyo Shibaura Electric Co., Ltd.

Mitsuo Kawai

Takashi Yamanobe

Michio Satou

Toshiaki Mizutani

Tatsuzo Kawaguchi

Kazuhiko Mitsuhashi

Fumio Mori

Shinzo Sugai

Tatsuyoshi Aisaka

Masahiko Hasunuma

Hisato Kamohara

Kaoru Tada

Matsuo Miyazaki

Kanji Kawaguchi

A sputtering target formed of a refractory metallic silicide having a composition MSi.sub.x including a mixture composition of an MSi.sub.2 phase in the form of particles (M: at least one refractory metal selected from a group consisting of W, Mo, Ti, Zr, Hf, Ni and Ta), and an Si phase provided as a matrix phase. Interface layers having a predetermined thickness are formed at the interfaces between the MSi.sub.2 phase and the Si phase. The value X in the composition formula MSi.sub.x is set to a range of 2.0 to 4.0, and the thickness of the interface layers formed between the MSi.sub.2 phase and the Si phase, the dispersion of the composition, the density ratio of the target, the electrical resistivity of the Si phase and the surface roughness are set to predetermined values. An uniform high-quality thin film in which a composition distribution is uniform can be manufactured stably by using this target.

Sputtering target and method of manufacturing the same

Sputtering target

A metal molded shape having a high hardness surface layer which is hard to work is obtained by casting an easy to work alloy member into a desired molded form, and then changing the composition of the member surface by volatilizing off the high vapor pressure elements, carried out by subjecting the easy to work alloy member, to a heat treatment at high temperature.

Manufacturing method for high hardness member

A bimetal is disclosed having a high, rapid deflection over a specified temperature range, including a high expansion metal alloy component having a high thermal expansion coefficient that changes rapidy at 50.times.10.sup.-6 /.degree.C. or greater at a temperature of between about 100.degree. C. and 250.degree. C. and containing from 15-30% by weight of manganeses, the balance of iron. The second component has a substantially constant thermal expansion coefficient regardless of the temperature change, and is preferably a stainless steel. These bimetals are used in circuit breakers, thermal protectors and the like.

Method for manufacturing bimetal

A wear-resistant alloy for an atomic power plant which is essentially formed of 10 to 45% by weight of chromium; 1.5 to 6% by weight of at least one metal component selected from the group consisting of aluminium and titanium; 0 to 20% by weight of molybdenum; and nickel as the remainder, and atomic power plant parts prepared from the alloy having said composition.

Forged atomic power plant parts

A bimetal is disclosed having a high, rapid deflection over a specified temperature range, including a high expansion metal alloy component having a high thermal expansion coefficient that changes rapidly at 50.times.10.sup.-6 /.degree. C. or greater at a temperature of between about 100.degree. C. and 250.degree. C. and containing from 15-30% by weight of manganese, the balance of iron. The second component has a substantially constant thermal expansion coefficient regardless of the temperature change, and is preferably a stainless steel. These bimetals are used in circuit breakers, thermal protectors and the like.

Bimetal and method for manufacturing the same

Growing community of inventors

Yokohama, Japan

Mitsuo Kawai