Toray Industries, Inc.

Mitsuhito Suwa

Masao Kamogawa

Masao Tomikawa

Toru Okazawa

Hitoshi Araki

Yoji Fujita

Hiroko Mitsui

Yuka Yamashiki

Hirokazu Iimori

Toshiyasu Hibino

Kazuto Miyoshi

Takenori Fujiwara

Akihiro Ishikawa

Yohei Konoshima

Seiichiro Murase

Hiroji Shimizu

Tomoyuki Yuba

Yugo Tanigaki

Yoshihiko Inoue

Mika Koshino

Hiroyuki Niwa

Chika Hibino

Akinori Saeki

Yoshinori Matoba

Hiroshi Hosono

Ryuichiro Taniguchi

Masahide Senoo

Kouichi Dan

Sachio Inaba

Chika Taniguchi

Keiichi Uchida

Manami Fujii

Masayuki Naruto

Yumiko Okuda

Michiko Yamaguchi

Eisuke Iizuka

Miki Nakamichi

Katsuya Minamihashi

Disclosed is a polymetalloxane including a constituent unit represented by the following general formula (1), which stably exists in a transparent and uniform state in a solution and can form a homogeneous cured film: wherein Ris an organic group and at least one of Ris an (RSiO&#x2014;) group, Ris optionally selected from specific groups, Ris optionally selected from specific groups, when plural R, R, and Rexist, they may be the same or different, M represents a specific metal atom, m is an integer indicating a valence of a metal atom M, and a is an integer of 1 to (m&#x2212;2).

Polymetalloxane, method for producing same, composition thereof, cured film and method for producing same, and members and electronic components provided with same

The present invention provides a positive photosensitive resin composition having high light transmittance, high heat resistance, and excellent pattern processability. The present invention provides a positive photosensitive resin composition containing polysiloxane (A), a naphthoquinonediazide compound (B), and a solvent (C); in which the polysiloxane (A) has at least one structure selected from the following general formulae (1) to (3), and has at least one structure selected from the following general formulae (4) to (6); in which, in the general formulae (1) to (3), Rrepresents a C-Chydrocarbon group having an unsaturated double bond; Rrepresents a single bond or a C-Calkylene group; Rin the general formula (2) represents a hydrogen atom or a C-Calkyl group; and Rin the general formula (3) represents an organic group; in which Rin general formula (5) represents a hydrogen atom or a C-Calkyl group; and Rin the general formula (6) represents an organic group.

Positive photosensitive resin composition, cured film therefrom, and solid state image sensor comprising the same

A photosensitive resin composition includes electrically conductive particles (A) whose surfaces are coated with a carbon simple substance and/or a carbon compound; an alkali-soluble resin (B) containing an acid-dissociation group; and a metal chelate compound (C) wherein the metal chelate compound (C) includes at least one selected from the group consisting of Au, Ag, Cu, Cr, Fe, Co, Ni, Bi, Pb, Zn, Pd, Pt, Al, Ti, Zr, W and Mo.

Photosensitive resin composition, method of producing electrically conductive pattern, substrate, touch panel, and display

Provided is a siloxane resin composition having excellent adhesion and fine patterning properties. The siloxane resin composition contains: a siloxane resin (A) including a structure represented by general formula (1), a structure represented by general formula (2), and a structure represented by general formula (3); a compound (B) having an unsaturated double bond; a photopolymerization initiator (C); and a solvent (D).

Siloxane resin composition, adhesive using same, display device, semiconductor device, and illumination device

The present invention is aimed at providing a laminated base material capable of conveniently attaining the enhancement in lightness of a decorating layer without requiring a thickened film thickness and an increased number of complicated steps. The present invention provides a laminated base material including a substrate (A), and a layer (B) and a layer (C) sequentially laminated on a surface of the substrate (A), wherein a refractive index nA of the substrate (A) and a refractive index nB of the layer (B) satisfy the relationship of 0.6&#x2265;nA&#x2212;nB&#x2265;0.1, and the layer (C) contains a pigment.

Laminated base material, cover glass, touch panel, and method for manufacturing laminated base material

Provided is a resin composition which contains a UV absorbent having high solubility in solvents, and imparts superior UV-cut performance and transparency, and good weather resistance, even when being formed as a thin film. The resin composition contains a UV absorbent (a) and a resin (b), wherein the UV absorbent (a) contains at least two compounds, i.e., a compound (a-1) having a global absorption maximum at less than 340 nm, and a compound (a-2) having a global absorption maximum at 340-380 nm, and the total content of (a-1) and (a-2) is 10-30 mass % of the total solid content.

Resin composition, cured film, method for producing cured film, and display device

An object of the present invention is to provide a transparent photosensitive material that is usable as an interlayer insulating film for metal wires, is excellent in migration resistance and substrate adhesiveness under high temperature and high humidity conditions, and is satisfactory in patternability. The photosensitive resin composition of the present invention contains an acrylic polymer (A1) having, in a side chain thereof, a polymerizable group, a cardo based resin (A2) having a polymerizable group and an alkali-soluble group, and a photopolymerization initiator (B), and contents of the acrylic polymer (A1) and the cardo based resin (A2) satisfy a weight ratio of 1:10 to 10:1.

Photosensitive resin composition, cured film, laminate, touch panel member, and method for manufacturing cured film

A resin composition which includes (a) a solvent, (b) silica particles, (c) a polysiloxane, and (d) a secondary or tertiary amine compound, wherein the solvent (a) includes an organic acid. From the resin composition, an even film is easily formed even on bases having protrusions and recesses, such as lens shapes. The resin composition has satisfactory storage stability.

Resin composition, solid imaging element obtained using same, and process for producing same

A photosensitive resin composition can achieve both resolution of a fine pattern and conductivity after a heat treatment. The photosensitive resin composition includes: (A) conductive fine particles whose surfaces are coated with an elemental carbon and/or a carbon compound, and (B) an alkali-soluble resin having an acid dissociating group.

Photosensitive resin composition, method of manufacturing conductive pattern, substrate, element, and touch panel

A positive photosensitive resin composition including: a polysiloxane synthesized by hydrolyzing and partially condensing a specific organosilane and an organosilane that has a carboxyl group and/or a dicarboxylic acid anhydride structure; particles of one or more metal compounds selected from an aluminum compound, a tin compound, a titanium compound, and a zirconium compound, or composite particles of a silicon compound and one or more metal compounds selected from an aluminum compound, a tin compound, a titanium compound, and a zirconium compound; a naphthoquinone diazide compound; and a solvent.

Positive photosensitive resin composition, cured film formed by curing same, and optical device equipped with same

The present invention provides a negative photosensitive resin composition including the following (a) to (d): (a) metallic compound particles, (b) a polysiloxane compound, (c) a compound having at least 1 group containing an &#x3b1;,&#x3b2;-unsaturated carboxylate ester structure, and (d) a photopolymerization initiator, the composition also including (e) a compound containing maleimide group.

Negative photosensitive resin composition, cured film obtained by curing same, method for producing cured film, optical device provided with cured film, and backside-illuminated CMOS image sensor

The present invention aims to provide a substrate having an ITO with a low ITO pattern visibility, which substrate is formed by a method utilizing a simple technique such as coating, printing or the like, and which method is less burdensome from the viewpoints of cost and process; and to provide a touch panel member using the substrate. The present invention provides a substrate including a region where thin layers are laminated on a transparent ground substrate, which thin layers are, in the order mentioned from the upper surface of the substrate: an ITO (Indium Tin Oxide) thin layer (I); an organic thin layer (II) having a film thickness of from 0.01 to 0.4 &#x3bc;m and a refractive index of from 1.58 to 1.85; and a transparent adhesive thin layer (III) having a refractive index of from 1.46 to 1.52.

Substrate and touch panel member using same

Disclosed is a photosensitive resin composition which exhibits positive or negative photosensitivity and is used as a mask in an ion implantation step, the photosensitive resin composition including, as a resin, (A) a polysiloxane. The photosensitive resin composition of the present invention has high heat resistance and is capable of controlling a pattern shape, and also has excellent ion implantation mask performance, thus enabling application to a low-cost high-temperature ion implantation process.

Photosensitive resin composition and method for producing semiconductor device

An impurity-diffusing composition including (A) a polysiloxane represented by Formula (1) and (B) an impurity diffusion component.  In the formula, Rrepresents an aryl group having 6 to 15 carbon atoms, and a plurality of Rmay be the same or different. Rrepresents any of a hydroxyl group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an acyl group having 2 to 6 carbon atoms, and an aryl group having 6 to 15 carbon atoms, and a plurality of Rmay be the same or different. Rand Reach represent any of a hydroxyl group, an alkyl group having 1 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, and an acyl group having 2 to 6 carbon atoms, and a plurality of Rand a plurality of Reach may be the same or different. The ratio of n:m is 95:5 to 25:75.

Impurity-diffusing composition and method for producing semiconductor element

The present invention provides a negative-type photosensitive white composition for a touch panel, the composition including: (A) a white pigment; (B) an alkali-soluble resin; (C) a polyfunctional monomer; and (D) a photopolymerization initiator.

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Otsu, Japan

Mitsuhito Suwa