Nippon Zeon Company, Ltd.

Mitsuhiro Tamura

Hiroto Kidokoro

Fusayoshi Sakurai

Tetsu Ohishi

Suguru Tsuji

Shinji Komiyama

Tetsuo Ohishi

Hiroshi Sakurai

Toshiaki Saya

Hayato Furusho

A photosensitive elastomeric composition comprising (1) at least one elastomer, (2) an addition-polymerizable compound having at least one CH.sub.2 .dbd.C&lt; group and (3) a polymerization initiator activatable by actinic light, wherein the elastomer (1) is an elastomer selected from (a) an elastomeric polymer composed of a polyene monomer containing at least two non-conjugated double bonds and a conjugated diene-type monomer or both a conjugated diene-type monomer and a copolymerizable vinyl monomer and (b) an elastomeric linear A-B type (wherein A represents a polymer block of a monovinyl aromatic compound and B represents a polymer block of a conjugated diene-type monomer) block copolymer in which a terminal group having a polymerizable ethylenic double bond is present in at least one end of the molecular chain.

Photosensitive elastomeric composition

In a process for producing a conjugated diene copolymer, the improvement in which when copolymerizing a conjugated diene monomer with an ethylenically unsaturated nitrile monomer, at least one compound selected from a bifunctional peroxide represented by formula

Process for producing conjugated diene copolymer

A diphenylamine derivative of the general formula ##STR1## wherein R represents a hydrogen atom or a methyl group, R.sub.1 and R.sub.2, independently from each other, represent a hydrogen atom, a chlorine atom, a bromine atom, or a hydrocarbon radical having 1 to 12 carbon atoms, and A represents ##STR2## and a degradation inhibitor for rubbery polymers comprising the aforesaid diphenylamine derivative as an active ingredient.

Diphenylamine derivatives and degradation inhibitors for rubber polymers

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Sagamihara, Japan

Mitsuhiro Tamura