Nec Corporation

Nippon Electric Co., Ltd.

Other

Mitsuhiro Kitamura

Tatsuya Sasaki

Masayuki Yamaguchi

Ikuo Mito

Kohroh Kobayashi

Yasutaka Sakata

Keiro Komatsu

Kiichi Hamamoto

Shotaro Kitamura

Jong-In Shim

Jungo Kondo

Minoru Imaeda

Tatsuo Kawaguchi

Kazuhisa Kaede

Yukinobu Nakabayashi

Shigetoki Sugimoto

Takemasa Tamanuki

A process for producing an optical waveguide element by thermally diffusing a metal element or a metallic compound into a substrate having a photoelectric effect, includes the steps of: forming a waveguide pattern on the substrate, the waveguide pattern includes a metal element or metallic compound; forming a film on a main plane of the substrate that covers the entire waveguide pattern, the film having an electro-optic effect; and effecting the thermal diffusion of the metallic element or the metallic compound.

Optical waveguide elements and a process for producing the same

In a semiconductor optical amplifier device comprising a semiconductor laser section and a semiconductor optical amplifier both of which are formed on the same semiconductor substrate and which are coupled to each other, the semiconductor optical amplifier comprises a tapered electrode formed on an upper surface thereof. The tapered electrode is divided into a plurality of divided electrodes by at least one of dividing sections which extends along a propagation direction of an incident laser beam. The plurality of divided electrodes are supplied with injection currents which are variable in each of the plurality of divided electrodes.

Semiconductor optical amplifier device capable of deflecting output

Disclosed is a tapered thickness waveguide integrated semiconductor laser which has an active layer in which light emits and recombines; and an output tapered waveguide which facilitates an optical coupling to an optical fiber; wherein the active layer and the output tapered waveguide are monolithically integrated on a common substrate, and the output waveguide has a buried structure and the width and thickness of the output waveguide are smaller than those of the active layer. The active layer may be placed between two cladding layers each of which has a different conductivity type with each other, and the output tapered waveguide has a portion which contacts undoped cladding layer.

Method of making a tapered thickness waveguide intergrated semiconductor

A wavelength tunable semiconductor laser includes an active region including an active layer generating an optical gain by injection of a current, a phase control region including a tuning layer generating variation of a refraction index by injection of the current, and a distributed Bragg reflector region including a tuning layer generating variation of a refraction index by injection of the current. The active region, the phase control region and the distributed Bragg reflector region are arranged in alignment in a resonance direction. A diffraction grating is provided in the vicinity of the tuning layer of the distributed Bragg reflector region. The wavelength tunable semiconductor laser includes a device for uniformly injecting a current to the phase control region and the distributed Bragg reflector region. The optical confinement factor to the tuning layer of the phase control region is greater than an optical confinement factor to the tuning layer of the distributed Bragg reflector type.

Wavelength-tunable semiconductor laser and fabrication process thereof

A semiconductor optical monolithic integration device has a semiconductor substrate including an active region and a passive region. Epitaxial layers including a multiple quantum well structure have a variation in band gap energy and thickness along a waveguide direction. The epitaxial layers in the active region are selectively grown by a metal organic vapor phase epitaxy on a first selective growth area defined by a first mask pattern provided in the active region except in the passive region. The first mask pattern has a variation in width along the waveguide direction. The epitaxial layers are simultaneously and non-selectively grown on an entire surface of the passive region by the metal organic vapor phase epitaxy and the epitaxial layers have a mesa structure in the active region and a plane structure in the passive region. A cladding layer having a ridged structure is selectively grown by a metal organic vapor phase epitaxy on a second selective growth area defined by a second mask pattern provided in the active and passive regions. The second mask pattern has a constant width. In the active region, the ridged cladding layer completely embeds the mesa structure epitaxial layers and in the passive region the ridged cladding layer are provided on the plane structure epitaxial layers.

Semiconductor optical integrated circuits and method for fabricating the

Tapered thickness waveguide integrated semiconductor laser

A distributed feedback semiconductor laser device having a semiconductor substrate, a bottom electrode formed on a bottom surface of the substrate, a corrugation-shaped grating formed on a top surface of the substrate, an active waveguide layer whose energy band gap profile and whose light propagation constant are varied along cavity length direction of the laser device, the active waveguide layer being formed over the corrugation-shaped grating, a clad layer formed to cover the active waveguide layer, and a top electrode formed on a top of the clad layer. The active waveguide layer is grown by a selective metal organic vapor phase epitaxy with use of slender insulation masks having a variation in width, the slender insulation masks being arranged at both sides of an area on which the active waveguide layer is grown.

Multiple quantum well distributed feedback semiconductor laser device

A semiconductor optical amplifier having a large gain and a high saturation optical output power has a uniform cross-section of an active layer. In the semiconductor optical amplifier, the band gap wavelength of the active layer in the vicinity of the light-emitting end is shorter than that in the vicinity of the light-receiving end. The active layer may have a multiple quantum well structure, or the active layer may have a tesile-strained (compressively strained) multiple quantum well structure in which the absolute strain quantity in the vicinity of the light-emitting end is larger than that in the vicinity of the light-receiving end.

Semiconductor optical amplifier

A semiconductor optical monolithic integration device comprises a semiconductor substrate including an active region and a passive region. Epitaxial layers including a multiple quantum well structure have a variation in band gap energy and thickness along a waveguide direction. The epitaxial layers in the active region are selectively grown by a metal organic vapor phase epitaxy on a first selective growth area defined by a first mask pattern provided in the active region except in the passive region. The first mask pattern has a variation in width along the waveguide direction. The epitaxial layers are simultaneously and non-selectively grown on the entirety of the passive region by metal organic vapor phase epitaxy and epitaxial layers having a mesa structure in the active region and a plane structure in the passive region are formed. A cladding layer having a ridged structure is selectively grown by a metal organic vapor phase epitaxy on a second selective growth area defined by a second mask pattern provided in both the active and passive regions. The second mask pattern has a constant width. In the active region the ridged cladding layer completely embeds the mesa structure epitaxial layers and in the passive region the ridged cladding layer is provided on the plane structure epitaxial layers.

Semiconductor optical integrated circuits

Wavelength-tunable semiconductor laser

A distributed feedback semiconductor laser device having a semiconductor substrate, a bottom electrode formed on a bottom surface of the substrate, a corrugation-shaped grating formed on a top surface of the substrate, an active waveguide layer whose energy band gap profile and whose light propagation constant are varied along a cavity length direction of the laser device, the active waveguide layer being formed over the corrugation-shaped grating, a clad layer formed to cover the active waveguide layer, and a top electrode formed on a top of the clad layer. The active waveguide layer is grown by a selective metal organic vapor phase epitaxy with use of slender insulation masks having a variation in width, the slender insulation masks being arranged at both sides of an area on which the active waveguide layer is grown.

A tunable semiconductor laser device includes a laser region and a tuning region, with a highly reflective surface formed on the cleaved vertical end facet of the tuning region for providing a reflectivity of 50% or more. The laser and tuning regions are formed on a common semiconductor substrate with the laser region having an active layer formed over the substrate, an optical waveguide layer adjacent the active layer and an electrode for carrying a drive current to the active region. The tuning region, adjacent the laser region on the substrate includes an optical waveguide which extends from the optical waveguide of the laser region, and a tuning current carrying electrode for injecting a tuning current across the waveguide layer of the tuning region. The tuning current alters the refractive index of the waveguide layer interface which changes the phase of the tuning region. Changing the tuning current varies the laser wavelength. The highly reflective end facet assures continuous wavelength tuning. The laser device may be incorporated into an integrated optical local oscillator comprising the laser device, a photodiode, a branched optical waveguide including an input port for mixing the output of the laser device and the light from the input port before being received by the photodiode.

Semiconductor laser device

A buried heterostructure semiconductor laser diode with improved efficiency, CW operating temperature and output characteristic is comprised of a semiconductor substrate of a first conductivity type and includes successively at least a first cladding semiconductor layer of the first conductivity type, an active semiconductor layer, and a second cladding semiconductor layer of a second conductivity type. The active semiconductor layer has a narrower bandgap than those of the first and second cladding semiconductor layers. The multilayer double heterostructure has a stripe geometry with channels formed along both sides of the stripe and extending down to the first cladding layer. A current blocking layer is formed on the multilayer double heterostructure except for the top surface of the stripe geometry, in order to block a current flow therethrough.

Double channel planar buried heterostructure laser

In an integrated optical semiconductor device wherein a stripe geometry laser diode is separated from a photodetector by an etched groove, the stripe region has a smaller width, such as 2 to 3 microns, than a carrier generating region of the photodetector. The stripe region is preferably rendered thicker than the carrier generating region, in which case the carrier generating region is more preferably made of a seimconductor material having a narrower band gap than the material of the stripe region. The stripe region may be defined by a buried mesa structure. Alternatively, the stripe region may be bounded transversely of a pair of heterojunctions therefor by a pair of channel-shaped regions of a semiconductor material having a wider bank gap than the material of the stripe region. In this event, the carrier generating region is divided into three parts by extensions of the channel-shaped regions. Most preferably, the carrier generating region has a light receiving end which is not parallel to a light emitting end of the stripe region. The light receiving end may be cylindrical.

Semiconductor laser having an etched mirror and a narrow stripe width,

A buried heterostructure laser diode and method for making the same wherein an active layer is provided in a semiconductor region forming a mesa stripe, and, except for the top surface portion of the mesa stripe, the side surface portion of the mesa stripe and the remainder are covered by a current-blocking layer. Furthermore, a current-confining layer covers only this current-blocking layer, and a clad layer covers the current-blocking layer and the top surface portion of the mesa stripe.

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Tokyo, Japan

Mitsuhiro Kitamura