Nippon Sheet Glass Company, Limited

Other

Daido Chemical Corporation

Mitsuhiro Kawazu

Fumiyoshi Kondo

Mizuho Koyo

Hiroaki Yamamoto

Koichi Maeda

Takeshi Yabuta

Taro Miyauchi

Yukihito Nagashima

Kazutaka Kamitani

Toshifumi Tsujino

Masaatsu Kido

Tatsuhiro Nakazawa

Koichiro Nakamura

Toru Yamamoto

Katsuhide Shimmo

Masahiro Hori

Masahiro Tatsumisago

Yuichiro Kubo

Hideshi Nagata

Toyoyuki Teranishi

Kazuaki Oya

Tsutomu Minami

Isamu Kuroda

Yuichi Yano

Kiyoharu Tadanaga

Hiroyuki Inomata

Tatsuya Noguchi

Atsunori Matsuda

Shinji Kawamoto

Yohei Shimokawa

Vladimir Victrovich Serikov

Yoko Miyamoto

Hitoshi Shinike

Mitsuo Asai

Katuhiko Kinugawa

Daisuke Shiraishi

Hirofumi Matsubara

A low-reflection film-coated transparent substrate of the present invention includes a transparent substrate and a low-reflection film formed on at least one principal surface of the transparent substrate. The low-reflection film is a porous film including: fine silica particles being solid and spherical and having an average particle diameter of 80 to 150 nm; and a binder containing silica as a main component, the fine silica particles being bound by the binder. The binder further contains an aluminum compound. The low-reflection film contains as components: 55 to 70 mass % of the fine silica particles; 25 to 40 mass % of the silica of the binder; 0.1 to 1.5 mass % of the aluminum compound in terms of AlO; and 0.25 to 3% of an organic component. The low-reflection film has a thickness of 80 to 800 nm. A transmittance gain is 2.5% or more, the transmittance gain being defined as an increase of average transmittance of the low-reflection film-coated transparent substrate in a wavelength range of 380 to 850 nm relative to average transmittance of the transparent substrate uncoated with the low-reflection film in the wavelength range. The organic component includes at least one selected from the group consisting of a &#xdf;-ketoester and a &#xdf;-diketone.

Low-reflection film-coated transparent substrate, photoelectric conversion device, coating liquid for forming low-reflection film of low-reflection film-coated transparent substrate, and method for producing low-reflection film-coated transparent substrate

A low-reflection coated glass sheet of the present invention includes a glass sheet and a low-reflection coating. The low-reflection coating is formed on at least a portion of one principal surface of the glass sheet and contains a binder containing silica as a main component, fine silica particles bound by the binder, and fine titania particles bound by the binder. The low-reflection coating satisfies the following relationships: 30 mass %&#x3c;C&#x3c;68 mass %; 12 mass %&#x2264;C&#x3c;50 mass %; 20 mass %&#x3c;C&#x3c;43.75 mass %; C/C&#x2265;0.6; C&#x3c;25 mass % in the case of C&#x2265;55 mass %; and C&#x3e;20 mass % in the case of C&#x3c;55 mass %. The low-reflection coated glass sheet has a transmittance gain of 2.0% or more.

Low-reflection coated glass sheet, method for producing low-reflection coated substrate, and coating liquid for forming low-reflection coating of low-reflection coated substrate

A windshield according to an aspect of the present invention is a windshield for an automobile on which an information acquisition device capable of acquiring information from the outside of a vehicle by emitting and/or receiving light can be arranged. The windshield includes; a glass plate including an information acquisition region that is opposite to the information acquisition device and through which the light passes; and an antifog laminate that includes a heat blocking layer and an antifog layer with antifog properties layered on one surface of the heat blocking layer, and that is layered on a surface on a vehicle interior side of the information acquisition region while the other surface of the heat blocking layer faces the surface on the vehicle interior side of the information acquisition region.

Windshield and windshield manufacturing method

The low-reflection coating of the present invention is adapted to be provided on at least one principal surface of a substrate. The low-reflection coating is a porous film having a thickness of 80 to 800 nm, the porous film including: fine silica particles being solid and spherical and having an average particle diameter of 80 to 600 nm; and a binder containing silica as a main component and containing a hydrophobic group, the fine silica particles being bound by the binder. The low-reflection coating contains 35 to 70 mass % of the fine silica particles, 25 to 64 mass % of the silica of the binder, and 0.2 to 10 mass % of the hydrophobic group of the binder. The low-reflection coating produces a transmittance gain of 1.5% or more when provided on the substrate.

Low-reflection coating, glass sheet, glass substrate, and photoelectric conversion device

The present invention provides a glass article including a photocatalyst filmcontaining silicon oxide particlesand titanium oxide particles, and a glass sheet. Assuming that the photocatalyst filmhas a film thickness T, 80% or more of the titanium oxide particles are localized in a region between a surface of the glass sheetand a position spaced from the surface by 0.6 T toward a surface of the photocatalyst filmin a thickness direction of the photocatalyst film. The glass article has an increased transmittance provided by enhancing the reflection-reducing function of the photocatalyst filmwhile maintaining the film strength and photocatalytic function of the photocatalyst film

Glass article provided with photocatalyst film, process for producing glass article, and coating liquid

A low-reflection coating of the present invention is a porous film including: fine silica particles being solid and spherical and having an average particle diameter of 80 to 150 nm; and a binder containing silica as a main component, the fine silica particles being bound together by the binder. The binder further contains an aluminum compound. The low-reflection coating contains, as components, 55 to 70 mass % of the fine silica particles, 25 to 40 mass % of the silica of the binder, and 2 to 7 mass % of the aluminum compound in terms of AlO. The low-reflection coating has a thickness of 80 to 800 nm. The low-reflection coating yields a transmittance gain of 2.5% or more when provided on the substrate. The transmittance gain represents an increase in average transmittance of the substrate provided with the low-reflection coating relative to the substrate not provided with the low-reflection coating, the average transmittance being measured in the wavelength range of 380 to 850 nm.

Low-reflection coating, low-reflection coated substrate, and photoelectric conversion device

A low-reflection coated glass sheet of the present invention includes a glass sheet and a low-reflection coating. The low-reflection coating is formed on at least a portion of one principal surface of the glass sheet, and contains a binder containing silica as a main component, fine silica particles bound by the binder, and fine titania particles bound by the binder. For the low-reflection coated glass sheet, a transmittance gain is 1.7% or more. The low-reflection coating contains 25 mass % to 43 mass % of the silica which is the main component of the binder, 40 mass % to 64 mass % of the fine silica particles, and 10 mass % to 20 mass % of the fine titania particles, based on the total mass of the low-reflection coating. As such, the low-reflection coated glass sheet of the present invention has high abrasion resistance and is capable of exhibiting photocatalytic properties and hydrophilicity when irradiated with light.

A cover glass of the present invention for photoelectric conversion devices includes a glass sheet having surface asperities and a reflection-reducing film formed over the surface asperities of the glass sheet. The surface asperities of the glass sheet have an average spacing Sm of 0.3 mm or more and 2.5 mm or less and an arithmetic average roughness Ra of 0.3 &#x3bc;m to 5 &#x3bc;m. The reflection-reducing film includes fine silica particles having an average particle diameter of 50 to 200 nm and a binder for the fine silica particles, and the fine silica particles are uniformly arranged in a single layer on peak portions of the surface asperities in such a manner that a filling fraction F is 35 to 65%. A transmittance gain is 2.37% or more, the transmittance gain being obtained by subtracting an average transmittance of the glass sheet as measured when light having wavelengths ranging from 380 to 1100 nm are incident on a face of the glass sheet that has the surface asperities, from an average transmittance of the cover glass as measured when light having the wavelengths are incident on a reflection-reducing film side of the cover glass. Thus, a cover glass for photoelectric conversion devices that exhibits a high transmittance gain is provided.

Cover glass for photoelectric conversion device

The present invention provides a glass article including a photocatalyst filmcontaining silicon oxide particlesand titanium oxide particles, and a glass sheet. Assuming that the photocatalyst filmhas a film thickness T, 80% or more of the titanium oxide particles are localized in a region between a surface of the glass sheetand a position spaced from the surface by 0.6 T toward a surface of the photocatalyst filmin a thickness direction of the photocatalyst film. The glass article has an increased transmittance provided by enhancing the reflection-reducing function of the photocatalyst filmwhile maintaining the film strength and photocatalytic function of the photocatalyst film.

Glass article provided with photocatalyst film

In order to eliminate non-uniformity in the appearance of a cover glass for photoelectric conversion devices, the reflectance curve of the cover glass is extremely flattened. Provided is a cover glass for photoelectric conversion devices that includes a glass sheet having an uneven surface such as a figured glass, and a reflection-reducing film formed on the uneven surface. The reflection-reducing film includes silica fine particles and a binder for the silica fine particles. The silica fine particles are arranged in a single layer on the top portion of the uneven surface of the glass sheet, while the silica fine particles are arranged in stacks to a thickness equivalent to at least three layers on the bottom portion of the uneven surface. The uneven surface of the glass sheet has an average spacing Sm of at least 0.4 mm but not more than 2.5 mm and an arithmetic average roughness Ra of 0.5 &#x3bc;m to 5 &#x3bc;m. The cover glass has a reflectance of at least 1.5% but not more than 3% over the entire wavelength range of 380 nm to 780 nm for incident light from the side on which the reflection-reducing film is formed.

Cover glass for photoelectric conversion devices and method for producing the same

An infrared cut filter includes: a transparent dielectric substrate; an infrared reflecting layer formed on one surface of the transparent dielectric substrate and configured to reflect infrared light; and an infrared absorbing layer formed on the other surface of the transparent dielectric substrate and configured to absorb infrared light. The infrared absorbing layer is formed by encapsulating infrared absorbing pigment in a matrix containing silica, formed by a sol-gel method, as a main component.

Infrared cut filter and imaging apparatus

Provided is a glass article that improves the film strength of a photocatalyst film while maintaining the photocatalytic function and the reflection suppressing function of the photocatalyst film. The photocatalyst film on the glass sheet is formed to contain, in mass %, 50 to 82% of silicon oxide particles, 8 to 40% of titanium oxide particles, and 7 to 20% of a binder component composed of silicon oxide. The average particle diameter of the silicon oxide particles is set to at least 5 times the average particle diameter of the titanium oxide particles. The photocatalyst film is formed to have a structure such that some of the silicon oxide particles in the film serve as protruding silicon oxide particles that are not in contact with the glass sheet and that have their top portions protruding from the surrounding titanium oxide particles and being exposed on the surface of the film, while some of the titanium oxide particles are interposed between the glass sheet and the protruding silicon oxide particles.

In the production method of the present invention, an emulsion including a copolymer with a glass transition temperature (Tg) of &#x2212;50 to 20&#xb0; C. is obtained by the emulsion polymerization of a monomer group including a monomer A that is a (meth)acrylic acid alkyl ester (where the alkyl group is an open chain group with 1 to 20 carbon atoms or a cyclic group with 5 to 20 carbon atoms) as the main monomer and a monomer B having a carbon-carbon double bond and a nonionic hydrophilic group such as a polyoxyalkylene group, an amide group, and a hydroxyl group. Liquid crystals are dispersed in this emulsion, which is applied onto a conductive film-coated substrate. Another conductive film-coated substrate is laminated thereto, and thus a liquid crystal light control device is obtained. A monomer C having a carboxyl group and/or an amino group and a carbon-carbon double bond may be used in combination with a crosslinking agent so that a crosslinked structure is introduced into the copolymer. The present invention provides a liquid crystal light control device in which the transparency with a voltage applied and the shielding property with no voltage applied are compatible at high level.

Liquid crystal light control device and method for producing the same comprising a step of emulsion polymerization of monomers of a liquid crystal resin composite

A polarizing elementhas a first undulating structure in which a plurality of linear first recessesare formed parallel to one another in one surface of a transparent substrate, and a dielectric layermade from silicon dioxide is formed on the surface of the first undulating structure to produce a second undulating structure. The second undulating structure has formed therein second recesseshaving a width W and a depth H, with second projectionshaving a width d intervening between adjacent second recesses. A thin-film-shaped conductive bodyof width W and depth H is embedded in each of the second recesses

Polarizing device, and method for manufacturing the same

A process for producing an optical element which has excellent heat resistance and adhesion to a substrate. This process comprises applying a liquid composition for forming an optical element to the molding surface of a substrate having a regular pattern surface consisting of areas having high wettability and areas having low wettability as the molding surface and curing the composition to form projections in the areas having high wettability. A solution containing at least one compound selected from the group consisting of a hydrolyzable compound which can be hydrolyzed and polycondensed and a hydrolyzed/polycondensed product thereof is used as the liquid composition for forming an optical element.

Growing community of inventors

Osaka, Japan

Mitsuhiro Kawazu