Oki Data Corporation

Asahi Glass Company, Limited

Mitsuhiro Kawata

Junichi Ito

Hisatoshi Saito

Masayuki A Suzuki

Masayuki Suzuki

Akio Koike

Hideaki Hayashi

Shinya Kikugawa

Naoki Sugimoto

Akira Takada

Kenta Saitou

Image drum cartridge

Toner cartridge

A packing device includes: a packing box with an internal space capable of storing a packing target object with a protection target part, and with a packing box inner surface that is at least one inner surface positioned to face the protection target part of the packing target object; and a holding material configured to, when stored in the internal space together with the packing target object, maintain a space between the protection target part and the packing box inner surface by coming into contact with the packing box inner surface and a contact surface of the packing target object facing the packing box inner surface, while staying out of contact with the protection target part of the packing target object.

Packing device

The present invention provides a TiO-containing silica glass from which a transparent extremely low thermal expansion glass having excellent transparency and having a temperature region in which the coefficient of thermal expansion is substantially zero can be obtained. The present invention relates to a TiO-containing silica glass for optical member for EUV lithography, having a TiOconcentration of from 3 to 14% by mass; an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 700 nm, T, of 97% or more; and an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 3,000 nm, T, of 70% or more.

[object Object]

It is to obtain a silica glass suitable as a material for an optical material constituting an optical system to be used for EUVL, which has a low coefficient of thermal expansion from 0 to 100&#xb0; C., and on which formation of concave defects is suppressed in a polishing step to achieve a high level of flatness. A silica glass containing from 0.1 to 10 mass % of Sn calculated as SnOand from 3 to 10 mass % of Ti calculated as TiO, which has a homogeneity of the coefficient of thermal expansion from 0 to 100&#xb0; C. to the temperature of from 50 to 200 ppb/&#xb0; C., a coefficient of thermal expansion from 0 to 100&#xb0; C. of 0&#xb1;250 ppb/&#xb0; C., and a Vickers hardness of at most 650.

Silica glass and optical material

Growing community of inventors

Tokyo, Japan

Mitsuhiro Kawata