Sumitomo Chemical Company, Limited

Mitsuhiro Hata

Yusuke Fuji

Koji Ichikawa

Tatsuro Masuyama

Takayuki Miyagawa

Ichiki Takemoto

Nobuo Ando

Takahiro Yasue

The present invention provides a photoresist composition comprising wherein Rand Rare independently in each occurrence a C1-C12 hydrocarbon group, a C1-C6 alkoxy group, a C2-C7 acyl group, a C2-C7 acyloxy group, a C2-C7 alkoxycarbonyl group, a nitro group or a halogen atom, and m and n independently each represent an integer of 0 to 4.

Photoresist composition

A photoresist composition comprising a resin, an acid generator and a compound represented by the formula (I): wherein Rrepresents a C2-C12 alkyl group which can have one or more hydroxyl groups, etc., Rand Reach independently represent a hydrogen atom, etc., R, Rand Reach independently represent a hydrogen atom, etc., Arepresents a single bond or a C1-C2 alkylene group in which one or more &#x2014;CH&#x2014; can be replaced by &#x2014;O&#x2014;.

The present invention provides a photoresist composition comprising a resin, an acid generator and a compound represented by the formula (C1): wherein Rrepresents an aromatic group which can have one or more substituents, Rand Rindependently each represent a hydrogen atom, an aliphatic hydrocarbon group which can have one or more substituents or an aromatic group which can have one or more substituents, Rand Rindependently each represent a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or Rand Rare bonded each other to form an alkanediyl group, Rrepresents an aliphatic hydrocarbon group which can have one or more substituents or an amino group which can have one or two substituents, Rrepresents a hydrogen atom or an aliphatic hydrocarbon group which can have one or more substituents, or Rand Rare bonded each other to form an alkanediyl group.

The present invention provides a compound represented by the formula (C1): wherein Rrepresents a C6-C10 aromatic hydrocarbon group having at least one nitro group and Rrepresents a group represented by the formula (1): wherein Rrepresents a hydrogen atom etc., Rrepresents a C1-C30 divalent hydrocarbon group, and Rrepresents a group represented by the formula (3-1), (3-2) or (3-3): wherein R, R, R, R, R, R, R, Rand Reach independently represent a C1-C30 hydrocarbon group, and a photoresist composition comprising a resin, an acid generator and the compound represented by the formula (C1).

Compound and photoresist composition containing the same

A compounds represented by the Formula (I) or the Formula (I'). 

Compound, method for preparing the compound and resist composition containing the compound

A chemically amplified resist composition, comprising: a resin which includes a structural unit having an acid-labile group in a side chain, a structural unit represented by the formula (I) and a structural unit having a polycyclic lactone structure, and which is soluble in an organic solvent and insoluble or poorly soluble in an alkali aqueous solution but rendered soluble in an alkali aqueous solution by the action of an acid; and an acid generator represented by the formula (II).  wherein Xrepresents a hydrogen atom, a Cto Calkyl group, etc., Y in each occurrence independently represent a hydrogen atom or an alkyl group, and n is an integer of 1 to 14, Rto Rindependently represent a hydrogen atom, an alkyl group, etc., and Arepresents an organic counterion, Erepresents CFSO&#x2014;, CFSO&#x2014;, CFSO&#x2014;, etc., Yand Yindependently represent a fluorine atom or a Cto Cperfluoroalkyl group.

Chemically amplified resist composition and chemically amplified resist composition for immersion lithography

A polymer comprising a structural unit represented by the formula (Ia) or (Ib): wherein Rrepresents a hydrogen atom etc., Rrepresents a linear, branched chain or cyclic C1-C8 alkyl group, Rrepresents a methyl group, n represents an integer of 0 to 14, Zrepresents a single bond etc., k represents an integer of 1 to 4, Rand Reach independently represents a hydrogen atom etc., and m represents an integer of 1 to 3, a structural unit represented by the formula (II): wherein Rand Reach independently represents a hydrogen atom etc., Rrepresents a methyl group, Rrepresents a hydrogen atom etc., n' represents an integer of 0 to 12, Zrepresents a single bond etc., k&#x2032; represents an integer of 1 to 4, Rand Reach independently represents a hydrogen atom etc., and Rrepresents a C1-C30 monovalent hydrocarbon group, andat least one structural unit selected from the group consisting of structural units represented by the formulae (IIIa), (IIIb), (IIIc), (IIId) and (IIIf) wherein Rrepresents a hydrogen atom etc., Rrepresents a methyl group, Ris independently in each occurrence a carboxyl group etc., j represents an integer of 0 to 3, a represents an integer of 0 to 5, b represents an integer of 0 to 3, c represents an integer of 0 to (2+2), Zrepresents a single bond etc., and k&#x2033; represents an integer of 1 to 4.

Polymer and chemically amplified resist composition comprising the same

The present invention provides a polymer containing a structural unit represented by the formula (Ia) or (Ib): wherein R, R, R, n, Z, R, Rand m are defined in the specification, a structural unit represented by the formula (II): wherein R, R, R, R, Z, n' and Z&#x2032; are defined in the specification, and a structural unit represented by the formula (III): wherein R, R, 1&#x2032; and Zare defined in the specification.

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Toyonaka, Japan

Mitsuhiro Hata