Canon Kabushiki Kaisha

Mitsuhide Nishimura

Junichi Motojima

Kenichi Kamino

Kashu Matsumoto

Koji Yoshida

Tsutomu Terao

Masatoshi Endo

Yoshihiro Omameuda

A control apparatus for performing position control of a moving object is provided. The apparatus includes a feedforward controller configured to perform feedforward control by giving a feedforward manipulated variable to the moving object. In a case that a duration of the feedforward control exceeds a predetermined time, the feedforward controller continues the feedforward control using a feedforward manipulated variable obtained based on a feedforward manipulated variable used in a predetermined section including an end of the predetermined time.

Control apparatus, lithography apparatus, and article manufacturing method

The present invention provides a substrate processing apparatus that processes a substrate, the apparatus including a stage configured to hold and move the substrate, a conveying unit configured to hold and convey the substrate between conveying unit and the stage, an accumulation unit configured to accumulate control information concerning the stage and the conveying unit which is generated by processing the substrate, and a determination unit configured to determine a conveying procedure when conveying the substrate between the stage and the conveying unit by selecting one of a plurality of conveying procedures which can be set for the stage and the conveying unit based on control information accumulated in the accumulation unit.

Substrate processing apparatus and article manufacturing method

A control device for performing position control of a control target by imparting a feedforward operation amount to the control target to curb a control deviation even when a continuous target time of the control exceeds an upper limit in a case where the position control is performed by imparting the feedforward operation amount, including at least one processor or circuit configured to function as a determination unit configured to determine whether or not a target time for continuing the control using the feedforward operation amount exceeds a predetermined time, and a correction unit configured to correct the feedforward operation amount to be damped toward an end of the target time in a case where it is determined by the determination unit that the target time has exceeded the predetermined time.

Control device, control method, lithographic apparatus, method of manufacturing article, and storage medium

An exposure apparatus that exposes a substrate is provided. The apparatus includes a stage configured to hold and move the substrate, and a controller configured to control focus driving of the stage based on a measurement value and a correction value obtained for the focus driving of the stage for a shot region on the substrate. The controller is configured to determine the correction value in accordance with an angle of view at a time of exposure.

Exposure apparatus, method thereof, and method of manufacturing article

The present invention provides a control device that performs position control of a control target by giving a feedforward manipulated value to the control target, wherein the device obtains, for each of a plurality of positions at which the control target is to be arranged, a measurement result of a first output response of the control target obtained when giving a first manipulated value to the control target, determines a reference value of the first output response, based on the measurement results respectively obtained at the plurality of positions, determines a second manipulated value by arraying a plurality of first manipulated values in time-series based on a relationship between the first manipulated value and the reference value, and sets the feedforward manipulated value based on the second manipulated value.

Control device, lithography apparatus, and method of manufacturing article

An exposure method of exposing a plurality of exposure regions on a substrate includes the steps of acquiring first reference information indicating a reference height of the substrate, measuring heights of some exposure regions among the plurality of exposure regions, acquiring temporary height information indicating a temporary height of the substrate on the basis of a measurement result in the measuring step, and exposing one exposure region among the plurality of exposure regions after the substrate is moved on the basis of second reference information indicating a reference height of the one exposure region and a difference between the first reference information and the temporary height information.

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Utsunomiya, Japan

Mitsuhide Nishimura