Tdk Corporation

Sae Magnetics (h.k.) Limited

Mitsuharu Isobe

Hirotaka Gomi

Noriyuki Ito

Hiromichi Umehara

Yasuhiro Hasegawa

Tomohide Yokozawa

Makoto Terasawa

Hiroaki Funada

Takeshi Yamana

A method for forming a pattern film with a narrower width than the resolution of an exposure machine and a resist used independently of etching is provided. The method comprises the steps of: forming a first frame layer having end surfaces facing each other across a space having a width W; forming a second frame layer having end surfaces facing each other across a space having a width Wthat is larger than the width W, the space having the width Wbeing located right above the space having the width W; forming a trench-forming film provided with a trench having a minimum width Wthat is smaller than the width Wso as to fill at least a part of the spaces having the width Wand the width Wrespectively; and forming a pattern film so as to fill at least a part of the trench.

Method for forming a pattern film with a narrower width

A processing method of a thin-film includes a step of forming a predetermined pattern film or predetermined elements on a substrate or on a film formed in an upstream process, a step of forming a transparent film over the formed predetermined pattern film or predetermined elements, a step of forming a pattern-transferred film having shapes corresponding to shapes of the formed predetermined pattern film or predetermined elements, on the formed transparent film, and a step of forming an opaque film on the pattern-transferred film.

Processing method of thin-film and manufacturing method of thin-film magnetic head

Growing community of inventors

Tokyo, Japan

Mitsuharu Isobe