Fujitsu Corporation

Mitsugu Uemura

Masahiro Uraguchi

Ryuji Maeda

A substrate with striped ridge patterns formed on the surface thereof is transported along a transport path. A relationship is determined between the direction of the striped ridge patterns on the substrate surface and the direction of jetting out fluid to the substrate surface. The fluid is jetted out and blown to the substrate surface along the direction satisfying the determined relationship to process the surface of the substrate. It is possible to reliably perform a surface process of each substrate irrespective of different directions of striped ridge patterns on substrate surfaces.

Method and apparatus for processing substrate surface with striped ridge patterns

An exposure process of a pattern on a transparent substrate of a plasma display panel is conducted on a flat principal surface of stage in which a depression is formed for accommodating an alignment optical source, wherein a movable shutter is provided on the stage so as to be movable in a plane substantially flush to the principal surface of the stage.

Growing community of inventors

Kawasaki, Japan

Mitsugu Uemura