Nomura Micro Science Co., Ltd.

Mitsugu Abe

Masamitsu Iiyama

Osamu Ito

Nobuyoshi Nambu

Masaaki Ogitsu

Kazuo Inomata

Yoshiaki Noma

Senri Ojima

A chelate complex is removed from a chemical which is used in a semiconductor production process and contains a compound having a chelating ability, and the cleaning load is also reduced. Specifically disclosed is a method for purifying a chemical which is used in a semiconductor production process and contains a compound having a chelating ability, wherein a chelate complex which is formed from impurity metals such as nickel and copper contained in an alkaline chemical is removed from the chemical by treating the alkaline chemical with an organic complex adsorbing material.

Method for purifying chemical added with chelating agent

Foreign substances which are not inherently contained in a polishing slurry are selectively separated and removed from a polishing slurry component comprised of abrasives, a solvent and an additive which are inherently contained in the polishing slurry.

Method for recovering a used slurry

A material for purification of a semiconductor polishing slurry that without changing of pH value, is capable of efficiently purifying a polishing slurry to thereby not only prevent metal contamination of a polished object as effectively as possible but also achieve recycling of a polishing slurry without any problem; a relevant module for purification of a semiconductor polishing slurry; and a process for purifying a semiconductor polishing slurry with the use thereof. In particular, a material for purification of a semiconductor polishing slurry characterized in that it comprises a fibrous substrate having a functional group capable of forming a metal chelate or such a functional group together with hydroxyl fixed onto at least the surface thereof. This material for purification of a semiconductor polishing slurry is, for example, used in such a manner that it is inserted in a container fitted with polishing slurry inflow port and outflow port while ensuring passage of polishing slurry flow.

Material for purification of semiconductor polishing slurry, module for purification of semiconductor polishing slurry and process for producing semiconductor polishing slurry

A system for producing ultra-pure water having an electrodialysis unit,, which has a membrane selectively permeable to monovalent cations and a membrane selectively permeable to monovalent anions, and a reverse osmosis unit,which is connected after the electrodialysis unit,in series.

System for producing ultra-pure water

An apparatus for the treatment of a low-concentration organic waste water for relaim a low-concentration organic waste water having a TOC concentration of from 0.5 to 3 ppm and obtaining an ultra pure water having a TOC concentration of not more than 1 ppb is characterized by the fact that a first treating system comprising a reverse osmosis unit for transforming a low-concentration organic waste water having a TOC concentration of from 0.5 to 3 ppm into a low-concentration organic waste water having a TOC concentration of from 60 to 200 ppb and a vacuum degasifier adapted to admit an inert gas at a volumetric feed flow rate in the range of from 0.001 to 1.0 based on the volume of the waste water under treatment at a vacuum rate of not more than 35 Torrs and a second treating system comprising a low-pressure ultraviolet decomposition unit for emitting an ultraviolet light of a wavelength of 184.9 nm and an ion-exchange column are disposed along the flow path of the waste water sequentially in the order mentioned. This apparatus operates with a reduction in both initial cost and running cost because it uses a vacuum degasifier of low running cost with high efficiency and also uses a low-pressure ultraviolet irradiating unit which costs less than the high-pressure ultraviolet irradiating unit, requires no large space for installation, and manifests high efficiency of TOC decomposition. It is easy to manage as compared with the apparatus which is operated by a method resorting to an aerobic microorganism.

Growing community of inventors

Atsugi, Japan

Mitsugu Abe