Jgc Catalysts & Chemicals Ltd.

Catalysts & Chemicals Industries Co., Ltd.

Mitsuaki Kumazawa

Ryo Muraguchi

Toshiharu Hirai

Miki Egami

Michio Komatsu

Masayuki Matsuda

Hirotada Arakane

Yuji Tawarazako

Hiroyasu Nishida

Tsuguo Koyanagi

Kazutaka Egami

Ryota Sueyoshi

Masanobu Taniguchi

Masafumi Hirai

Ryo Maruguchi

Wataru Futagami

Shogo Hayashi

Yuhko Hakoshima

Satoshi Yoshida

Yuji Tawarasako

A silica particle dispersion liquid includes a silica particle that satisfies (i) to (iii) below: (i) an average particle diameter d is 5 to 300 nm; (ii) an occlusion amount of a basic substance per 1 g of the particle is 2 mg or more; and (iii) a Sears number Y exceeds 12.0.

Silica particle dispersion liquid and production method thereof

There is provided a production method of a chain silica particle dispersion. This production method includes a dispersion preparation step of hydrolyzing alkoxysilane in the presence of ammonia to prepare a silica particle dispersion, an ammonia removal step of removing the ammonia from the silica particle dispersion such that an ammonia amount relative to silica contained in the silica particle dispersion is 0.3% by mass or less, and a hydrothermal treatment step of hydrothermally treating the silica particle dispersion having a silica concentration of 12% by mass or more, from which the ammonia has been removed, at a temperature of not lower than 150&#xb0; C. and lower than 250&#xb0; C. An abrasive including such chain silica particles is high in polishing rate and excellent in polishing properties.

Method for producing chain-like particle dispersion, and dispersion of chain-like particles

Provided is a production method of a silica particle dispersion liquid which includes, preparing a linked silica particle by adding a liquid A containing alkoxysilane and a liquid B containing an alkali catalyst to a liquid containing water, an organic solvent, and an alkali catalyst in a container. The preparing a linked silica particle includes initially adding an alkali catalyst, the initially adding an alkali catalyst includes decreasing a molar ratio of an alkali catalyst to silica in the liquid in the container to 0.15 to 0.60 by adding the liquid A containing alkoxysilane to the liquid in the container, and increasing the molar ratio by 0.2 or more by adding the liquid B to the liquid having the decreased molar ratio in the container.

A polishing composition that can not only achieve high polishing speed, but also can improve the surface smoothness (surface quality) of a polished substrate and reduce defects is provided. That is, provided is a polishing composition comprising silica particles and a water soluble polymer, wherein the contained silica particles satisfy the following requirements (a) to (c): (a) the primary particle diameter based on the specific surface area is 5 to 300 nm; (b) the coefficient of variation in the particle diameter is 10% or less; and (c) the Sears number Y is 10.0 to 12.0.

Dispersion liquid of silica particles, polishing composition, and method for producing dispersion liquid of silica particles

Provided is a dispersion liquid of silica particles, comprising silica particles having an average particle diameter of 5 to 300 nm determined from an electron micrograph and a density of 1.20 g/cmor more determined from a specific surface area determined by a BET method using nitrogen adsorption, wherein the dispersion liquid has a pH of less than 8, a silica concentration of 12 to 40% by mass, and a viscosity in terms of a silica concentration of 20% by mass of 40 mPa&#xb7;s or less. When this silica particle is used as an abrasive, it is possible to realize a sufficient polishing speed and a smooth polished surface on which occurrence of scratches is suppressed.

Dispersion liquid of silica particles and production method therefor

A method for producing a dispersion liquid of silica particles, by simultaneously adding a liquid A containing silane alkoxide and a liquid B containing an alkali catalyst and water to a liquid I containing silica seed particles to cause the particles to grow, so as to produce silica particles; wherein the variation rate of the mole ratio of the alkali catalyst to silica components in the reaction system during a period from the start to the end of the addition relative to the initial mole ratio is 0.90 to 1.10; and the variation rate of the mole ratio of water to the silica components in the reaction system during a period from the start to the end of the addition relative to the initial mole ratio is 0.90 to 1.10.

Production method for dispersion liquid of silica particle

A method for producing a liquid dispersion containing irregular-shaped silica particles in which two or more primary particles are linked together, by simultaneously adding a liquid A containing silane alkoxide and a liquid B containing an alkali catalyst and water to a liquid I consisting substantially of an organic solvent to cause hydrolysis and polycondensation of the silane alkoxide, wherein the period from the start of the addition until the silica concentration of the reaction system at the end of the addition reaches 70% is 20% or less of the full reaction time period.

Silica particle liquid dispersion and production method therefor

Silica particles calcined in a calcination step are supplied in a swirling flow generated by a gas introduced in a disintegration container and disintegrated therein, whereby the silica particles can be easily disintegrated and there can be obtained disintegrated silica particles having both low hygroscopicity and high dispersibility in resin. In addition, the introduction of dehumidified air (gas) during the disintegration reduces hygroscopicity and greatly improves dispersibility in resin. Furthermore, performing heating treatment (calcination) again after the disintegration causes the surface modification of the disintegrated silica particles, greatly improving hygroscopicity and dispersibility in resin. The resin composition obtained in this manner including silica particles provides good injectability and filterability when used for an underfill material for semiconductors and an in-plane spacer or sealing spacer of liquid crystal displays.

Method for producing disintegrated silica particles

Producing a silica particle by inhibiting the generation of incompletely reacted materials such as oligomers which have not been grown to the silica particles having the intended particle size. A dispersion liquid of a silica particle is produced by simultaneously adding, to a liquid substantially consisting of an organic solvent, a liquid containing silane alkoxide and a liquid containing an alkali catalyst and water to cause hydrolysis and polycondensations to produce a silica particle. The variation rate of the mole ratio of the alkali catalyst to silane alkoxide in the reaction system for a period from the start to the end of the reaction relative to the initial mole ratio is 0.90 to 1.10; and the variation rate of the mole ratio of water to silane alkoxide for a period from the start to the end of the reaction relative to the initial mole ratio is 0.90 to 1.10.

Silica particle dispersion and production method of the same

A method of producing silica-based particles includes, when a dispersion liquid of composite oxide particles is prepared by simultaneously adding an aqueous silicate solution and/or an acidic silicic acid solution and an aqueous solution of an alkali-soluble inorganic compound in an alkali aqueous solution or in an alkali aqueous solution with seed particles dispersed therein, if required, the aqueous silicate solution and/or the acidic silicic acid solution and the aqueous solution of alkali-soluble inorganic compound are added so that the molar ratio of MO/SiOare in a range from 0.01 to 2, herein MOdenoting an inorganic oxide other than silica and SiOdenoting silica to prepare the dispersion liquid of composite oxide particles with an average diameter (D) in a range from 3 to 300 nm.

Method of producing silica-based particles

Provided is a silica-based polishing particle which can polish and flatten the surface of a substrate at a sufficient polishing rate with generation of scratches prevented, and successfully prevents generation of particle residues on a substrate after polishing. A silica-based polishing particle with a three-dimensional polycondensation structure containing an alkoxy group, wherein the particle has an average particle diameter (d) of 5 to 300 nm, an aspect ratio of 1.00 or more and 1.20 or less, and a carbon content of 0.005% by mass or more and less than 0.50% by mass.

Silica-based polishing particle and abrasive

Provided is a silica-based polishing particle, particularly suitable for primary polishing, which provides a high polishing rate on the surface of a substrate and which prevents particle residues on the substrate after polishing, and an abrasive including the silica-based polishing particle. A silica-based polishing particle with a three-dimensional polycondensation structure containing an alkoxy group, wherein the particle has an average particle diameter (d) of 5 to 300 nm, an aspect ratio of more than 1.20 and 5.00 or less, and a carbon content of 0.005% by mass or more and less than 0.50% by mass.

Hollow silica-based particles having cavities inside the outer shell having a low refractive index. The method of producing the silica-based particles comprises the following steps (a) and (b):

A water-repellent transparent coating-substrate assembly includes a substrate and a water-repellent transparent coating disposed on a surface of the substrate, the transparent coating including an inorganic oxide fine particle layer containing inorganic oxide fine particles, and an overcoating layer disposed on the inorganic oxide fine particle layer, the surface of the water-repellent transparent coating having irregularities including depressions and protrusions in which the protrusions have an average height (T) in the range of 30 to 500 nm and an average protrusion interval (pitch width) (W) in the range of 50 to 1000 nm, the water-repellent transparent coating having a water contact angle in the range of 130 to 180&#xb0;.

Water-repellant transparent coating-substrate assembly and process for producing the same

A composition for forming a transparent coating film including hollow silica microparticles and a binder is provided. The hollow silica microparticles have an average particle diameter of 5 to 300 nm when measured by the dynamic light scattering method, a specific surface area of 50 to 1500 m/g, and an outer shell in which cavities are formed. The microparticles lose weight by 1.0 W % or more at a temperature in the range of from 200&#xb0; C. to 500&#xb0; C. when measured by the thermogravimetry (TG). A surface charge (QA) of the hollow silica microparticles contained in the compositions for forming a transparent coating film is in the range from 5 to 20 &#x3bc;eq/g.

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Kitakyushu, Japan

Mitsuaki Kumazawa