Ethicon, Gmbh

Johnson & Johnson Gmbh

Beijing Sevenstar Electronics Co., Ltd.

Advanced Sterilization Products

Mitch Agamohamadi

Robert C Platt

Anthony Lemus

Alfredo M Choperena

Szu-Min Lin

Arsalan Emami

Saeed Sedehi

Robert C Platt, Jr

Arsalan Alan Emami

An embodiment of the present invention is a technique to automate transfer of parts for high throughput. A boat transfer unit (BTU) arm carrying a boat containing a plurality of parts is rotated from an initial position to a first position that is below a process chamber. The BTU arm engages a boat support that supports the boat. The BTU arm is moved upward to a second position such that the boat partially enters the process chamber at a distance D with respect to an entrance opening of the process chamber. An elevator arm carrying a pedestal is engaged to lower side of the boat support. The BTU arm is moved away from the second position. The elevator arm is moved upward to fully insert the boat inside the process chamber.

Automation for high throughput semiconductor batch-wafer processing equipment

The present invention provides a power feedback control system for controllably maintaining a predetermined average power value of a power applied to a plasma of a sterilization system. The power has a frequency of from 0 to approximately 200 kHz. The power feedback control system includes a power monitor including a current monitor and a voltage monitor. The current monitor is adapted to produce a first signal indicative of a current applied to the plasma. The voltage monitor is adapted to produce a second signal indicative of a voltage applied to the plasma. The power monitor is adapted to produce a third signal in response to the first signal and second signal. The third signal is indicative of the power applied to the plasma. The power feedback control system further includes a power control module adapted to produce a fourth signal in response to the third signal from the power monitor and to a reference signal corresponding to the predetermined average power value. The power feedback control system further includes a power controller adapted to adjust, in response to the fourth signal, the power applied to the plasma to maintain the predetermined average power value of the power applied to the plasma.

Power system for sterilization systems employing low frequency plasma

A sterilization system and method applies low frequency power to a plasma within a vacuum chamber to remove gas or vapor species from an article. The sterilization system includes a switching module adapted to pulsate the low frequency power applied to the plasma and a low frequency power feedback control system for controllably adjusting the low frequency power applied to the plasma. A power monitor is adapted to produce a first signal indicative of the low frequency power applied to the plasma within the vacuum chamber. A power control module is adapted to produce a second signal in response to the first signal from the power monitor, and a power controller is adapted to adjust, in response to the second signal, the low frequency power applied to the plasma to maintain a substantially stable average low frequency power applied to the plasma while the article is being processed.

Sterilization system employing a switching module adapted to pulsate the low frequency power applied to a plasma

A method and an apparatus are disclosed to effectively flow the fluid through the lumen device during the cleaning, disinfecting or sterilizing process, preferably with the use of two interfaces and two sources of fluid. By flowing the fluid into two adjacent compartments, the loss of the fluid due to the gap can be reduced or eliminated.

Device processing apparatus and method having positive pressure with two partitions to minimize leakage

A method and system for sterilizing an article is provided that includes use of a low frequency (LF) gas discharge plasma. The method includes placing the article in a vacuum chamber and evacuating the vacuum chamber to a predetermined pressure. Gas or vapor species are introduced into the vacuum chamber, and a low frequency plasma is generated within the vacuum chamber, the low frequency plasma having a frequency of from 0 to approximately 200 kHz. The low frequency plasma is maintained for a time period sufficient to substantially remove gas or vapor species from the article. The sterilization system includes a vacuum chamber coupled to a vacuum pump and a vent, a first electrode, and a second electrode. The sterilization system further includes a first region within the vacuum chamber, the first region including a region between the first and second electrodes, and a second region within the vacuum chamber, the second region being in fluid communication with the first region. The sterilization system further includes a source of reactive agent species coupled to the vacuum chamber, a process control monitor, and a low frequency power module including components adapted to apply a low frequency voltage between the first electrode and second electrode to generate a low frequency plasma in the vacuum chamber, the low frequency voltage having a frequency of from 0 to approximately 200 kHz.

Sterilization system employing low frequency plasma

The present invention provides a sterilization system that includes a low frequency power feedback control system for controllably adjusting a power applied to a low frequency plasma within a vacuum chamber of the sterilization system to remove gas or vapor species from the article. The power has a frequency of from 0 to approximately 200 kHz. The low frequency power feedback control system includes a power monitor adapted to produce a first signal indicative of the power applied to the low frequency plasma within the vacuum chamber. The low frequency power feedback control system further includes a power control module adapted to produce a second signal in response to the first signal from the power monitor, and a power controller adapted to adjust, in response to the second signal, the power applied to the low frequency plasma to maintain a substantially stable average power applied to the low frequency plasma while the article is being processed.

Growing community of inventors

Orange, CA, United States of America

Mitch Agamohamadi