Applied Materials, Inc.

Miriam Schwartz

Kedarnath Sangam

Helder T Lee

Chandrasekhar Balasubramanyam

Elizabeth Wu

Pravin K Narwankar

Son Truong Nguyen

Nir Merry

Sanjay Krupakar Bhat

Michael C Kuchar

Jacob Newman

Kenric T Choi

Shreyas Kher

Aaron Webb

Paul L Deaton

Dinesh Kanawade

Shankar Muthukrishnan

Chuckson Yokota

Rahul Sharangapani

Robert J Willis

Michael Thomas Haag

Theodoss Costuros

Embodiments of the present invention relate to improvements to single-substrate, multi-chamber processing platform architecture for minimizing fabrication facility floor space requirements. Prior art systems require significant floor space around all sides to allow for adequate installation and servicing. Embodiments of the present invention provide platforms that allow for servicing the chambers and supporting systems via a front and rear of the platform allowing multiple, side-by-side platform placement within a fabrication facility, while providing improved serviceability of the platform components.

Process equipment architecture

Methods and apparatus for increasing flow uniformity are provided herein. In some embodiments, a slit valve having increased flow uniformity may be provided, the slit valve may include a housing having an opening disposed therethrough, the opening configured to allow a substrate to pass therethrough; a gas inlet formed in the housing; an outer plenum disposed in the housing and coupled to the gas inlet; an inner plenum disposed in the housing and coupled to the outer plenum via a plurality of holes; and a plurality of gas outlets disposed in the housing and fluidly coupling the opening to the inner plenum.

Slit valve having increased flow uniformity

A cooling plate includes a channel to transmit a fluid, wherein the channel is disposed within a base and the channel has a first portion and a second portion. The first portion is disposed substantially along a peripheral edge of the base, and the second portion is coupled to the first portion and is disposed further away from the peripheral edge of the base than the first portion. The second portion has a length that is at least about 35% as long as the length of the first portion. The cooling plate also includes a lid disposed over the base and the channel, wherein the lid provides support for a substrate.

Cooling plates and semiconductor apparatus thereof

The embodiments of the invention describe a process chamber, such as an ALD chamber, that has gas delivery conduits with gradually increasing diameters to reduce Joule-Thompson effect during gas delivery, a ring-shaped gas liner leveled with the substrate support to sustain gas temperature and to reduce gas flow to the substrate support backside, and a gas reservoir to allow controlled delivery of process gas. The gas conduits with gradually increasing diameters, the ring-shaped gas liner, and the gas reservoir help keep the gas temperature stable and reduce the creation of particles.

Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system

A valve lockout device having two pieces. A first piece of the device is a hollow object, substantially tubular or block-shaped, open at a bottom end and having slots open on two sides, that fits over a valve whose handle is to be fixed (or locked). A pocket in the first piece receives the handle and limits the motion of the handle relative to the valve body, thereby preventing operation of the valve. A second piece of the device is a substantially U-shaped object which is pivotally attached to the first piece. When the second piece is rotated to a closed position, it captures the valve handle in the pocket of the first piece, thereby preventing the valve lockout device from being removed. When the second piece is in the closed position, a padlock loop on the first piece extends through a padlock receiving opening in the second piece. Putting a padlock through the padlock loop will prevent the second piece from being rotated out of its closed position, thereby locking the device to the valve.

Valve lockout device

Growing community of inventors

Los Gatos, CA, United States of America

Miriam Schwartz