The Clorox Company

Miranda Helmer

Rashda K Khan

Kerry D Azelton

Hyunjoo Lee

Arun S Agarwal

Jared Heymann

Daniela N Fritter

John E Jamieson

Janiece Hope

Wenyu Zhang

Kristina Perlas

Steven J Tomkins

Aidee Duarte

Abhishek Shetty

Lorinda Alcantara

Courtney Lytle

Selina Wang

Sacha Connor

An all-in-one cleaning device, e.g., such as may be used in cleaning the inside of a shower. The device may provide the ability to dispense the composition carried within the device itself, and scrub the composition into or against the surfaces to be cleaned (e.g., shower walls, floors, corners, etc.). Activation of the dispensing mechanism of the cleaning device may dispense a metered dose of composition, in a generally horizontal direction, onto and/or into a nonwoven or other substrate. The dispensing mechanism may not rely on gravity for dispensing, and may be sealed to prevent unwanted backflow of shower water or other material, preventing contamination.

Article for scrubbing and cleaning hard surfaces and a method for use thereof

The invention relates to drain cleaning compositions including relatively high concentrations of a hypochlorite oxidizing agent and a hydroxide (e.g., 4 to 12% and 2.5 to 10%, respectively. The composition further includes a surfactant (e.g., a surfactant blend, water, and exhibits a very high pH (e.g., at least 13). The composition is monophasic, even at high oxidizing and hydroxide concentrations. The surfactant may include a blend of an uncharged surfactant (e.g., an amphoteric surfactant or nonionic surfactant) and a charged surfactant (e.g., anionic, cationic, or a surfactant that becomes so under the high pH conditions of the composition). The ratio of charged to uncharged surfactant may be at least 1:10, e.g., from 1:10 to about 1:50.

Drain formulation for enhanced hair dissolution

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Pleasanton, CA, United States of America

Miranda Helmer