Lg Chem, Ltd

Minyoung Lim

Junhyun An

Yongmi Kim

Sumin Park

Hyunmin Park

Sung Ho Chun

Tae Seob Lee

Eun Seok Park

Hyun Min Park

Seongho Jeon

Jihye Kim

Yongsik Ahn

Baekhwan Yang

The present application relates to a compound of Formula 1, a binder resin, a negative-type photosensitive resin composition, and a display device comprising a black bank formed using same.

Compound, binder resin, negative-type photosensitive resin composition, and display device comprising black bank formed using same

A polymer capable of securing pattern uniformity in a photoresist pattern, the polymer containing a photoacid generator by including a structure unit represented by Chemical Formula 1a; and a structure unit represented by Chemical Formula 1b as shown in the specification.

Polymer containing photoacid generator

The present application relates to a binder resin including a compound represented by Formula 1-1 and a compound represented by the following Formula 1-2, a negative-type photosensitive resin composition, and a display device including a black bank formed by using the same.

Binder resin, negative-type photosensitive resin composition, and display device comprising black bank formed using same

A compound represented by Chemical Formula 1, a photoresist composition comprising the same, a photoresist pattern comprising the same, and a method for preparing a photoresist pattern

Compound, photoresist composition comprising same, photoresist pattern comprising same, and method for manufacturing photoresist pattern

The present specification relates to a binder resin, a photosensitive resin composition, an insulating film and a semiconductor device.

Binder resin, positive-type photosensitive resin composition, insulating film and semiconductor device

The present specification provides a compound, a photoresist composition comprising the same, a photoresist pattern comprising the same, and a method for preparing a photoresist pattern.

The present invention relates to a chemically amplified photoresist composition including an alkali-soluble resin including a (meth)acrylate-based resin containing a (meth)acrylate-based repeating unit in which a heterocyclic compound is substituted via a divalent functional group containing an alkylene sulfide having 1 to 20 carbon atoms.

Photoresist composition

A photoresist composition capable of forming a pattern in which a footing phenomenon is suppressed while being highly sensitive during formation of a fine pattern on a metal surface substrate, and capable of producing a photoresist film that is excellent in chemical stability, and a photoresist film using the photoresist composition.

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Daejeon, South Korea

Minyoung Lim