Samsung Electronics Co., Ltd.

Minwoo Kwon

Junsoo Kim

Sangwon Kim

Hyeonjin Shin

Eunkyu Lee

Sangyeon Han

Huijung Kim

A semiconductor device includes a substrate including an active region, a gate structure disposed in a gate trench in the substrate, a bit line disposed on the substrate and electrically connected to the active region on one side of the gate structure, and a capacitor disposed on the bit line and electrically connected to the active region on another side of the gate structure. The gate structure includes a gate dielectric layer disposed on bottom and inner side surfaces of the gate trench, a conductive layer disposed on the gate dielectric layer in a lower portion of the gate trench, sidewall insulating layers disposed on the gate dielectric layer, on an upper surface of the conductive layer, a graphene conductive layer disposed on the conductive layer, and a buried insulating layer disposed between the sidewall insulating layers on the graphene conductive layer.

Semiconductor devices having buried gates

An integrated circuit device includes a plurality of memory cells each including a channel region, a first sub-word line, a second sub-word line, and a storage element. A word line driving circuit is configured to drive the first and sub-word lines. The word line driving circuit includes a PMOS transistor, an NMOS transistor, a keeping NMOS transistor, and a first keeping PMOS transistor. A negative voltage is applied to a source of the NMOS transistor, the negative voltage is applied to a source of the keeping NMOS transistor, the first sub-word line is connected to a source of the first keeping PMOS transistor, the second sub-word line is connected to a drain of the first keeping PMOS transistor, and a negative voltage is applied to a gate of the first keeping PMOS transistor.

Integrated circuit device including a word line driving circuit

Growing community of inventors

Seoul, South Korea

Minwoo Kwon