Samsung Electronics Co., Ltd.

Minseop Park

Sung Yong Park

Sunggil Kang

Hoseop Choi

Yeongkwang Lee

Sangjin An

Chanyeong Jeong

Jubong Lee

Kiju Sohn

Jaeyoung Eom

A conditioning disk replacement apparatus includes; a detacher configured to separate a conditioning disk from to a holder, a transfer part configured to transfer the conditioning disk, and a container configured to store the conditioning disk. The detacher includes a detachment body and a rotary part coupled to the detachment body, the rotary part includes a key protruding outward from the rotary part in a first horizontal direction, and the rotary part is configured to rotate about a central axis extending in the first horizontal direction.

Conditioning disk replacement apparatus and method

A substrate processing apparatus includes a process chamber including a plasma generation region configured to receive at least one first process gas and have first radio-frequency (RF) power applied thereto, to generate plasma; a gas distribution region configured to supply the at least one first process gas to the plasma generation region; a gas mixing region configured to receive at least one second process gas and radicals generated in the plasma generation region to generate an etchant based on the radicals being mixed with the at least one second process gas; a pedestal on which a substrate is disposed; a processing region in which the pedestal is installed; and a shower head configured to supply the etchant from the gas mixing region to the processing region, the substrate disposed on the pedestal being processed by the etchant. The gas mixing region is separate from each of the plasma generation region and the processing region.

Apparatus and method for processing substrate and method of manufacturing semiconductor device using the method

Growing community of inventors

Hwaseong-si, South Korea

Minseop Park