Hitachi, Ltd.

Other

Hitachi Global Storage Technologies Japan, Ltd.

Nanofilm Technologies International Limited

Minoru Yamasaka

Kenji Furusawa

Shinji Sasaki

Hiroshi Inaba

Shinya Hirano

Atsushi Amatatsu

Shi Xu

Hideaki Tanaka

Toshihiko Nakata

Minoru Yoshida

Hideaki Sasazawa

Toshio Tamura

Takateru Seki

Akio Takakura

Hiromu Chiba

Toshio Takahashi

An L-shaped slide plate mounted with a workpiece holding device on a slide guide is firmly attached to an angle adjustment mechanism, and a reciprocating motion drive unit mounted with the angle adjustment mechanism on a slider table is firmly attached to a bridge so that an angle between a surface of a workpiece to be lapped and a surface of a lapping plate is kept substantially constant, and also the bridge is disposed so as to stride the lapping plate. Thereby, in a state of row bar in which a plurality of magnetic head sliders run in a line, an air bearing surface of magnetic head can be lapped with high accuracy with an element recession being decreased and an occurrence of a scratch being restrained.

Method of manufacturing magnetic head

A plasma processing device include a plasma generation unit for generating plasma by using a cathodic arc discharge, first and second magnetic field ducts arranged in a row for transporting the plasma with one end of the row being connected to the plasma generation unit and a processing chamber connected to the other end of the row unit and having a stage for holding a substrate to be processed. A shutter is provided for covering the plasma during a period of a predetermined time after start of arc discharge or during a period of predetermined time before end of arc discharge. The shutter is disposed between the first magnetic field duct and the substrate to be processed, and is movable. The shutter is capable of being supplied with a voltage, and is kept in a state so as to be electrically insulated from the processing chamber.

Plasma processing apparatus with real-time particle filter

In the plasma processing device which utilizes a low pressure arc discharge, a method for efficiently capturing and removing electrically charged particles and neutral particles having no charge which are at most 5 &mgr;m in particle diameter is demanded. The electrically charged particles can be captured efficiently by installing an electric field filter in a transportation course of plasma. The electric field filter has a cylindrical structure which is uneven in inner wall shape. A voltage in the range of 10 to 90 V is applied to the electric field filter. The neutral filters can be captured efficiently by installing a neutral filter having an opening sectional area which is at most 40% of a sectional area of the transportation course.

To measure positions of a plurality of thin film magnetic head elements formed in a line on a bar, the quantity of positions of samples in the bar is estimated from the magnetic head elements the amount of deviation in position of the next element, and the distance between the elements are obtained, and the amount of deviation and distance are estimated by a primary approximate linear or several-order approximate curve. The estimated amount and the distance between the elements are moved simultaneously, and an image formed by a lens optical system is photo-converted to an image signal, and dimensions are computed. The conversion step is carried out immediately after movement of the next element and is continuously repeated, and the computing step is processed in parallel with the conversation step.

Manufacturing method for thin film magnetic heads

Growing community of inventors

Chigasaki, Japan

Minoru Yamasaka