Hitachi, Ltd.

Hitachi-high-technologies Corporation

Hirata Corporation

Minoru Soraoka

Yoshinao Kawasaki

Ken Yoshioka

Hideki Kihara

Susumu Tauchi

Akitaka Makino

Youji Takahashi

Katsuyoshi Kudo

Yoshiaki Sato

Hironobu Kawahara

Shoji Ikuhara

Shinji Yokoyama

Hidenobu Tanimura

Noriyoshi Toyoda

Nobuo Nagayasu

Keiji Tada

Mitsuru Katamoto

Tsuyoshi Umemoto

Tooru Yukimasa

Hirofumi Kakutani

Yuzo Ohirabaru

A load port is provided with a table and a plate. The table is arranged on a side of a front wall of an atmospheric transfer unit for transferring a piece of material under processing and is adapted to mount on it a container with the piece of material received in the same. The plate serves to isolate an interior of the atmospheric transfer unit from an exterior of the atmospheric transfer unit. The load port includes an exhaust duct arranged on a rear side of the plate and a fan arranged in a lower extremity of the exhaust duct. By the exhaust duct and the fan, an internal atmosphere of the atmospheric transfer unit can be exhausted into the atmosphere.

Load port

A vacuum processing apparatus includes a transfer unit disposed at a center thereof, plural processing chambers, each processing chamber having a processing table for supporting an object to be processed and carrying out processing using a gas, and a mass flow controller unit interposed between two of the processing chambers for supplying gas to the chambers.

Vacuum processing apparatus

A vacuum processing apparatus comprising a transfer unit disposed at a center thereof, plural processing chambers, each processing chamber having a processing table for supporting an object to be processed and carrying out processing using a gas; and amass flow controller unit interposed between two processing chambers for supplying gas to the chambers.

A vacuum processing apparatus includes an outer chamber comprising a vacuum container, an inner chamber in which a plasma used for processing a wafer is generated, the inner chamber being detachably disposed inside of the outer chamber, a wafer holder on which the wafer is located is disposed inside of the inner chamber, and an exhausting device disposed below the wafer holder which exhausts the inside of the inner chamber. The inner chamber is sealed in air-tight manner with respect to a space between the inner chamber and the outer chamber while the space is maintained at a vacuum pressure.

A vacuum processing apparatus is composed of a cassette block and a vacuum processing block. The cassette block has a cassette table for mounting a plurality of cassettes containing a sample and an atmospheric transfer means. The vacuum processing block has a plurality of processing chambers for performing vacuum processing to the sample and a vacuum transfer means for transferring the sample. Both of the plan views of the cassette block and the vacuum processing block are nearly rectangular, and the width of the cassette block is designed larger than the width of the vacuum processing block, and the plan view of the vacuum processing apparatus is formed in an L-shape or a T-shape.

Vacuum processing apparatus and semiconductor manufacturing line using the same

A vacuum processing apparatus comprising a transfer unit disposed at a center thereof, plural processing chambers, each processing chamber having a processing table for supporting an object to be processed and carrying out processing using a gas; and a mass flow controller unit interposed between two processing chambers for supplying gas to the chambers.

A vacuum processing apparatus includes a vacuum processing chamber having a processing table for supporting an object to be processed and carrying out processing using a gas. The vacuum processing chamber has an axisymmetric structure, including a double wall structure, and a gate valve for sealing an opening through which the object enters the processing chamber.

Semiconductor manufacturing apparatus

Growing community of inventors

Yamaguchi, Japan

Minoru Soraoka