Tokyo Electron Limited

Minoru Obata

Noriaki Koyama

Masashi Takahashi

Keisuke Suzuki

Hiroki Murakami

Wenling Wang

Shingo Hishiya

Koichi Sakamoto

Kentaro Kadonaga

Nobutoshi Terasawa

A method of forming a thin film containing a doping element in a vacuum atmosphere, which includes: supplying a source gas into a processing vessel being under the vacuum atmosphere through a source gas supply unit such that a source of the source gas is adsorbed onto a substrate in the processing vessel; repeating, a plurality of times, a sequence of operations of supplying a doping gas containing the doping element into the processing vessel through a doping gas supply unit, followed by sealing the doping gas inside the processing vessel, followed by vacuum-exhausting the processing vessel; supplying a reaction gas into the processing vessel through a reaction gas supply unit such that the reaction gas reacts with the source to produce a reaction product; and replacing an internal atmosphere of the processing vessel, the replacing being performed between the operations.

Film forming method, film forming apparatus and storage medium

A method of estimating the life of a heater wire, including the steps of: detecting a maximum value of electric power supplied to the heater wire during a temperature rising period during which a temperature is elevated to a preset heating temperature, obtaining an index indicative of the amplitude of the electric power, and giving a notice that the heater wire is approaching the end of its life when the electric power and the index indicative of the of amplitude of the electric power exceed threshold values respectively provided thereto.

Life estimating method for heater wire, heating apparatus, storage medium, and life estimating system for heater wire

A server device constituting a group management system includes one or more manufacturing apparatuses for performing a preset process on a target substrate, and the server device includes a measurement information storage unit for storing therein one or more measurement information; an instruction receiving unit for receiving an output instruction of the measurement information, which contains information specifying a predetermined start point and valid time information; a measurement information acquisition unit for acquiring, from the measurement information storage unit, measurement information ranging from the predetermined start point to a time point of the valid time; an output information composing unit for composing output information by using the acquired measurement information; and an output unit for outputting the output information composed by the output information composing unit.

Server device and program

A server device is provided with a measurement information storage unitwhich can store plural measurement information, i.e., information having a measurement value and time information indicating time; an instruction receiving unit for receiving an output instruction of the measurement information; a measurement information acquisition unit for acquiring, from the measurement information storage unit, the measurement information designated by the output instruction; an output information composing unit for composing output information by using the acquired measurement information; and an output unit for outputting the output information composed by the output information composing unit. The output instruction includes an instruction for designating one or more desired number of times of execution of a sub-recipe among plural number of times of execution of the sub-recipe in the recipe and the measurement information acquisition unit acquires measurement information corresponding to the sub-recipe designated by the output instruction.

Server device and program with sub-recipe measurement communication

A information processing apparatusfor processing an acquired value, which is a value acquired in regard to a state during a treatment, performed by a semiconductor manufacturing apparatusfor performing a treatment on a treatment target containing a semiconductor according to a set value, which is a value for setting a condition of a treatment, includes: a set value receiving portionfor receiving the set value; a state value receiving portionfor receiving the acquired value; a correction amount calculating portionfor calculating a correction amount of the acquired value, using a correction function indicating a relationship between the set value and the acquired value; a correcting portionfor correcting the acquired value received by the state value receiving portion, using the correction amount calculated by the correction amount calculating portion; and an output portionfor outputting a result of correction performed by the correcting portion

Information processing apparatus, semiconductor manufacturing system, information processing method, and storage medium

In order to detect an abnormality of semiconductor manufacturing apparatus, a biaxial coordinate system having first and second axes respectively assigned two different monitoring parameters selected from plural apparatus status parameters representing statuses of semiconductor manufacturing apparatus is prepared. As monitoring parameters, for example, a cumulative film thickness for deposition processes that have previously been performed in deposition apparatus and an opening of the pressure control valve located in a vacuum exhaust path to control the internal pressure of a reaction vessel are selected. Values of monitoring parameters obtained when the semiconductor manufacturing apparatus was normally operating are plotted on the biaxial coordinate system. A boundary between a normal condition and an abnormality status is set around a plot group. Values of monitoring parameters obtained during present operation of the semiconductor manufacturing apparatus are plotted on the biaxial coordinate system to determine whether or not there exists an abnormality and identify a type of abnormality based on a positional relation between the plots and the boundary.

Semiconductor manufacturing apparatus, method of detecting abnormality, identifying cause of abnormality, or predicting abnormality in the semiconductor manufacturing apparatus, and storage medium storing computer program for performing the method

Growing community of inventors

Nirasaki, Japan

Minoru Obata