Dai Nippon Printing Co., Ltd.

Dai Nippon Printingco., Ltd.

Minoru Komada

Yoshihiro Kishimoto

Sayaka Kawashima

Keiji Tokunaga

Shinya Satou

Toshio Yoshihara

Yurie Ota

Kazuyuki Takasawa

Osamu Sakakura

Kiyoshi Imaizumi

Hiroyuki Asakura

Takeshi Iihara

An object of the present invention is to provide a barrier film having the extremely high barrier property and the better transparency, a method for manufacturing the same, and a laminated material, a container for wrapping and an image displaying medium using the barrier film. According to the present invention, there is provided a barrier film provided with a barrier layer on at least one surface of a substrate film, wherein the barrier layer is a silicon oxide film having an atomic ratio in a range of Si:O:C=100:160 to 190:30 to 50, a peak position of infrared-ray absorption due to Si&#x2014;O&#x2014;Si stretching vibration between 1030 to 1060 cm, a film density in a range of 2.5 to 2.7 g/cm, and a distance between grains of 30 nm or shorter. Still more, there is provided a barrier film provided with a barrier layer on at least one surface of a substrate film, wherein the barrier layer is a silicon oxi-nitride film having an atomic ratio in a range of Si:O:N:C=100:80 to 110:40 to 70:30 to 50, a maximum peak of infrared-ray absorption due to Si&#x2014;O stretching vibration and Si&#x2014;N stretching vibration in a range of 900 to 1000 cm, a film density in a range of 2.7 to 3.0 g/cm, and a distance between grains of 30 nm or shorter.

Barrier film and laminated material, container for wrapping and image display medium using the same, and manufacturing method for barrier film

A laminated material having a barrier film containing a barrier layer on at least one surface of a substrate film that is a silicon oxide film having an atomic ratio in a range of Si:O:C=100:140 to 167:20 to 40, peak position of infrared-ray absorption due to Si&#x2014;O&#x2014;Si stretching vibration between 1060 to 1090 cm, a film density in a range of 2.6 to 2.8 g/cm, and a distance between grains of 30 nm or shorter.

The main object of the present invention is to provide a barrier film having an extremely high barrier property and a good transparency, a laminated material using the above-mentioned barrier film, a packaging container, and an image display medium. The above-mentioned object is achieved by providing a barrier film comprising a base material film and a barrier layer deposited on at least one side surface of the base material film, wherein the barrier layer comprises a water repellent layer and a dense layer, the water repellent layer is a silicon oxide carbide film having the atomic percent of Si:O:C in a range of 100:40 to 120:80 to 160, and the thickness in a range of 2 to 300 nm, and the dense layer is a silicon oxide carbide film having the atomic percent of Si:O:C in a range of 100:100 to 200:5 to 100, and the thickness in a range of 5 to 300 nm.

Barrier film

An object of the present invention is to provide a barrier film having the extremely high barrier property and the better transparency, a method for manufacturing the same, and a laminated material, a container for wrapping and an image displaying medium using the barrier film. According to the present invention, there is provided a barrier film provided with a barrier layer on at least one surface of a substrate film, wherein the barrier layer is a silicon oxide film having an atomic ratio in a range of Si:O:C=100:140 to 170:20 to 40, peak position of infrared-ray absorption due to Si&#x2014;O&#x2014;Si stretching vibration between 1060 to 1090 cm, a film density in a range of 2.6 to 2.8 g/cm, and a distance between grains of 30 nm or shorter. Still more, there is provided a barrier film provided with a barrier layer on at least one surface of a substrate film, has a composition wherein the barrier layer is a silicon oxi-nitride film, and the silicon oxi-nitride film has an atomic ratio in a range of Si:O:N:C=100:60 to 90:60 to 90:20 to 40, a maximum peak of infrared-ray absorption due to Si&#x2014;O stretching vibration and Si&#x2014;N stretching vibration is in a range of 820 to 930 cm, a film density is in a range of 2.9 to 3.2 g/cm, and a distance between grains is 30 nm or shorter.

A noncontact IC tagcomprises a base film, a noncontact IC circuitformed on the base film, and a plastic film or paper serving as a surfacing sheet, having a non-conductive, lustrous metal filmformed by deposition, laminated to the base filmon the side of the noncontact IC tag circuit. The surface roughness of the non-conductive, lustrous metal film, determined by atomic force microscopy, is more than 10 nm and 100 nm or less as indicated by the center line average height Ra. In the case where the non-conductive, lustrous metal filmis formed on the outer surface of the surfacing sheet, a concealing layermay further be formed on the inner surface of the surfacing sheetin order to enhance concealing properties.

Noncontract IC tag with non-conductive metal film

The main object of the present invention is to provide a gas barrier substrate having a high gas barrier property without a ruggedness, a pin hole or the like in the gas barrier layer. The present invention solves the problem by providing a gas barrier substrate having a base material, a planarization layer formed on the base material, and a gas barrier layer comprising a deposition film formed on the planarization layer.

Gas barrier substrate

A filter substrate including a transparent support substrate, a pattern layer, a first overcoat layerformed of a reaction product prepared by a chemical reaction mainly based on hydrolysis of a starting material comprising at least a material selected from aminoalkcyldialkoxysilanes, aminoalkcyltrialkoxysilanes. and composites composed mainly of said compounds, and a first transparent inorganic thin-film layerstacked on top of one another. The surface of the first transparent inorganic thin-film layerhas an Ra (average roughness) value of not more than 5 nm and an Rmax (maximum roughness) value of not more than 80 nm. A color display includes the filter substrate, and a transparent electrode layer, a luminescent layer, and a second electrode layer stacked in that order on the filter substrate. The filter substrate has excellent environmental resistance and does not adversely affect the luminance of the display.

Filter substrate and color display using the same

A gas barrier film, a display substrate and a display using the gas barrier film. The gas barrier film includes a base material film having a deflection temperature under load of 150&#xb0; C. or above, and at least a gas barrier layer and a smoothing layer in that order, or a smoothing layer and a gas barrier layer in that order provided on the base material film. Preferably, the base material film is polyethylene naphthalate, the gas barrier layer is formed of an inorganic oxide, an inorganic oxynitride, an inorganic oxycarbide, or an inorganic oxycarbonitride, and the smoothing layer formed of a cardo polymer, sol-gel, or a material containing an acryl structure.

Gas barrier film, and display substrate and display using the same

There is provided a gas barrier clear filmas a polymer substrate that is flexible, is light, is free from cracking, can be bent, has a high level of heat resistance, is excellent particularly in gas shielding properties, and can be used as an alternative to glass substrates. The gas barrier clear film comprises: a clear resin base material filmhaving a coefficient of linear expansion of 15 to 100 ppm/K and a glass transition temperature Tg of 150 to 300&#xb0; C.; and a first clear inorganic compound layerA, a sol-gel coat layerA, and a second clear inorganic compound layerB provided in that order on the clear resin base material film. The second clear inorganic compound layerB has an Ra (average roughness) value of not more than 5 nm and an Rmax (maximum roughness) value of not more than 80 nm.

Gas barrier clear film, and display substrate and display using the same

It is an object of the present invention to provide a gas barrier film improved in gas barrier characteristics by decreasing the adsorbent of the surface of a gas barrier layer to water and the like. The present invention attains the above object by providing a gas barrier film comprising a substrate, a gas barrier layer which is a vacuum deposition film, formed on one surface or both surfaces of the above substrate, and a water-repellent layer which is a film having water repellency, formed on the above gas barrier layer.

Gas barrier film

A barrier film is provided having extremely high barrier properties and a good transparency as part of a laminated material having use as a packaging container which may possess an image display medium, the high barrier properties and good transparency which are achieved with a barrier film comprised of a base material film and a barrier layer deposited on at least one side surface of the base material film, with the barrier layer comprising a water repellent layer and a dense layer, the water repellent layer being a silicon oxide carbide film having the atomic percent of Si:O:C in a range of 100:40 to 120:80 to 160, and the thickness in a range of 2 to 300 nm, and the dense layer being a silicon oxide carbide film having the atomic percent of Si:O:C in a range of 100:100 to 200:5 to 100, and the thickness in a range of 5 to 300 nm.

The present invention provides a gas barrier film comprising a composite film provided with a gas barrier layer having a laminated structure including at least a metal oxide thin layer on a substrate film having a (1) 80 ppm/&#xb0; C. or less coefficient of thermal expansion at 50&#xb0; C. to 150&#xb0; C. and/or a 10 ppm/% RH or less coefficient of humidity expansion at 25&#xb0; C., and a (2) 150 C. &#xb0; or more glass transition temperature, and a display with a display element covered with the same.

Growing community of inventors

Tokyo, Japan

Minoru Komada