Hitachi-high-technologies Corporation

Hitachi High-tech Corporation

Minoru Kaneda

Takashi Onishi

Shunichi Watanabe

Takashi Ohshima

Toshiaki Kusunoki

Tomihiro Hashizume

Hisaya Murakoshi

Noriaki Arai

Keigo Kasuya

Soichiro Matsunaga

Hiromitsu Seino

An electron gun EG in which mixing of secondary electrons is suppressed is provided. The electron gun EG has an electron source, an extraction electrodefor extracting an electron beam Efrom the electron source, and an acceleration electrode for accelerating the extracted electron beam E. The extraction electrodeincludes a diaphragmfor allowing a part of the electron beam Eto pass through, a shieldpositioned above the diaphragmapart from the diaphragm, and a shieldpositioned below the diaphragmapart from the diaphragm. The diaphragmhas an opening OPhaving an opening diameter D, the shieldhas an opening OPhaving an opening diameter Dwhich is greater than the opening diameter D, and the shieldhas an opening OPhaving an opening diameter Dwhich is greater than the opening diameter D

Electron gun and charged particle beam device equipped with electron gun

The invention provides an electron source including a columnar chip of a hexaboride single crystal, a metal pipe that holds the columnar chip of the hexaboride single crystal, and a filament connected to the metal pipe at a central portion. The columnar chip of the hexaboride single crystal is formed into a cone shape at a portion closer to a tip than a portion held in the metal pipe, and a tip end portion having the cone shape has a (310) crystal face. Schottky electrons are emitted from the (310) crystal face. According to the invention, it is possible to provide a novel electron source having monochromaticity, long-term stability of an emitter current, and high current density.

Electron source, method for manufacturing the same, and electron beam device using the same

An instrument producing a charged particle beam according to the present invention is provided with: a charged particle source; a plurality of first electrodes disposed along a direction of irradiation of charged particles from the charged particle source; a plurality of insulation members disposed between the first electrodes; and a housing mounted around the plurality of first electrodes. The housing is formed from an insulating solid material, and includes a plurality of second electrodes disposed at positions in proximity to the plurality of first electrodes. At least one of the plurality of second electrodes is electrically connected to at least one of the plurality of first electrodes, each of the plurality of second electrodes having the same potential as the potential of the proximate one of the first electrodes.

Charged particle beam generating apparatus, charged particle beam apparatus, high voltage generating apparatus, and high potential apparatus

In an accelerating tube which uses a conductive insulator, there is a possibility that the dopant concentration on a surface of the conductive insulator becomes non-uniform so that the surface resistance of the conductive insulator becomes non-uniform. Accordingly, a circumferential groove is formed on the inner surface of the conductive insulator accelerating tube in plural stages, and metal is metalized along inner portions of the grooves. When the resistance of a specific portion on the surface of the accelerating tube differs from the resistance of an area around the specific portion, the potential of the metalized region on the inner surface of the accelerating tube becomes a fixed value and hence, the potential distribution on the inner surface of the accelerating tube in the vertical direction can be maintained substantially equal without regard to the circumferential direction.

Charged particle beam radiation apparatus

Growing community of inventors

Tokyo, Japan

Minoru Kaneda