Kabushiki Kaisha Toshiba

Minoru Inomoto

Koji Hashimoto

Takayuki Ogasahara

Tetsuro Nakasugi

Naotada Okada

Tadahito Fujisawa

Ryoichi Inanami

Hiromitsu Mashita

Manabu Takakuwa

Hiroshi Koizumi

Katsuo Iwata

Yasunobu Kai

Yusaku Konno

Kazuto Matsuki

Kentaro Kasa

According to one embodiment, a substrate holding apparatus includes a main unit and a plurality of first support units. The main unit has a major surface. The main unit has a plate configuration. The first support units are disposed on the major surface. Each of the first support units includes a suction-holding unit capable of holding a substrate by suction. The suction-holding unit is movable along a first direction perpendicular to the major surface and a second direction parallel to the major surface.

Substrate holding apparatus, pattern transfer apparatus, and pattern transfer method

An optical module comprises an apodizer includes a black resin layer having a concavity the diameter of which gradually changes in a direction light passes through the apodizer, and, provided in the concavity, a transparent resin layer having the same refractive index as the black resin layer, the black resin layer and the transparent resin layer having a total thickness of 0.001 to 0.10 mm, an input lens opposed to the black resin layer of the apodizer and an output lens opposed to the transparent resin layer of the apodizer.

Method of manufacturing an apodizer, and optical module

A pattern layout for forming an integrated circuit includes a first device pattern, a second device pattern, and an auxiliary pattern. The first device pattern includes a line and a space alternately arrayed on a fixed pitch having regular intervals in a first direction. The second device pattern is disposed on the fixed pitch and separated from the first device pattern in the first direction. The second device pattern has a pattern width an odd-number times larger than the regular intervals of the fixed pitch, wherein the odd-number is set to be three or more. The auxiliary pattern is disposed on the fixed pitch and within the second device pattern and configured not to be resolved by light exposure.

Pattern layout for forming integrated circuit

Growing community of inventors

Kanagawa-ken, Japan

Minoru Inomoto