Boe Technology Group Co., Ltd.

Beijing Boe Display Technology Co., Ltd.

Mingxuan Liu

Xiaoxiang Zhang

Huibin Guo

Zheng Liu

Yongzhi Song

Zhichao Zhang

Wenqing Xu

Xi Chen

Zumou Wu

Xiaolong Li

Xiangqian Ding

Liping Luo

Zongjie Guo

Jing Wang

Tsung Chieh Kuo

Shoukun Wang

Zengbiao Sun

Huishuang Liu

Honggang Liang

Xiangmeng Zhang

Wei Li

Xiao Han

Tsungchieh Kuo

Jinchao Bai

Hao Han

Jingjing Jiang

Yihe Jia

Lianjie Yang

Tsung-Chieh Kuo

Honghui Wang

Huali Yao

Hongming Qu

A phase shift mask includes a transparent substrate and light-shielding portions. The light-shielding portions include a first light-shielding portion, and over one side of it, a first compensating light-shielding portion, which has a first distance to the first light-shielding portion and a first width smaller than a resolution of an exposing machine utilized for an exposure process using the phase shift mask. The light-shielding portions can further include a second compensating light-shielding portion, having a second distance to another side of the first light-shielding portion and a second width smaller than the resolution of the exposing machine. The first distance and the second distance respectively allow the first and the second compensating light-shielding portion to reduce an exposure at a region corresponding to two sides of the first light-shielding portion during the exposure process. A method manufacturing an electronic component utilizing the phase shift mask is also provided.

Phase shift mask and electronic component manufacturing method

A display panel includes a method of fabricating an array substrate. The method includes forming a metal layer () on a substrate, and patterning the metal layer () using a phase shift mask to form a pattern of metal wiring. The phase shift mask includes a substrate and a wiring light shielding portion () on the substrate (). The wiring light shielding portion () includes a light shielding region () and a phase shift region (). In a direction perpendicular to the extending direction of the wiring light shielding portion () a width of the light shielding region () is larger than a width of the pattern of the metal wiring formed by the wiring light shielding portion ().

Phase shift mask, array substrate, fabrication method thereof and display apparatus

An array substrate includes a base, at least one common electrode, at least one signal line and at least one conductive connecting line. The at least one common electrode is formed on the base, and a signal line arranged correspondingly to each of the at least one common electrode is formed on the base. The signal line includes a light absorbing layer and a metal layer that are stacked in a direction away from the base. Conductivity of the light absorbing layer is less than conductivity of molybdenum. Each of the at least one conductive connecting line is electrically connected to both a common electrode and a metal layer in the corresponding signal line.

Array substrate and method of manufacturing the same, and display device

An array substrate, a display, and a manufacturing method are provided. The array substrate is provided with a first notch on at least one of two sides in a width direction of the second fan-out line, wherein a portion of the insulating layer fills into the first notch in a direction towards the second fan-out line to form a recess part corresponding to the first notch, the recess part defining a groove. A protruding part is provided on at least one of two sides in a width direction of the first fan-out line, where a part of the protruding part fills into the groove in a direction towards the insulation layer to form a protrusion corresponding to the groove.

Array substrate, manufacturing method thereof, and display

The present disclosure provides a display substrate, a method for preparing the same, and a display device. The display substrate includes: a base substrate; a metal pattern located on the base substrate, and an anti-reflection pattern located on a surface of the metal pattern proximate to the base substrate, in which a difference between a first slope angle of the anti-reflection pattern and a second slope angle of the metal pattern is less than a first threshold, and a distance between a first edge of a side surface of the anti-reflection pattern proximate to the metal pattern and a second edge of a side surface of the metal pattern proximate to the anti-reflection pattern is less than a second threshold.

Display substrate and method for preparing the same, and display device

Disclosed are a manufacturing method of a phase shift mask and a phase shift mask. The manufacturing method of a phase shift mask includes: forming a pattern of metal shielding layer on a base substrate; forming a phase shift layer and a first photoresist layer in sequence on the pattern of metal shielding layer; patterning the first photoresist layer with the pattern of metal shielding layer serving as a mask to form a pattern of first photoresist layer; and etching the phase shift layer with the pattern of first photoresist layer serving as a mask to form a pattern of phase shift layer.

Manufacturing method of phase shift mask and phase shift mask

An array substrate includes a base substrate, a plurality of signal lines disposed at a side of the base substrate, and an organic layer disposed at a side of the plurality of signal lines facing away from the base substrate. The organic layer includes at least one auxiliary portion and a reference portion surrounding the at least one auxiliary portion, and a thickness of each auxiliary portion is less than a thickness of the reference portion.

Array substrate and method of manufacturing the same, display device

Disclosed are a mask, a display substrate and a display device. The mask comprises a substrate, a first exposure structure, a second exposure structure located at one side of the substrate and disposed opposite to each other, the first exposure structure comprises a first light transmission film layer and a first light shielding film layer, an orthographic projection of the first light shielding film layer falls within an orthographic projection of the first light transmission film layer on the substrate; the second exposure structure comprises a second light transmission film layer and a second light shielding film layer, an orthographic projection of the second light shielding film layer falls within an orthographic projection of the second light transmission film layer on the substrate; a side edge of the first exposure structure has a first zigzag structure, and a side edge of the second exposure structure has a second zigzag structure.

Mask, display substrate and display device

An array substrate includes a pixel circuit and a light-emitting diode. The pixel circuit includes a driving transistor including a first active medium made of polysilicon, and a switching transistor including a second active medium made of polysilicon. The first active medium has a first grain size. The second active medium has a second grain size larger than the first grain size. The light-emitting diode is coupled to the pixel circuit.

Array substrate, fabrication method thereof, driving transistor and display panel

There are provided a method of manufacturing a display substrate, a method of manufacturing a display device, and a display substrate. The method of manufacturing a display substrate comprises: providing a base substrate; forming a thin film transistor on the base substrate; forming a first conductive layer on the base substrate on which the thin film transistor is formed, the first conductive layer being electrically connected to a drain of the thin film transistor; forming a light-emitting material block; and transferring the light-emitting material block to a surface of the first conductive layer.

Method of manufacturing a display substrate, method of manufacturing a display device and display substrate

The present disclosure relates to a metal electrode, an array substrate and a method of producing the same, and a display device. In an embodiment, the method includes: forming a protection layer on a metal layer; patterning the protection layer to form a protection pattern, a profile of the protection pattern being the same as a profile of a predetermined pattern of the metal electrode; and etching a part of the metal layer not covered by the protection pattern to form the metal electrode, the metal electrode being covered by the protection pattern, wherein an etching anisotropy of the protection layer is larger than an etching anisotropy of the metal layer.

Method of producing metal electrode, array substrate and method of producing the same, display device

The present disclosure provides a shift register unit, a gate scanning circuit, a driving method, and a display apparatus. The shift register unit comprises a reset circuit configured to transmit a signal from a signal control terminal to a first node and a shift register unit signal output terminal under the control of a reset control signal input terminal; a first pull-down control circuit configured to transmit the signal from the signal control terminal to the first node and the shift register unit signal output terminal under the control of a second node; and a second pull-down control circuit configured to transmit the signal from the signal control terminal to the first node and the shift register unit signal output terminal under the control of a third node control signal input terminal coupled to a third node, so as to cooperate with the reset circuit and the first pull-down control circuit to jointly reset the shift register unit in a phase in which output of the shift register unit should not occur, thereby effectively preventing output of the shift register unit from occurring in the phase in which output of the shift register unit should not occur.

Shift register units, gate scanning circuits, driving methods and display apparatuses

A color film substrate comprises: a basal substrate, a plurality of color filters of at least one color formed on the basal substrate, and a black matrix formed on the basal substrate. The black matrix has a plurality of openings one-to-one corresponding to the plurality of color filters of at least one color. In a cross section perpendicular to the basal substrate, an edge of the color filter and an opening edge of the black matrix have an overlapping region. According to the color film substrate, manufacturing method thereof and display device provided by the embodiments of the present disclosure, by applying the technology of halftone mask plate and positive/negative photoresist, the patterns for the plurality of color filters of the at least one color and the pattern of the black matrix can be formed with one filter mask plate.

Color film substrate, manufacturing method thereof and display device

A manufacturing method of a metal layer, a functional substrate and a manufacturing method thereof, and a display device are provided. The manufacturing method of a metal layer includes: forming an insulating layer on a base substrate; forming an etching buffer layer on the insulating layer; patterning the etching buffer layer and the insulating layer to form a plurality of recessed microstructures in the insulating layer; stripping the etching buffer layer; and forming a metal layer on the insulating layer, a surface of the metal layer adjacent to the insulating layer is formed with a plurality of protruded portions which are filled into the plurality of recessed microstructures. The manufacturing method of a metal layer may form a metal layer with anti-reflection effect.

Growing community of inventors

Beijing, China

Mingxuan Liu