Boe Technology Group Co., Ltd.

Hefei Boe Optoelectronics Technology Co., Ltd.

Mingming Shen

Qiang Zhang

Min Xu

Zhen Wei

Shibo Guo

Yongbo Gong

An elevating mechanism is provided in the embodiments of the disclosure, which relates to the technical field of a substrate carrying mechanism device and is capable of decreasing incidence of an electrostatic-breakdown phenomenon of a substrate to be processed during an ascending-descending process thereof. The elevating mechanism is configured to carry the substrate to be processed, including a plurality of struts, each of which is provided at a supporting end thereof with a support portion which is in contact with the substrate to be processed, by means of a supporting surface provided on the support portion when the elevating mechanism carries the substrate to be processed; and an ionic wind supply. Each of the plurality of struts is provided with a channel which is arranged inside a corresponding one of the plurality of the struts and penetrates therethrough and is configured to deliver an ionic wind outputted from the ionic wind supply into the corresponding one of the plurality of struts; and each of the plurality of struts is provided at least at a location of the supporting surface on the support portion with a plurality of first vent holes in communication with the channel thereof, through which the ionic wind delivered by the ionic wind supply is blown towards the substrate to be processed.

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Beijing, China

Mingming Shen