China Resources Microelectronics (Chongqing) Co., Ltd.

Mingjiang He

Fei Luo

Yuling Tang

Jianwen Tan

An SGT MOSFET comprising a substrate, an epitaxial layer, a masking dielectric layer, an interlayer dielectric layer, a source lead-out contact hole, and a source conductive layer and a method for manufacturing the SGT MOSFET are provided. The epitaxial layer is on an upper surface of the substrate and comprises a cellular trench structure, a terminal lead-out structure, a source lead-out structure, a body region, and a source region. The source lead-out structure comprises a source lead-out conductive layer. The masking dielectric layer and the interlayer dielectric layer are sequentially stacked above the epitaxial layer. The source lead-out contact hole penetrates the interlayer dielectric layer and the masking dielectric layer and extends into the source lead-out conductive layer, The source conductive layer fills the source lead-out contact hole. The masking dielectric layer is formed between the interlayer dielectric layer and the epitaxial layer and masks the third dielectric layer.

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ChongQing, China

Mingjiang He